Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
02/2015
02/24/2015US8962875 Metal-enolate precursors for depositing metal-containing films
02/24/2015US8962495 Film deposition method
02/24/2015US8962354 Methods for forming templated materials
02/24/2015US8962100 Method for making diamond composite materials
02/24/2015US8962094 Plural component coating application system with a compressed gas flushing system and spray tip flip mechanism
02/24/2015US8962078 Method for depositing dielectric films
02/24/2015US8962077 Vapor deposition particle emitting device, vapor deposition apparatus, vapor deposition method
02/24/2015US8962067 Real time process control of the polymer dispersion index
02/24/2015US8961920 Methods of altering the color of a diamond by irradiation and high-pressure/high-temperature processing
02/24/2015US8961810 SiGe matrix nanocomposite materials with an improved thermoelectric figure of merit
02/24/2015US8961737 Plasma processing apparatus
02/24/2015US8961736 Plasma reactor with internal transformer
02/24/2015US8961735 Plasma processing apparatus and microwave introduction device
02/24/2015US8961693 Component supporting device
02/24/2015US8961692 Evaporating apparatus
02/24/2015US8961691 Film deposition apparatus, film deposition method, computer readable storage medium for storing a program causing the apparatus to perform the method
02/24/2015US8961689 Systems and methods for distributing gas in a chemical vapor deposition reactor
02/24/2015US8961688 Method and device for plasma treating workpieces
02/24/2015US8960235 Gas dispersion apparatus
02/24/2015US8960124 Plasma processing apparatus and plasma processing method
02/19/2015WO2015023137A1 Deposition method for zinc oxide-based thin film
02/19/2015WO2015022528A1 Heat treatable coated glass pane
02/19/2015WO2015022193A1 Electrical component with an area to be contacted electrically and method for preparing an electrical component for a connection process
02/19/2015US20150050818 Substrate processing apparatus and semiconductor device producing method
02/19/2015US20150050815 Semiconductor device manufacturing method, substrate processing method, and substrate processing apparatus
02/19/2015US20150050757 Method for testing susceptor of chemical vapor deposition apparatus and method for manufacturing organic light emitting display apparatus by using the same
02/19/2015US20150050521 Multilayer material resistant to oxidation in a nuclear environment
02/19/2015US20150050491 Method for producing a textured spinel iron oxide layer
02/19/2015US20150050480 Gas barrier film
02/19/2015US20150050479 Gas barrier film
02/19/2015US20150050478 Gas barrier film and manufacturing method of gas barrier film
02/19/2015US20150050431 Ruthenium compound having superior step coverage and thin film deposited using same
02/19/2015US20150050421 Method of depositing an atomic layer and atomic layer deposition apparatus
02/19/2015US20150049400 Gradient write gap for perpendicular magnetic recording writer
02/19/2015US20150047784 Method for applying a temporary bonding layer
02/19/2015US20150047680 Method for Dry-Cleaning Metal Film in Film-Formation Apparatus
02/19/2015US20150047567 Film-forming apparatus
02/19/2015US20150047565 Trap Mechanism, Exhaust System, and Film Formation Device
02/19/2015US20150047564 Chemical vapor deposition device
02/19/2015US20150047563 Patterned processing kits for material processing
02/19/2015US20150047559 Susceptor and wafer holder
02/19/2015US20150047554 Method for evaluating degree of crystal orientation in polycrystalline silicon, selection method for polycrystalline silicon rods, and production method for single-crystal silicon
02/19/2015DE102013216282A1 Elektrisches Bauteil mit einer elektrisch zu kontaktierenden Stelle sowie Verfahren zur Vorbereitung eines elektrischen Bauteils für einen Lötprozess Electrical component with an electrically contacting point, as well as process for preparing an electrical component for a soldering process
02/19/2015DE102013107875A1 Substrathaltevorrichtung und Prozesskammer Substrate holder and process chamber
02/18/2015EP2837711A1 Chemical vapor deposition device
02/18/2015EP2836622A2 Apparatus for the growing diamonds by microwave plasma chemical vapour deposition process and substrate stage used therein
02/18/2015EP2836621A1 Ceramic lining for a firearm barrel
02/18/2015EP2836473A1 Method for the treatment of silicon carbide fibres
02/18/2015EP2836439A1 Coating containers using plasma nozzles
02/17/2015US8958061 Heated wafer carrier profiling
02/17/2015US8957351 Catalytic CVD equipment, method for formation of film, process for production of solar cell, and substrate holder
02/17/2015US8957346 Thermal spraying apparatus
02/17/2015US8956984 Method of manufacturing semiconductor device, method of processing substrate, substrate processing apparatus, and non-transitory computer-readable recording medium
02/17/2015US8956983 Conformal doping via plasma activated atomic layer deposition and conformal film deposition
02/17/2015US8956971 Selective formation of metallic films on metallic surfaces
02/17/2015US8956704 Methods for modulating step coverage during conformal film deposition
02/17/2015US8956698 Process and hardware for deposition of complex thin-film alloys over large areas
02/17/2015US8956697 Method of manufacturing organic light-emitting display apparatus and organic light-emitting display apparatus manufactured by using the method
02/17/2015US8956683 Chemical vapor infiltration apparatus and process
02/17/2015US8956510 Coated metallic products and methods for making the same
02/17/2015US8956500 Methods to eliminate “M-shape” etch rate profile in inductively coupled plasma reactor
02/17/2015US8956459 Joined assembly, wafer holding assembly, attaching structure thereof and method for processing wafer
02/17/2015US8956458 Vapor deposition device and vapor deposition method
02/17/2015US8956457 Thermal processing system for curing dielectric films
02/17/2015US8956456 Apparatus and method for atomic layer deposition
02/17/2015US8956453 Method for producing a crystalline germanium layer on a substrate
02/17/2015US8955579 Plasma processing apparatus and plasma processing method
02/17/2015US8955456 Microwave plasma reactor for manufacturing synthetic diamond material
02/12/2015WO2015021480A1 Instantaneously wettable polymer fiber sheets
02/12/2015WO2015021124A1 Vacuum deposition system for solar cell production
02/12/2015WO2015020760A1 Three-dimensional (3d) processing and printing with plasma sources
02/12/2015WO2015020610A1 Method to transfer two dimensional film grown on metal-coated wafer to the wafer itself in a face-to-face manner
02/12/2015WO2015018637A1 Silicate aerogel and method for the production thereof
02/12/2015WO2015018316A1 Precleaning chamber and semiconductor processing device
02/12/2015WO2015018201A1 Support shaft for mocvd reactor and mocvd reactor
02/12/2015US20150044881 Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
02/12/2015US20150044880 Method of manufacturing semiconductor device, method of processing substrate, substrate processing apparatus, and program
02/12/2015US20150044814 Apparatus and method for forming chalcogenide semiconductor absorber materials with sodium impurities
02/12/2015US20150044510 Method and material for protecting magnetic information storage media
02/12/2015US20150044428 Nano-gap articles and methods of manufacture
02/12/2015US20150044390 Method of cleaning the filament and reactor's interior in facvd
02/12/2015US20150044368 Placing table structure
02/12/2015US20150044367 Method for Forming Monolayer Graphene-Boron Nitride Heterostructures
02/12/2015US20150043880 Methods for producing a semifinished part for the manufacture of an optical fiber which is optimized in terms of bending
02/12/2015US20150042000 Method for preparing graphene paper
02/12/2015US20150041432 Self-sustained non-ambipolar direct current (dc) plasma at low power
02/12/2015US20150041430 Method for treating inner surface of chlorine trifluoride supply passage in apparatus using chlorine trifluoride
02/12/2015US20150041061 Recursive pumping for symmetrical gas exhaust to control critical dimension uniformity in plasma reactors
02/12/2015US20150040970 Vacuum Deposition System For Solar Cell Production And Method Of Manufacturing
02/12/2015US20150040828 Substrate processing system
02/12/2015DE112011102835B4 Wasserreaktives, Al-basiertes Verbundmaterial, wasserreaktiver, Al-basierter,thermisch gespritzter Film, Verfahren für die Herstellung eines solchen Al-basierten, thermisch gespritzten Films und Bestandteil für eine Filmbildungskammer Water activated, Al-based composite material, water-reactive Al-based, thermally sprayed film, method for the production of such Al-based, thermally sprayed film and part of a film forming chamber
02/12/2015DE102013215400A1 Silicat-Aerogel und Verfahren zu seiner Herstellung Silicate airgel and process for its preparation
02/12/2015DE102011085789B4 Vertikale Durchlaufbeschichtungsanlage zur kontinuierlichen Vakuumbeschichtung von Substraten Vertical continuous coating plant for continuous vacuum coating of substrates
02/11/2015EP2834391A1 Method for producing a substrate with stacked deposition layers
02/11/2015EP2834390A1 Atomic layer deposition
02/11/2015EP2834192A2 Surface-modified low surface area graphite, processes for making it, and applications of the same
02/11/2015CN204151456U 一种制备半导体外延片的mocvd反应装置 Mocvd reaction apparatus for preparing a semiconductor wafer
02/11/2015CN204151412U 防止石墨舟翻舟的pecvd设备小车托架 Prevent graphite boat turned pecvd equipment trolley bay boat
02/11/2015CN204151411U 一种mocvd设备的进气装置及mocvd设备 Intake apparatus and equipment mocvd apparatus mocvd
02/11/2015CN104350380A 测量装置和成膜装置 Measuring means and the film-forming apparatus
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