Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
01/2015
01/07/2015CN102808166B 原料气体发生装置 Raw material gas generator
01/07/2015CN102803554B Dlc膜形成方法及dlc膜 Dlc film forming method and film dlc
01/07/2015CN102560409B 掩模 Mask
01/07/2015CN102433546B 成膜方法和成膜装置 Film formation method and film forming apparatus
01/07/2015CN102427971B 高效外延化学气相沉积(cvd)反应器 Efficient epitaxial chemical vapor deposition (cvd) Reactor
01/07/2015CN102387920B 气体阻隔性层叠膜 The gas barrier layered film
01/06/2015US8928035 Gallium nitride devices with gallium nitride alloy intermediate layer
01/06/2015US8928034 Gallium nitride devices with aluminum nitride alloy intermediate layer
01/06/2015US8927857 Silicon: hydrogen photovoltaic devices, such as solar cells, having reduced light induced degradation and method of making such devices
01/06/2015US8927748 Alkyl-substituted allyl carbonyl metal complexes and use thereof for preparing dielectric thin films
01/06/2015US8927440 Film deposition apparatus and method of depositing film
01/06/2015US8927438 Methods for manufacturing high dielectric constant films
01/06/2015US8927351 Method for manufacturing semiconductor device
01/06/2015US8927302 Chemical vapor deposition apparatus and method for manufacturing light-emitting devices using same
01/06/2015US8927179 Optical member for EUV lithography, and process for production of reflective layer-equipped substrate
01/06/2015US8927066 Method and apparatus for gas delivery
01/06/2015US8927060 Method for forming Ge-Sb-Te film and storage medium
01/06/2015US8927059 Deposition of metal films using alane-based precursors
01/06/2015US8927056 Method of manufacturing a wire grid polarizer
01/06/2015US8927052 Process for deposition and characterization of a coating
01/06/2015US8927051 Method for manufacturing a compound film
01/06/2015US8926851 Method for making a film of uniformly arranged core-shell nanoparticles on a substrate
01/06/2015US8926790 Plasma processing apparatus
01/06/2015US8926789 Apparatus for the removal of a fluorinated polymer from a substrate
01/06/2015US8926756 Strip passing apparatus, apparatus for treating surface of strip with the same, and method for treating surface of strip
01/06/2015US8926755 Lift-off deposition system featuring a density optimized HULA substrate holder in a conical deposition chamber
01/06/2015US8926754 Epitaxial growth susceptor
01/06/2015US8926753 Vapor phase growth apparatus and method of fabricating epitaxial wafer
01/06/2015US8926745 Method for preparing low K material and film thereof
01/06/2015US8925481 Systems and methods for measuring, monitoring and controlling ozone concentration
01/01/2015US20150004395 Vapor-deposited polyvinyl alcohol film
01/01/2015US20150004387 High-barrier polyethylene terephthalate film
01/01/2015US20150004332 Method of depositing a film, recording medium, and film deposition apparatus
01/01/2015US20150004331 Method and device for passivating solar cells with an aluminium oxide layer
01/01/2015US20150004330 Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
01/01/2015US20150004328 Manufacturing method for magnetic recording medium
01/01/2015US20150004322 Backfluorinated nhc carbenes and complexes
01/01/2015US20150004319 Vapor phase growth method
01/01/2015US20150004318 Nozzle and nozzle head
01/01/2015US20150004316 Methods Of Depositing A Metal Alloy Film
01/01/2015US20150004315 Bis(Trimethylsilyl) Six-Membered Ring Systems And Related Compounds As Reducing Agents For Forming Layers On A Substrate
01/01/2015US20150004314 Bis(trimethylsilyl) six-membered ring systems and related compounds as reducing agents for forming layers on a substrate
01/01/2015US20150004313 Apparatus of chemical vapor deposition with a showerhead regulating injection velocity of reactive gases positively and method thereof
01/01/2015US20150004312 Adjustable mask
01/01/2015US20150004042 Biomedical device, method for manufacturing the same and use thereof
01/01/2015US20150002164 Methods, equipment and systems for measuring radio frequency crosstalk
01/01/2015US20150002021 Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
01/01/2015US20150002019 Isolation of microwave sources through bellows
01/01/2015US20150000694 Method of reducing contamination in cvd chamber
01/01/2015US20150000598 Evaporation apparatus with gas supply
01/01/2015US20150000597 Reduced zinc showerhead
01/01/2015US20150000596 Mocvd gas diffusion system with gas inlet baffles
01/01/2015US20150000594 Apparatus of chemical vapor deposition with a showerhead regulating injection velocity of reactive gases positively and method thereof
01/01/2015US20150000593 Vacuum deposition source heating system and vacuum deposition system
12/2014
12/31/2014CN204058588U 一种用于微纳米颗粒表面修饰的装置 A device for micro-nano particle surface modification
12/31/2014CN104254908A Iii族氮化物半导体叠层衬底和iii族氮化物半导体场效应晶体管 Iii nitride semiconductor stacked substrate and iii nitride semiconductor field effect transistor
12/31/2014CN104254639A 用于对细长的、圆柱形的构件进行等离子涂覆的装置和方法 Apparatus and methods for an elongated, cylindrical member coated plasma
12/31/2014CN104254638A 通过汽相沉积在半导体晶片上沉积层的设备 By vapor deposition apparatus in the deposited layer on a semiconductor wafer
12/31/2014CN104254637A 石油开采或注水中dlc涂覆的闸阀 Oil or water in the dlc coated valve
12/31/2014CN104254636A 用于金属氧化物蒸气涂覆玻璃容器的通风橱 Vapor hood for the metal oxide coated glass containers
12/31/2014CN104254506A 石墨箔黏合的装置及其准备方法 Device and method of preparation of the graphite foil bonding
12/31/2014CN104253031A 进行再沉积制程时改善掺杂多晶硅片电阻阻值差异的方法 Improve the re-deposition process when doped polysilicon film resistor difference method
12/31/2014CN104250853A Iii族氮化物晶体 Iii nitride crystal
12/31/2014CN104250728A 具有气封的化学沉积腔室 With a gas seal chemical deposition chamber
12/31/2014CN104250727A 化学气相沉积设备保养后复机方法 After the chemical vapor deposition equipment maintenance complex machine approach
12/31/2014CN104250726A 石英管的防护方法 Quartz tube protection methods
12/31/2014CN104250725A 预沉积工艺、扩散工艺及扩散设备 Pre-deposition process, diffusion process and diffusion equipment
12/31/2014CN104250724A 多层保护膜的形成方法和多层保护膜的形成装置 Forming apparatus and method for forming a multi-layer protective film protective film
12/31/2014CN104250258A 氮杂聚硅烷前体和沉积包含该前体的薄膜的方法 Method aza polysilane precursors and deposition of the precursor film containing the
12/31/2014CN104249165A 涂覆的切削工具 The coated cutting tool
12/31/2014CN103147063B 一种TiNi合金表面制备金刚石涂层的方法 A method for the preparation of diamond-coated alloy TiNi
12/31/2014CN103074596B 采用电磁加热的cvd设备 Cvd electromagnetic heating equipment
12/31/2014CN103060777B 激光激发cvd镀膜设备 Laser excitation cvd coating equipment
12/31/2014CN103046026B 采用光加热的cvd设备 Heating equipment using optical cvd
12/31/2014CN102817011B 氮化硅膜沉积设备和沉积方法 Silicon nitride film deposition apparatus and deposition method
12/31/2014CN102762763B SiCOH低K膜的气相沉积法 Vapor deposition film of low-K SiCOH
12/31/2014CN102242350B 成膜方法和成膜装置 Film formation method and film forming apparatus
12/30/2014US8921740 Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support
12/30/2014US8921228 Method for selectively depositing noble metals on metal/metal nitride substrates
12/30/2014US8921212 Manufacturing apparatus and method for semiconductor device
12/30/2014US8921207 Tin precursors for vapor deposition and deposition processes
12/30/2014US8921205 Deposition of amorphous silicon-containing films
12/30/2014US8920888 Plasma process, film deposition method and system using rotary chuck
12/30/2014US8920877 Preparation of epitaxial graphene surfaces for atomic layer deposition of dielectrics
12/30/2014US8920875 Cyclooctatetraenetricarbonyl ruthenium complex, method of producing the same, and method of producing film using the complex as raw material
12/30/2014US8920600 Inductive plasma source with high coupling efficiency
12/30/2014US8920599 High efficiency gas dissociation in inductively coupled plasma reactor with improved uniformity
12/30/2014US8920598 Electrode and plasma processing apparatus
12/30/2014US8920597 Symmetric VHF source for a plasma reactor
12/30/2014US8920566 Wire feed pressure lock system
12/30/2014US8920565 Metalorganic chemical vapor deposition reactor
12/30/2014US8920564 Methods and apparatus for thermal based substrate processing with variable temperature capability
12/30/2014US8920563 Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same
12/30/2014US8920079 Joined product
12/30/2014US8919318 Germanium containing coating for inner surfaces of cylinder liners
12/30/2014US8919279 Processing system having magnet keeper
12/25/2014US20140377964 Apparatus for oxidation and annealing processes and method for the same
12/25/2014US20140377903 Method for producing vapor deposition mask, and method for producing organic semiconductor element
12/25/2014US20140377474 Method and use of a binder for providing a metallic coat covering a surface
12/25/2014US20140377462 Suspended Thin Films on Low-Stress Carbon Nanotube Support Structures
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 ... 719