Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/1987
10/06/1987US4698272 Extra-low iron loss grain oriented silicon steel sheets
10/06/1987US4698256 Plastic with intermediate soft carbon coating
10/06/1987US4698244 Deposition of titanium aluminides
10/01/1987DE3610719A1 Process for the production of a preform for an optical waveguide
10/01/1987DE3610161A1 Process for the production of a preform of an optical waveguide
09/1987
09/30/1987EP0239410A2 An electrode and a battery with the same
09/30/1987EP0238666A1 Surface treating method and apparatus.
09/29/1987US4696837 Chemical vapor deposition method of producing fluorine-doped tin oxide coatings
09/29/1987US4696834 Silicon-containing coatings and a method for their preparation
09/29/1987US4696833 Reduction of tungsten hexafluoride;
09/24/1987WO1987005700A1 Method and apparatus for monitoring surface layer growth
09/24/1987WO1987005539A1 Deposition of materials
09/23/1987EP0238315A1 Deposition process
09/23/1987EP0238093A1 Photosensitive member composed of charge transporting layer and charge generating layer
09/23/1987EP0238085A2 Improved diamond-like carbon films and process for production thereof
09/23/1987EP0238024A2 Depositing tungsten on a semiconductor substrate
09/23/1987EP0237684A2 Production of integrated-circuit devices incorporating a diffusion stop for oxygen
09/23/1987EP0237622A1 Coated ceramic-rotary cutting plate
09/22/1987US4695476 Process for coating the internal surface of zirconium tubes with neutron absorbers
09/22/1987US4694779 Reactor apparatus for semiconductor wafer processing
09/22/1987US4694778 Chemical vapor deposition wafer boat
09/22/1987US4694777 Apparatus for, and methods of, depositing a substance on a substrate
09/22/1987CA1227288A1 Process for preparing semiconductor layer
09/22/1987CA1227160A1 Coatings for ink jet nozzles
09/16/1987EP0236639A1 Flexible automatic installation for performing a fast thermochemical treatment
09/16/1987EP0236308A1 Vacuum vapor transport control
09/15/1987US4693944 Surface-coated wear-resistant member of cermet and process for producing same
09/15/1987US4693779 Manufacturing apparatus for semiconductor devices
09/15/1987US4693211 For processing a wafer substrate
09/15/1987CA1226766A1 Material vapor deposition technique
09/11/1987WO1987005409A1 Methods for applying simultaneously on a plurality of integrated circuit boards a film having a uniform thickness and consisting of arsenic or germanium selenide glass sensitized by a silver salt
09/10/1987DE3706818A1 Process for producing a decorative material
09/09/1987EP0235770A2 Device for the plasma processing of substrates in a high frequency excited plasma discharge
09/09/1987EP0235522A2 Apparatus and method for photochemical vapor deposition
09/09/1987CN86108874A Method for forming deposited film
09/08/1987US4692385 Triplex article
09/08/1987US4692345 Method for gettering heavy metal from a silicon plate
09/08/1987US4692343 Chemical vapor deposition
09/08/1987CA1226658A1 Fluorinated p-doped microcrystalline semiconductor alloys and method of preparation
09/02/1987EP0234593A2 Silicon-containing coatings and a method for their preparation
09/02/1987EP0234094A1 Method for forming deposited film
09/01/1987US4691078 Aluminum circuit to be disconnected and method of cutting the same
09/01/1987US4690872 Ceramic heater
09/01/1987US4690841 Pyrolytic boron nitride article
08/1987
08/27/1987WO1987005055A1 Process for forming an environmentally stable optical coating and structures formed thereby
08/27/1987WO1987005054A1 Apparatus for thermal treatments of thin parts such as silicon wafers
08/26/1987EP0233825A1 Process, apparatus and equipment necessary for depositing a thin layer of a material on the inner surface of a hollow object
08/26/1987EP0233610A2 Method and apparatus for vapor deposition
08/26/1987CN87100626A Automated flexible installation for rapid thermochemical treatment
08/25/1987US4689247 Process and apparatus for forming thin films
08/25/1987US4689212 Vaporizing silica and dopant in plasma to yield high-purity fibers
08/25/1987US4689094 Compensation doping of group III-V materials
08/20/1987DE3703078A1 Thread guide with low-wear surface coating
08/19/1987EP0232748A1 Process for filling isolation trenches in integrated circuits
08/18/1987US4687702 Structural insulating panel and method of making the panel
08/18/1987US4687682 Integrated circuits; semiconductors
08/18/1987US4687560 Oxidation
08/18/1987CA1225547A1 Method and apparatus for bonding coatings to dental components
08/13/1987WO1987004733A1 Plant for the chemical infiltration in vapor phase of a refractory material other than carbon
08/12/1987EP0231660A2 Method for producing an electronic device having a multi-layer structure
08/12/1987EP0231262A1 Photochemical vapor deposition process for depositing oxide layers.
08/12/1987EP0225342A4 Method of producing transparent, haze-free tin oxide coatings.
08/12/1987CN87100186A Process for adhesiven metallization on the ceranlic matarial
08/11/1987US4686116 Chemically vapor depositing a carbonaceous film
08/11/1987US4686113 Plasma confinement in a low pressure electrically grounded R.F. heated reactor and deposition method
08/11/1987US4685976 Multi-layer semiconductor processing with scavenging between layers by excimer laser
08/11/1987CA1225363A1 Process for depositing metallic copper
08/06/1987DE3602988A1 Polysilite plant
08/05/1987EP0230993A2 Films, layers, tapes, plates and similar structures of metal or plastic materials coated with thin polyfluorocarbon films
08/05/1987EP0230927A2 Diamond manufacturing
08/05/1987EP0230788A1 Method for preparation of multi-layer structure film
08/04/1987US4685030 Surface mounted circuits including hybrid circuits, having CVD interconnects, and method of preparing the circuits
08/04/1987US4684542 Low pressure chemical vapor deposition of tungsten silicide
08/04/1987CA1224983A1 Process for the production of glass panes having a glare protection filter and apparatus for carrying out the process
07/1987
07/29/1987EP0229936A1 Hard metal coatings for components under mechanical and corrosive stress
07/29/1987EP0229915A1 Process for the highly adhesive metallization of ceramic materials
07/29/1987CN86108935A Method of producing silican diffusion coatings on metal articles
07/29/1987CN86108685A Method for forming deposited film
07/29/1987CN86108453A Electrophotographic photosensitive member, process and apparatus for preparation thereof
07/28/1987US4683147 Method of forming deposition film
07/28/1987US4683146 From silicon hydride
07/28/1987US4683145 From a silicon compound
07/28/1987US4683144 Method for forming a deposited film
07/22/1987EP0229707A2 Method for forming deposited film
07/22/1987EP0229633A2 Apparatus and method for laser-induced chemical vapor deposition
07/22/1987EP0229522A2 A method of producing a functionally gradient material
07/22/1987EP0229518A2 Method for forming deposited film
07/22/1987EP0229488A1 Etch resistant wafer boat and process
07/22/1987EP0229282A1 Method for the production of a coated member
07/22/1987EP0177517B1 Process for depositing a thin transparent layer on the surface of optical elements
07/21/1987US4681777 Method for electroless and vapor deposition of thin films of three tin sulfide phases on conductive and nonconductive substrates
07/21/1987US4681653 Planarized dielectric deposited using plasma enhanced chemical vapor deposition
07/21/1987US4681652 Crystals/single/, rings, concentric, insulation
07/21/1987US4681640 Germane, alkylgermanes, dimethylcadium, trimethylaluminum
07/15/1987EP0228910A1 Apparatus for forming deposited film
07/15/1987EP0228870A2 Method for forming deposited film
07/15/1987EP0228394A1 An apparatus for coating substrates by plasma discharge.
07/14/1987US4680447 Cooled optical window for semiconductor wafer heating
07/14/1987CA1224120A1 Method of and apparatus for producing a controlled unsaturated vapour pressure of a volatile liquid in a heat treatment chamber, a method of growing a layer of a substance on a substrate by a liquid epitaxy growth process, and to a method of annealing a
07/14/1987CA1224091A1 Chemical vapor deposition of metal compound coatings utilizing metal sub-halide