Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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03/31/1987 | US4654226 Apparatus and method for photochemical vapor deposition |
03/31/1987 | US4653428 Selective chemical vapor deposition apparatus |
03/31/1987 | CA1219968A1 Apparatus for and method of depositing a highly conductive, highly transmissive film |
03/26/1987 | WO1987001738A1 Method and device for chemical treatment, particularly thermochemical treatment and chemical deposition in a large volume homogeneous plasma |
03/26/1987 | WO1987001614A1 Vacuum vapor transport control |
03/25/1987 | EP0215554A1 Method of producing brazing metals |
03/25/1987 | EP0215134A1 Process for producing unidirectional silicon steel plate with extraordinarily low iron loss |
03/25/1987 | EP0214978A1 Method for making coatings of boron carbides and coatings obtained thereby. |
03/24/1987 | US4652463 Oxidation of metals |
03/24/1987 | US4651674 Apparatus for vapor deposition |
03/24/1987 | CA1219549A1 Cutting tool and method of manufacture thereof |
03/18/1987 | EP0214331A1 Aluminum oxide optical fiber coating |
03/17/1987 | US4650698 Method of forming a thin film of a metal or metal compound on a substrate |
03/17/1987 | US4650693 Method for producing an aerosol stream |
03/17/1987 | US4650539 Manufacture of cadmium mercury telluride |
03/17/1987 | US4649859 Reactor design for uniform chemical vapor deposition-grown films without substrate rotation |
03/17/1987 | CA1219240A1 Method of making amorphous semiconductor alloys and devices using microwave energy |
03/11/1987 | EP0214024A2 Tin oxide layer, deposition process and substrate so coated |
03/11/1987 | EP0213715A2 Method for synthesizing magnesia-alumina-silica glasses and ceramics |
03/10/1987 | US4649084 Process for adhering an oxide coating on a cobalt-enriched zone, and articles made from said process |
03/10/1987 | US4649059 Photoionization technique for growth of metallic films |
03/10/1987 | US4648348 Plasma CVD apparatus |
03/04/1987 | EP0213045A2 Process for depositing a silica coating with an irregular surface on a glass substrate |
03/04/1987 | EP0212910A2 Method and apparatus for the chemical vapour deposition of III-V semiconductors utilizing organometallic and elemental pnictide sources |
03/04/1987 | EP0212718A2 Process and apparatus for the internal coating of tubes |
03/04/1987 | EP0212712A1 Process for manufacturing seamless hollow bodies, hollow bodies obtained by this process and apparatus used in these hollow spheres |
03/04/1987 | EP0212691A1 Low temperature chemical vapor deposition of silicon dioxide films |
03/04/1987 | EP0212524A2 Hard metal alloy with surface region enriched with tantalum, niobium, vanadium or combinations thereof and methods of making the same |
03/04/1987 | EP0212117A1 CVD Heat source |
03/04/1987 | EP0212116A1 CVD temperature control |
03/04/1987 | EP0211939A1 Process of manufacturing seal members having a low friction coefficient |
03/04/1987 | EP0211938A1 System and method for depositing plural thin film layers on a substrate. |
03/03/1987 | US4647512 Diamond-like carbon films and process for production thereof |
03/03/1987 | US4647338 Method of manufacturing a semiconductor device, in which a semiconductor substrate is subjected to a treatment in a reaction gas |
03/03/1987 | US4646681 Gaseous phase method accumulated film manufacturing apparatus |
02/25/1987 | EP0211557A2 Metal-ceramics jointed articles |
02/25/1987 | EP0211190A1 CVD plasma reactor |
02/24/1987 | US4645977 Vapor deposition using vacuum enclosure, accelerating means, and second vacuum chamber where accelerated plasma forms uniform film; |
02/24/1987 | US4645713 Heat graphitization of a carbon film formed by plasma-discharged-treated hydrocarbon gas |
02/17/1987 | US4643952 Coating film by ion plating |
02/17/1987 | US4643948 Coatings for ink jet nozzles |
02/17/1987 | CA1217936A1 Apparatus for providing depletion-free uniform thickness cvd thin-film on semiconductor wafers |
02/12/1987 | WO1987000965A1 Method and apparatus for the chemical vapor deposition of iii-v semiconductors utilizing organometallic and elemental pnictide sources |
02/12/1987 | DE3527948A1 Process for the production of tools with coated flute, such as drills, milling tools or the like |
02/10/1987 | US4642243 Electrode ionization |
02/10/1987 | US4642208 Method and apparatus for disposing dust produced during amorphous silicon film-forming process |
02/10/1987 | US4642171 Phototreating apparatus |
02/10/1987 | US4641604 Chemical vapor deposition wafer boat |
02/10/1987 | US4641450 Tube having strain-hardened inside coating |
02/04/1987 | EP0210724A1 Methods of depositing germanium carbide |
02/04/1987 | EP0210578A2 System and method for depositing an electrical insulator in a continuous process |
02/04/1987 | EP0210476A1 Bubbler cylinder device |
02/04/1987 | CN86105600A Vacuum chemical reaction apparatus |
02/03/1987 | US4641002 Titanium and zirconium nitride |
02/03/1987 | US4640869 Multilayer vapor deposition wear resistant protective coating |
02/03/1987 | US4640845 Semiconductor photoelectric conversion devices; solar cells |
02/03/1987 | US4640224 CVD heat source |
02/03/1987 | US4640223 Chemical vapor deposition reactor |
02/03/1987 | US4640221 Vacuum deposition system with improved mass flow control |
01/29/1987 | WO1987000685A1 Photochemical vapor deposition process for depositing oxide layers |
01/28/1987 | EP0210033A1 Dielectric thin films |
01/28/1987 | EP0209972A1 Methods of depositing germanium hydrogen carbide |
01/27/1987 | US4638762 Chemical vapor deposition method and apparatus |
01/21/1987 | EP0209131A2 Optical CVD method with a strong optical intensity used during an initial period and device therefor |
01/21/1987 | EP0209109A2 Method of and apparatus for forming film by utilizing low-temperature plasma |
01/21/1987 | EP0208966A1 Apparatus for, and methods of, depositing a substance on a substrate |
01/20/1987 | US4637938 Methods of using selective optical excitation in deposition processes and the detection of new compositions |
01/20/1987 | US4637342 Vacuum processing apparatus |
01/20/1987 | EP0150204A4 Non-iridescent glass structure and coating process for making same. |
01/14/1987 | EP0208459A2 Process for the chemical vapour deposition of a thin film of oxide on a silicon wafer |
01/13/1987 | US4636403 Method of repairing a defective photomask |
01/13/1987 | US4636401 Chemical reactors, heating, light, electricity, exhaustion, pumps |
01/13/1987 | US4636400 Method of treating silicon nitride film formed by plasma deposition |
01/13/1987 | US4635586 Setup for producing metallic coatings |
01/13/1987 | CA1216419A1 Chemical vapor deposition apparatus |
01/10/1987 | CN85101843A Electric insulation thin layer |
01/08/1987 | DE3614398A1 Arrangement for the treatment of workpieces using an evacuatable chamber |
01/07/1987 | EP0207767A2 Pulsed plasma apparatus and process |
01/07/1987 | EP0207759A2 Process for the production of multi-metallic amorphous alloy coatings |
01/07/1987 | EP0207467A1 Method for the preparation of a coated blade of a microtome |
01/07/1987 | EP0207315A2 Superconducting filament and method of making the same |
01/07/1987 | CN86104685A Method for superconductive fibres and their manufacture |
01/07/1987 | CN85104968A Glow discharge decomposing device |
01/07/1987 | CN85104959A Body with superhard coating |
01/06/1987 | US4634635 Black ornament |
01/06/1987 | US4634605 Method for the indirect deposition of amorphous silicon and polycrystalline silicone and alloys thereof |
01/06/1987 | US4634601 Method for production of semiconductor by glow discharge decomposition of silane |
01/06/1987 | US4633893 Apparatus for treating semiconductor wafers |
01/06/1987 | US4633812 Alumina ceramic |
01/06/1987 | US4633811 Plasma CVD apparatus |
01/06/1987 | US4633809 Causing glow discharge in gaseous silicon compound |
01/02/1987 | DE3614384A1 Method for coating substrates in a vacuum chamber |
01/02/1987 | DE3522817A1 Process for the production of protective coatings which prevent vegetative or animal colonisation and rodent or insect damage |
12/31/1986 | WO1986007614A1 Method of treating the surface of iron alloy materials |
12/31/1986 | CN86104496A Process for the production of multimetallic amorphous alloy coatings |
12/30/1986 | US4633051 Stable conductive elements for direct exposure to reactive environments |
12/30/1986 | US4632058 Apparatus for uniform chemical vapor deposition |
12/30/1986 | US4632057 CVD plasma reactor |
12/30/1986 | US4632056 Chemical vapor deposition apparatus |
12/30/1986 | EP0206937A2 Stress relieved intermediate insulating layer for multilayer metalization |