Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
03/1987
03/31/1987US4654226 Apparatus and method for photochemical vapor deposition
03/31/1987US4653428 Selective chemical vapor deposition apparatus
03/31/1987CA1219968A1 Apparatus for and method of depositing a highly conductive, highly transmissive film
03/26/1987WO1987001738A1 Method and device for chemical treatment, particularly thermochemical treatment and chemical deposition in a large volume homogeneous plasma
03/26/1987WO1987001614A1 Vacuum vapor transport control
03/25/1987EP0215554A1 Method of producing brazing metals
03/25/1987EP0215134A1 Process for producing unidirectional silicon steel plate with extraordinarily low iron loss
03/25/1987EP0214978A1 Method for making coatings of boron carbides and coatings obtained thereby.
03/24/1987US4652463 Oxidation of metals
03/24/1987US4651674 Apparatus for vapor deposition
03/24/1987CA1219549A1 Cutting tool and method of manufacture thereof
03/18/1987EP0214331A1 Aluminum oxide optical fiber coating
03/17/1987US4650698 Method of forming a thin film of a metal or metal compound on a substrate
03/17/1987US4650693 Method for producing an aerosol stream
03/17/1987US4650539 Manufacture of cadmium mercury telluride
03/17/1987US4649859 Reactor design for uniform chemical vapor deposition-grown films without substrate rotation
03/17/1987CA1219240A1 Method of making amorphous semiconductor alloys and devices using microwave energy
03/11/1987EP0214024A2 Tin oxide layer, deposition process and substrate so coated
03/11/1987EP0213715A2 Method for synthesizing magnesia-alumina-silica glasses and ceramics
03/10/1987US4649084 Process for adhering an oxide coating on a cobalt-enriched zone, and articles made from said process
03/10/1987US4649059 Photoionization technique for growth of metallic films
03/10/1987US4648348 Plasma CVD apparatus
03/04/1987EP0213045A2 Process for depositing a silica coating with an irregular surface on a glass substrate
03/04/1987EP0212910A2 Method and apparatus for the chemical vapour deposition of III-V semiconductors utilizing organometallic and elemental pnictide sources
03/04/1987EP0212718A2 Process and apparatus for the internal coating of tubes
03/04/1987EP0212712A1 Process for manufacturing seamless hollow bodies, hollow bodies obtained by this process and apparatus used in these hollow spheres
03/04/1987EP0212691A1 Low temperature chemical vapor deposition of silicon dioxide films
03/04/1987EP0212524A2 Hard metal alloy with surface region enriched with tantalum, niobium, vanadium or combinations thereof and methods of making the same
03/04/1987EP0212117A1 CVD Heat source
03/04/1987EP0212116A1 CVD temperature control
03/04/1987EP0211939A1 Process of manufacturing seal members having a low friction coefficient
03/04/1987EP0211938A1 System and method for depositing plural thin film layers on a substrate.
03/03/1987US4647512 Diamond-like carbon films and process for production thereof
03/03/1987US4647338 Method of manufacturing a semiconductor device, in which a semiconductor substrate is subjected to a treatment in a reaction gas
03/03/1987US4646681 Gaseous phase method accumulated film manufacturing apparatus
02/1987
02/25/1987EP0211557A2 Metal-ceramics jointed articles
02/25/1987EP0211190A1 CVD plasma reactor
02/24/1987US4645977 Vapor deposition using vacuum enclosure, accelerating means, and second vacuum chamber where accelerated plasma forms uniform film;
02/24/1987US4645713 Heat graphitization of a carbon film formed by plasma-discharged-treated hydrocarbon gas
02/17/1987US4643952 Coating film by ion plating
02/17/1987US4643948 Coatings for ink jet nozzles
02/17/1987CA1217936A1 Apparatus for providing depletion-free uniform thickness cvd thin-film on semiconductor wafers
02/12/1987WO1987000965A1 Method and apparatus for the chemical vapor deposition of iii-v semiconductors utilizing organometallic and elemental pnictide sources
02/12/1987DE3527948A1 Process for the production of tools with coated flute, such as drills, milling tools or the like
02/10/1987US4642243 Electrode ionization
02/10/1987US4642208 Method and apparatus for disposing dust produced during amorphous silicon film-forming process
02/10/1987US4642171 Phototreating apparatus
02/10/1987US4641604 Chemical vapor deposition wafer boat
02/10/1987US4641450 Tube having strain-hardened inside coating
02/04/1987EP0210724A1 Methods of depositing germanium carbide
02/04/1987EP0210578A2 System and method for depositing an electrical insulator in a continuous process
02/04/1987EP0210476A1 Bubbler cylinder device
02/04/1987CN86105600A Vacuum chemical reaction apparatus
02/03/1987US4641002 Titanium and zirconium nitride
02/03/1987US4640869 Multilayer vapor deposition wear resistant protective coating
02/03/1987US4640845 Semiconductor photoelectric conversion devices; solar cells
02/03/1987US4640224 CVD heat source
02/03/1987US4640223 Chemical vapor deposition reactor
02/03/1987US4640221 Vacuum deposition system with improved mass flow control
01/1987
01/29/1987WO1987000685A1 Photochemical vapor deposition process for depositing oxide layers
01/28/1987EP0210033A1 Dielectric thin films
01/28/1987EP0209972A1 Methods of depositing germanium hydrogen carbide
01/27/1987US4638762 Chemical vapor deposition method and apparatus
01/21/1987EP0209131A2 Optical CVD method with a strong optical intensity used during an initial period and device therefor
01/21/1987EP0209109A2 Method of and apparatus for forming film by utilizing low-temperature plasma
01/21/1987EP0208966A1 Apparatus for, and methods of, depositing a substance on a substrate
01/20/1987US4637938 Methods of using selective optical excitation in deposition processes and the detection of new compositions
01/20/1987US4637342 Vacuum processing apparatus
01/20/1987EP0150204A4 Non-iridescent glass structure and coating process for making same.
01/14/1987EP0208459A2 Process for the chemical vapour deposition of a thin film of oxide on a silicon wafer
01/13/1987US4636403 Method of repairing a defective photomask
01/13/1987US4636401 Chemical reactors, heating, light, electricity, exhaustion, pumps
01/13/1987US4636400 Method of treating silicon nitride film formed by plasma deposition
01/13/1987US4635586 Setup for producing metallic coatings
01/13/1987CA1216419A1 Chemical vapor deposition apparatus
01/10/1987CN85101843A Electric insulation thin layer
01/08/1987DE3614398A1 Arrangement for the treatment of workpieces using an evacuatable chamber
01/07/1987EP0207767A2 Pulsed plasma apparatus and process
01/07/1987EP0207759A2 Process for the production of multi-metallic amorphous alloy coatings
01/07/1987EP0207467A1 Method for the preparation of a coated blade of a microtome
01/07/1987EP0207315A2 Superconducting filament and method of making the same
01/07/1987CN86104685A Method for superconductive fibres and their manufacture
01/07/1987CN85104968A Glow discharge decomposing device
01/07/1987CN85104959A Body with superhard coating
01/06/1987US4634635 Black ornament
01/06/1987US4634605 Method for the indirect deposition of amorphous silicon and polycrystalline silicone and alloys thereof
01/06/1987US4634601 Method for production of semiconductor by glow discharge decomposition of silane
01/06/1987US4633893 Apparatus for treating semiconductor wafers
01/06/1987US4633812 Alumina ceramic
01/06/1987US4633811 Plasma CVD apparatus
01/06/1987US4633809 Causing glow discharge in gaseous silicon compound
01/02/1987DE3614384A1 Method for coating substrates in a vacuum chamber
01/02/1987DE3522817A1 Process for the production of protective coatings which prevent vegetative or animal colonisation and rodent or insect damage
12/1986
12/31/1986WO1986007614A1 Method of treating the surface of iron alloy materials
12/31/1986CN86104496A Process for the production of multimetallic amorphous alloy coatings
12/30/1986US4633051 Stable conductive elements for direct exposure to reactive environments
12/30/1986US4632058 Apparatus for uniform chemical vapor deposition
12/30/1986US4632057 CVD plasma reactor
12/30/1986US4632056 Chemical vapor deposition apparatus
12/30/1986EP0206937A2 Stress relieved intermediate insulating layer for multilayer metalization