Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
04/1984
04/25/1984EP0106521A2 Baffle system for glow discharge deposition apparatus
04/25/1984EP0106497A2 Ion shower apparatus
04/24/1984US4444811 Fluidized bed silicon deposition from silane
04/24/1984US4444805 Vacuum deposition of carbon from hydrocarbon gases, frequencies
04/24/1984CA1166129A1 Prevention of low pressure chemical vapor deposition silicon dioxide undercutting and flaking
04/24/1984CA1166128A1 Low pressure chemical vapor deposition of silicon dioxide with oxygen enhancement of the chlorosilane- nitrous oxide reaction
04/18/1984EP0105835A1 Method of producing a hard layer on articles of Ti or Ti-alloys
04/17/1984US4443529 Photoconductive member having an amorphous silicon photoconductor and a double-layer barrier layer
04/17/1984US4443489 Method for the formation of phosphorous-nitrogen based glasses useful for the passivation of III-V semiconductor materials
04/17/1984US4443488 Semiconductors, multistage, thin films, extraction, coalescing
04/17/1984US4443410 Integrated circuits, thin films, cassettes
04/17/1984CA1165551A1 Optical fiber fabrication and resulting product
04/10/1984US4442169 Multiple coated cutting tool and method for producing same
04/04/1984EP0104907A2 Method of making amorphous semiconductor alloys and devices using microwave energy
04/04/1984EP0104764A2 Chemical vapor deposition apparatus and process
04/04/1984EP0104658A1 Process for forming thin film
04/04/1984EP0104405A1 Silicon carbide materials
04/03/1984US4441113 P-Type semiconductor material having a wide band gap
04/03/1984US4440618 Gas discharge device comprising a pressure controller for controlling a pressure over a wide range
04/03/1984US4440108 Ion beam coating apparatus
04/03/1984US4440107 Magnetic apparatus for reducing substrate warpage
04/03/1984CA1165015A1 Organometallic semiconductor devices
03/1984
03/27/1984US4439463 Plasma assisted deposition system
03/27/1984US4439410 Method of manufacturing silicon from powdered material containing silica
03/27/1984US4438724 Grooved gas gate
03/27/1984US4438723 Multiple chamber deposition and isolation system and method
03/21/1984EP0103505A1 Method of preparing thin layers
03/21/1984EP0103470A1 Titanium disulfide thin film and process for fabricating the same
03/21/1984EP0103280A2 Fabrication method of membrane structure
03/21/1984EP0103149A1 Poly(arylene sulfide) printed circuit boards
03/20/1984US4438368 Plasma treating apparatus
03/20/1984US4438188 Glow discharge, vapor deposition
03/20/1984US4438154 Method of fabricating an amorphous silicon film
03/20/1984US4437932 Dissolution of metals utilizing a furan derivative
03/13/1984US4436830 Nitride hardfacing
03/13/1984US4436770 Vapor deposition
03/13/1984US4436769 Metal organic vapor deposition procedure for preparing group III--V compounds on a heated substrate
03/13/1984US4436762 Low pressure plasma discharge formation of refractory coatings
03/13/1984US4436761 Method for treatment of metal substrate for growth of hydrogen-containing semiconductor film
03/13/1984US4436674 Vapor mass flow control system
03/06/1984US4435445 Production of silicon-germanium alloy film from silane and germane
03/06/1984US4434742 Installation for depositing thin layers in the reactive vapor phase
02/1984
02/28/1984USRE31526 Coated cemented carbide body and method of making such a body
02/28/1984US4434188 Method for synthesizing diamond
02/28/1984CA1162798A1 Method for preparing adherent layers on polyolefins
02/22/1984EP0101286A1 Grooved gas gate
02/21/1984US4433012 Process for the pyrolytic deposition of aluminum from TIBA
02/21/1984CA1162385A1 Preparation of silicon metal through polymer degradation
02/14/1984US4431708 Annealed CVD molybdenum thin film surface
02/14/1984US4430959 Semiconductor vapor phase growing apparatus
02/07/1984US4430364 Monovalent aluminum halide
02/07/1984US4430361 Glow discharges, ferromagnetism, backings, plates, velocities, joining
02/07/1984US4430185 Method of producing photoelectric transducers
02/07/1984US4430149 Chemical vapor deposition of epitaxial silicon
02/07/1984CA1161966A1 Computer controlled system and process for processing semiconductor wafers
02/01/1984EP0099725A2 High pressure, non-local thermal equilibrium arc plasma generating apparatus for deposition of coatings upon substrates
02/01/1984EP0099708A1 Magnetic apparatus for reducing substrate warpage
01/1984
01/31/1984US4428975 Process for improving nitride deposition on a semiconductor wafer
01/25/1984EP0099257A1 Apparatus for uniformly heating a substrate
01/24/1984US4427720 Vapor phase process for the deposition of a protective metal coating on a metallic piece
01/24/1984US4427445 Tungsten alloys containing A15 structure and method for making same
01/17/1984US4426408 Method of deposition of silicon in fine crystalline form
01/11/1984EP0097819A1 Photo deposition of metals onto substrates
01/11/1984EP0097694A1 Process for making inorganic oxide fibers
01/10/1984CA1160179A1 Glow discharge deposition of films from disilane or digermane gas
01/03/1984US4424199 Fluid jet seed particle generator for silane pyrolysis reactor
01/03/1984US4424096 Radio frequency
01/03/1984US4423701 Glow discharge deposition apparatus including a non-horizontally disposed cathode
01/03/1984CA1159724A1 Method of controlling the index profile of optical fiber preforms
01/03/1984CA1159723A1 Process for the production of an electrically conductive article
12/1983
12/27/1983US4422898 Iron pentacarbonyl decomposition, patterns, etching
12/27/1983US4422407 Apparatus for chemically activated deposition in a plasma
12/22/1983WO1983004420A1 Process for forming sulfide layers
12/20/1983CA1159012A1 Plasma deposition apparatus
12/13/1983US4420498 Using a mixed gas of titanium, zirconium, or hafnium halide, hydrogen, and nitrogen
12/08/1983WO1983004269A1 Maskless growth of patterned films
12/07/1983EP0095963A1 Process for the inner gas plating of small holes in steel parts
12/07/1983EP0095887A1 Apparatus for plasma chemical vapour deposition
12/07/1983EP0095729A2 Hermetic coating by heterogeneous nucleation thermochemical deposition
12/06/1983US4419385 Low temperature process for depositing an oxide dielectric layer on a conductive surface and multilayer structures formed thereby
12/06/1983US4419380 Method for ion-aided coating on electrically insulating substrates
12/06/1983US4419335 Process for producing rhombohedral system boron nitride
12/06/1983US4418645 Glow discharge apparatus with squirrel cage electrode
12/06/1983CA1158109A1 Coating of semiconductor wafers and apparatus therefor
11/1983
11/30/1983EP0095275A2 Photo-assisted CVD
11/30/1983EP0095196A1 Resilient bearing support for high-speed rotors, particularly for turbo machines
11/29/1983US4417914 Vapor phase reaction of germane and silane with oxygen, then depositing on semiconductor
11/22/1983US4416952 Passivation, dielectrics, optical absorbers
11/22/1983US4416913 Ascending differential silicon harvesting means and method
11/22/1983US4416912 Formation of coatings on cutting edges
11/16/1983EP0094053A1 Plasma method for making a dielectric rod
11/15/1983US4415609 Vapor deposition of a silicon carbide using a gaseous blend of hydrocarbon and silane; stoichiometry; wetting
11/08/1983US4414085 Sputtering, carbon
11/08/1983US4414082 Process for cracking hydrocarbons
11/08/1983CA1156517A1 Fluidizing fine powder to be coated with valve metal by admixing with coarse powder
11/02/1983EP0092586A1 An amorphous silicon material fabricated by a magnetically aligned glow discharge
11/01/1983US4413302 Structural member made from a metallic material having an upper surface exposed to the danger of electric charge building-up thereon and the use of such structural member
11/01/1983US4413022 Vapor reactions
11/01/1983US4412903 Coating infra red transparent semiconductor material
11/01/1983CA1156036A1 Fluidized bed oven and method of emptying the same