Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
01/1986
01/02/1986EP0166383A2 Continuous deposition of activated process gases
01/02/1986EP0166308A2 Apparatus and method for narrow line width pattern fabrication
01/02/1986EP0166216A2 Method of forming a nitride layer
12/1985
12/31/1985US4562093 Process for the production of glass panes having a glare protection filter and apparatus for carrying out the process
12/27/1985EP0165618A2 Glow-discharge decomposition apparatus
12/27/1985EP0165493A2 Liquid replenishing apparatus
12/24/1985US4560589 Pyrolyzing the vapor of a silane or polysilane compound
12/24/1985US4560575 Reacting boron trichloride and anhydrous ammonia in vapor phase
12/18/1985EP0164928A2 Vertical hot wall CVD reactor
12/17/1985CA1198019A1 Chemical vapor deposition of vanadium oxide coatings
12/12/1985EP0129588A4 Damped chemical vapor deposition of smooth doped films.
12/10/1985US4558144 Volatile metal complexes
12/10/1985US4557950 Reacting silicon, oxygen, phosphorous and boron compounds at low pressure
12/10/1985US4557943 Metal-silicide deposition using plasma-enhanced chemical vapor deposition
12/04/1985EP0163457A2 Manufacturing optical fibre
12/03/1985US4556584 Method for providing substantially waste-free chemical vapor deposition of thin-film on semiconductor substrates
12/03/1985CA1197493A1 High pressure, non-local thermal equilibrium arc plasma generating apparatus for deposition of coating upon substrates
12/03/1985CA1197375A1 Apparatus for continuously depositing a layer of a solid material on the surface of a substrate brought to a high temperature
11/1985
11/27/1985EP0162711A2 Method of selectively forming an insulation layer
11/27/1985EP0162656A2 Multilayer coated cemented carbides
11/27/1985EP0162548A1 Method for formation of metal compound coating
11/27/1985EP0162111A1 Method and apparatus for chemical vapor deposition
11/26/1985US4555416 Accurate and controlled hot coating of glassware by a metal compound
11/21/1985EP0161829A2 Process for preparing diamond thin film
11/19/1985US4554180 Decomposition of a cyclic silane
11/19/1985US4554078 Methods of and apparatus for effluent disposal
11/19/1985CA1196777A1 Chemical vapor deposition apparatus and process
11/13/1985EP0161101A2 Chemical vapor deposition wafer boat
11/13/1985EP0161020A1 Method of manufacturing semiconductor devices, in which material is deposited from a reaction gas, and apparatus for carrying out such a method
11/12/1985US4552824 Electrophotographic photosensitive member and process for production thereof
11/12/1985US4552783 Enhancing the selectivity of tungsten deposition on conductor and semiconductor surfaces
11/12/1985CA1196604A1 Substrate shield for preventing the deposition of nonhomogeneous films
11/06/1985EP0160365A1 Method of making amorphous semiconductor alloys and devices using microwave energy
11/06/1985EP0160202A2 Microwave plasma deposition of coatings and the microwave plasma applied coatings applied thereby
11/05/1985US4551352 Method of making P-type hydrogenated amorphous silicon
11/05/1985US4551197 Method and apparatus for the recovery and recycling of condensable gas reactants
11/05/1985US4550684 Cooled optical window for semiconductor wafer heating
10/1985
10/30/1985EP0159815A1 Coating process
10/29/1985US4550257 Narrow line width pattern fabrication
10/29/1985US4550014 Method for production of free-standing polycrystalline boron phosphide film
10/29/1985US4549889 Refining process of reactive gas for forming semiconductor layer
10/24/1985WO1985004601A1 Process for depositing a thin transparent layer on the surface of optical elements
10/22/1985US4548786 Cobalt enriched zone on surface to be coated
10/22/1985US4548159 Chemical vapor deposition wafer boat
10/22/1985CA1195592A2 Carburizing process utilizing atmosphere generated from nitrogen ethanol based mixtures
10/15/1985US4547404 Controlling temperature-chemical reactor surrounded and spaced apart from walls of vacuum chamber
10/15/1985US4547248 Automatic shutoff valve
10/15/1985US4547247 Single wafer, planar electrode type
10/09/1985EP0157212A2 Articles coated with adherent diamondlike carbon films
10/09/1985EP0157052A1 Low resistivity tungsten silicon composite film
10/09/1985EP0157040A2 Method of producing transparent polycrystalline ZnS body
10/09/1985EP0156857A1 Method and apparatus for coating a substrate.
10/08/1985US4546016 Vapor deposition of oxygen and boron, silicon and phosphorous hydrides
10/08/1985US4546008 Method for forming a deposition film
10/08/1985US4545801 Gaseous glass for preform
10/08/1985US4545328 Plasma vapor deposition film forming apparatus
10/08/1985US4545327 Chemical vapor deposition apparatus
10/08/1985US4545136 Isolation valve
10/08/1985CA1194701A1 Bulk production of alloys by deposition from the vapour phase and apparatus therefor
10/01/1985US4544423 Amorphous silicon semiconductor and process for same
10/01/1985CA1194617A1 Grooved gas gate
10/01/1985CA1194390A1 Dissolution of metals utilizing a furan derivative
10/01/1985CA1194385A1 Device fabrication using gas-solid processes
10/01/1985CA1194275A1 Fluid jet seed particle generator for silane pyrolysis reactor
09/1985
09/24/1985US4543271 Homogeneously chemically bonded, containing minimum amorphous silicon
09/24/1985US4543270 Nucleation
09/24/1985US4543267 Method of making a non-single-crystalline semi-conductor layer on a substrate
09/24/1985US4543266 Plasma deposition, silicon nitride, boron nitride, silicon carbidecyclotrons, heating, frames
09/24/1985US4542711 Continuous system for depositing amorphous semiconductor material
09/24/1985CA1194196A1 Masking techniques in chemical vapor deposition
09/18/1985EP0154814A2 Substrates coated by plasma enhanced chemical vapor deposition, apparatus and process for their production
09/11/1985EP0154561A2 Improved apparatus and method for laser-induced chemical vapor deposition
09/11/1985EP0154483A2 Improved pulsed plasma process
09/11/1985EP0154482A2 Coating process
09/11/1985EP0154160A1 Method and apparatus for making electrophotographic devices
09/10/1985US4540607 Selective LPCVD tungsten deposition by the silicon reduction method
09/10/1985US4540606 Method of forming a heat-barrier layer on a metal substrate
09/10/1985US4540601 Aluminum oxide optical fiber coating
09/10/1985US4540466 Method of fabricating semiconductor device by dry process utilizing photochemical reaction, and apparatus therefor
09/10/1985US4539934 Plasma vapor deposition film forming apparatus
09/10/1985US4539933 Chemical vapor deposition apparatus
09/10/1985CA1193071A1 Method of manufacturing silicon from powdered material containing silica
09/04/1985EP0153468A2 Process and apparatus for light-induced photolytic deposition
09/03/1985US4539221 Dinitrogen monoxide as exidizer
09/03/1985US4539068 Vapor deposition, crystallization
09/03/1985US4539062 Modular plasma reactor with local atmosphere
09/03/1985CA1192819A1 Method for grading the band gaps of amorphous alloys and devices
09/03/1985CA1192818A1 Method for optimizing photoresponsive amorphous alloys and devices
09/03/1985CA1192817A1 Method for increasing the band gap in photoresponsive amorphous alloys and devices
09/03/1985CA1192816A1 Method for making photoresponsive amorphous germanium alloys and devices
08/1985
08/29/1985WO1985003803A1 Film forming method and apparatus
08/29/1985WO1985003727A1 Deposition technique
08/28/1985EP0152951A2 Method of strengthening ceramics
08/28/1985EP0152669A2 Continuous pnictide source and delivery system for film deposition, particularly by chemical vapour deposition
08/28/1985EP0152668A2 High vacuum deposition processes employing a continuous pnictide delivery system
08/27/1985US4537795 Method for introducing sweep gases into a glow discharge deposition apparatus
08/27/1985EP0128169A4 Chemical vapor deposition of titanium nitride and like films.
08/27/1985CA1192475A1 Manufacture of cadmium mercury telluride
08/21/1985EP0151754A2 An improved method of making a photoconductive member
08/20/1985US4536227 Method of and apparatus for producing a controlled unsaturated vapor pressure of a volatile liquid in a heat treatment chamber
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