| Patents for C09K 13 - Etching, surface-brightening or pickling compositions (3,392) |
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| 03/05/2015 | WO2015031620A1 Compositions and methods for selectively etching titanium nitride |
| 03/03/2015 | US8969276 Aqueous acidic etching solution and method for texturing the surface of single crystal and polycrystal silicon substrates |
| 02/24/2015 | US8961815 Composition for advanced node front-and back-end of line chemical mechanical polishing |
| 02/24/2015 | US8961814 High-selectivity wet patterning of source-drain electrodes over TAOS for a BCE device structure |
| 02/19/2015 | US20150048053 Selective etching method |
| 02/12/2015 | WO2015020243A1 Texture-etching solution composition for crystalline silicon wafers and texture-etching method |
| 02/11/2015 | CN102965114B 含氢氟酸处理液的再生方法和再生装置 Regeneration method of treatment liquid containing hydrofluoric acid and reproducing apparatus |
| 02/10/2015 | US8951434 Glass etching media and methods |
| 02/10/2015 | US8951433 Compositions for use in semiconductor devices |
| 02/04/2015 | CN104335366A 光活化的蚀刻糊及其用途 Photoactivated etching paste and its use |
| 02/04/2015 | CN104327857A 一种触摸屏用蚀刻液及其制备方法 A touch screen with an etching solution and its preparation method |
| 01/29/2015 | US20150027978 Compositions and methods for selectively etching titanium nitride |
| 01/28/2015 | EP2828417A2 Etched silicon structures, method of forming etched silicon structures and uses thereof |
| 01/27/2015 | US8940182 Compositions for etching and methods of forming a semiconductor device using the same |
| 01/27/2015 | US8940178 Textured silicon substrate and method |
| 01/22/2015 | WO2015008093A1 Method of forming etched silicon structures |
| 01/22/2015 | US20150021513 Cmp slurry composition for polishing an organic layer and method of forming a semiconductor device using the same |
| 01/22/2015 | US20150021292 Polishing agent for synthetic quartz glass substrate |
| 01/20/2015 | US8936672 Polishing and electroless nickel compositions, kits, and methods |
| 01/15/2015 | US20150017275 Fine concavo-convex structure product, heat-reactive resist material for dry etching, mold manufacturing method and mold |
| 01/15/2015 | US20150014580 Etching liquid for forming texture |
| 01/13/2015 | US8932874 Control over ammonium fluoride levels in oxide etchant |
| 01/13/2015 | US8932759 Method of fabricating structured particles composed of silicon or a silicon-based material |
| 01/13/2015 | US8932479 Polishing liquid and polishing method |
| 01/06/2015 | US8926859 Polishing composition for silicon wafers |
| 01/01/2015 | US20150004758 Etchant, method of manufacturing metal wiring and thin film transistor substrate using the etchant |
| 12/31/2014 | CN103087718B 湿法刻蚀镍酸镧薄膜和铁电薄膜/镍酸镧复合薄膜的腐蚀液及其制备方法 Wet etching etching solution and its preparation method lanthanum nickel thin film and ferroelectric thin film / lanthanum nickel composite films |
| 12/23/2014 | US8916059 Fluorinated ketones as high-voltage insulating medium |
| 12/18/2014 | US20140370643 Formulation for acidic wet chemical etching of silicon wafers |
| 12/17/2014 | CN104221167A 硅片太阳能电池的非酸性各向同性回蚀 Silicon solar cells of non-acidic isotropic etch-back |
| 12/16/2014 | US8911643 Polishing liquid and polishing method |
| 12/11/2014 | US20140360980 Etching of Plastic Using Acidic Solutions Containing Trivalent Manganese |
| 12/11/2014 | US20140360979 Dry non-plasma treatment system and method of using |
| 12/10/2014 | CN104204292A 经蚀刻的硅结构、形成经蚀刻的硅结构的方法及其用途 After etching of the silicon structure, forming method and use of the etched silicon structure |
| 12/10/2014 | CN102753652B 蚀刻液组成物 Etchant composition |
| 12/10/2014 | CN102369258B 导电膜去除剂及导电膜去除方法 Conductive film removal agent conductive film removal method |
| 12/09/2014 | US8906253 Gap embedding composition, method of embedding gap and method of producing semiconductor device by using the composition |
| 12/09/2014 | US8906252 CMP compositions selective for oxide and nitride with high removal rate and low defectivity |
| 12/09/2014 | US8906123 CMP slurry/method for polishing ruthenium and other films |
| 12/02/2014 | US8901000 Aqueous acidic solution and etching solution and method for texturizing the surface of single crystal and polycrystal silicon substrates |
| 12/02/2014 | US8900478 Etchant and method for manufacturing semiconductor device using same |
| 12/02/2014 | US8900477 Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same |
| 12/02/2014 | US8900472 Texturing and cleaning agent for the surface treatment of wafers and use thereof |
| 11/27/2014 | US20140349488 Etching Gas |
| 11/27/2014 | US20140346391 Polysiloxane hydroxide thin-film rinse solution, and polysilooxazine hydroxide thin-film pattern-forming method using the same |
| 11/25/2014 | US8894877 Method, apparatus and composition for wet etching |
| 11/25/2014 | US8894876 Etchant for electrode and method of fabricating thin film transistor array panel using the same |
| 11/25/2014 | US8894872 Etching compositions, methods and printing components |
| 11/20/2014 | US20140339463 Desmear solution and desmear method |
| 11/20/2014 | US20140339194 Media and methods for etching glass |
| 11/18/2014 | US8889555 Polishing agent for copper polishing and polishing method using same |
| 11/18/2014 | US8889471 Burnthrough formulations |
| 11/18/2014 | US8889032 Metal wire etchant and method of forming metal wire using the same |
| 11/18/2014 | US8889025 Etching composition |
| 11/11/2014 | US8883652 Silicon etching liquid and etching method |
| 11/11/2014 | US8883034 Composition and method for polishing bulk silicon |
| 11/04/2014 | US8877088 Mono- and bi-component formulations in the form of a paint, varnish and water-emulsified base, processes for preparing the same and applications thereof |
| 10/30/2014 | US20140318983 Regeneration of Etch Solutions Containing Trivalent Manganese in Acid Media |
| 10/23/2014 | US20140312265 Titanium-Nitride Removal |
| 10/21/2014 | US8865017 Silicon surface texturing method for reducing surface reflectance |
| 10/21/2014 | US8865013 Method for chemical mechanical polishing tungsten |
| 10/16/2014 | US20140306147 Chrome-free methods of etching organic polymers with mixed acid solutions |
| 10/16/2014 | US20140306146 Plasma etching gas and plasma etching method |
| 10/14/2014 | US8859429 Polishing agent for copper polishing and polishing method using same |
| 10/14/2014 | US8859411 Method for producing transistor |
| 10/09/2014 | US20140302683 Dry etching agent |
| 10/07/2014 | US8852451 Silicon etching fluid and method for producing transistor using same |
| 09/30/2014 | US8846533 Cleaning solution for substrate for semiconductor device |
| 09/23/2014 | US8840798 Chemical mechanical polishing slurry composition and method for producing semiconductor device using the same |
| 09/18/2014 | US20140273467 Polycrystalline-silicon etch with low-peroxide apm |
| 09/18/2014 | US20140264153 Processing System and Method for Providing a Heated Etching Solution |
| 09/18/2014 | US20140264152 Chemistry and Compositions for Manufacturing Integrated Circuits |
| 09/18/2014 | US20140264151 Aqueous cleaning composition for post copper chemical mechanical planarization |
| 09/12/2014 | WO2014138064A1 Compositions and methods for selectively etching titanium nitride |
| 09/09/2014 | US8828266 CMP slurry composition and polishing method using the same |
| 09/04/2014 | US20140248781 Semi-aqueous polymer removal compositions with enhanced compatibility to copper, tungsten, and porous low-k dielectrics |
| 09/04/2014 | DE10162576B4 Ätzmittel und Verfahren zum Bilden eines Matrixsubstrats für Flüssigkristallanzeigevorrichtungen Etchant and method for forming a matrix substrate for liquid crystal display devices |
| 09/02/2014 | US8821753 Etching Solutions |
| 09/02/2014 | US8821752 Etching composition and method for fabricating semiconductor device using the same |
| 09/02/2014 | US8821751 Chemical mechanical planarization composition and method with low corrosiveness |
| 09/02/2014 | US8821747 Method of manufacturing a glass substrate for a magnetic disk |
| 08/21/2014 | US20140235064 Etchant composition and etching method |
| 08/21/2014 | US20140231387 Process to attach thermal stencils to a glass substrate and permanently etch a mark therein |
| 08/21/2014 | US20140231013 Substrate processing apparatus |
| 08/21/2014 | US20140231012 Substrate processing apparatus |
| 08/19/2014 | US8808573 Compositions and methods for selective polishing of silicon nitride materials |
| 08/14/2014 | US20140225028 Wet etchants including at least one etch blocker |
| 08/13/2014 | CN103980905A 一种用于氧化物材料体系的新型蚀刻液及其蚀刻方法和应用 A novel method of etching solution and etching the oxide material systems and applications |
| 08/12/2014 | US8801959 Stable, concentratable silicon wafer polishing composition and related methods |
| 08/12/2014 | US8801958 Titanium etchant composition and method of forming a semiconductor device using the same |
| 08/06/2014 | CN103965914A 蚀刻npn掺杂区域形貌以进行失效检验的组合物及检验方法 Etching npn doped region morphology for the failure test compositions and test methods |
| 08/06/2014 | CN103965913A 用于蚀刻氧化铟锡系导电膜的蚀刻膏 Etching paste for etching an indium tin oxide-based conductive film |
| 08/05/2014 | US8795549 Printable medium for etching oxidic, transparent and conductive layers |
| 08/05/2014 | US8795548 Silicon wafer polishing composition and related methods |
| 07/29/2014 | US8790531 High purity, environmentally clean method and apparatus, for high rate, liquid anisotropic etching of single crystal silicon or etching of polycrystalline silicon, using an overpressure of ammonia gas above aqueous ammonium hydroxide |
| 07/24/2014 | US20140206191 Etchant and Etching Process |
| 07/24/2014 | US20140202987 Etchant and etching method using the same |
| 07/23/2014 | CN103937505A Ito膜刻蚀液 Ito film etching solution |
| 07/16/2014 | CN102597163B 蚀刻液组成物 Etchant composition |
| 07/15/2014 | US8779011 Ultrapure colloidal silica for use in chemical mechanical polishing applications |