| Patents for C09K 13 - Etching, surface-brightening or pickling compositions (3,392) |
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| 01/27/2011 | WO2011010877A2 Etchant composition for the formation of a metal line |
| 01/27/2011 | WO2011009764A1 Etchant composition and etching process for titanium-aluminum complex metal layer |
| 01/27/2011 | US20110021032 Etching of AlGaInAsSb |
| 01/27/2011 | US20110020970 etching or plating process and resist ink |
| 01/25/2011 | US7875558 Copper or copper alloy surfaces to increase the adhesion of the copper surface to a polymeric material; multilayer printed circuit boards |
| 01/19/2011 | CN1865348B Halogen-free flame-proof solvent-free insulated impregnating resin product and its preparation method |
| 01/13/2011 | US20110009033 Polishing slurry for metal films and polishing method |
| 01/13/2011 | US20110008967 Cmp slurry and a polishing method using the same |
| 01/13/2011 | US20110008965 Polishing composition and polishing method |
| 01/13/2011 | US20110008929 Aligned polymers for an organic tft |
| 01/13/2011 | US20110006251 Cerium salt, producing method thereof, cerium oxide and cerium based polishing slurry |
| 01/11/2011 | USRE42024 containing adjuvants, having the capability of undergoing an increase in viscosity in response to an increase in temperature, and an ability to reverse their viscosity in response to a decrease in temperature |
| 01/06/2011 | WO2011002801A1 Liquid mixture to clean dielectric barrier discharge surfaces |
| 01/06/2011 | US20110001082 Semiconductor manufacture component |
| 01/06/2011 | US20110000876 Stripper solution and method of manufacturing liquid crystal display using the same |
| 01/05/2011 | EP2268765A2 Non-selective oxide etch wet clean composition and method of use |
| 01/05/2011 | CN101186827B Chromeless etching solution, method for disclosing defect and technology for processing underlay |
| 01/04/2011 | CA2446063C Bis (perfluoroalkanesulfonyl)imides and their salts as surfactants/additives for applications having extreme environments and methods therefor |
| 12/30/2010 | US20100327219 Solution for forming polishing slurry, polishing slurry and related methods |
| 12/30/2010 | US20100327218 Chemical solution for selectively treating or removing a deteriorated layer at a surface of an organic film, and method for using such |
| 12/29/2010 | CN1899003B Etching solution, method of etching and printed wiring board |
| 12/23/2010 | US20100323584 Polishing liquid for metal film and polishing method |
| 12/23/2010 | US20100323522 Polishing composition and polishing method |
| 12/23/2010 | US20100320457 Etching solution composition |
| 12/23/2010 | US20100320416 Fluorinated sulfonamide surfactants for aqueous cleaning solutions |
| 12/16/2010 | WO2010143794A1 Etching paste having doping function, and formation method of selective emitter of solar cell using same |
| 12/16/2010 | US20100314576 Compositions for cmp of semiconductor materials |
| 12/15/2010 | CN1803964B Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using same |
| 12/15/2010 | CN101289625B Production process of dipping agent bitumen |
| 12/14/2010 | US7851375 Alkaline etchant for controlling surface roughness of semiconductor wafer |
| 12/14/2010 | US7850866 Peroxide (H2O2) to oxidize molydenum and copper, sulfuric acid to react with cupric oxide,and a peroxide stabilizer; concurrent etching a the multilayer to form the molybdenum layer extending outwardly from underneath an edge of the copperline; thin film transistor liquid crystal-displays |
| 12/09/2010 | WO2010139390A1 Two component etching |
| 12/09/2010 | US20100308258 Dispersion comprising cerium oxide and sheet silicate |
| 12/09/2010 | US20100308016 Polishing composition for nickel-phosphorous memory disks |
| 12/07/2010 | US7846349 comprises hydrofluoric acid (buffered), ammonium fluoride, potassium fluoride, sodium fluoride, ethylene glycol, and water, for removal of tantalum or tantalum nitride; semiconductors, photoresists |
| 12/02/2010 | US20100304573 Stabilized etching solutions for cu and cu/ni layers |
| 12/02/2010 | US20100301265 Polishing slurry and method of polishing |
| 12/02/2010 | US20100301264 Pyrogenic oxides doped with potassium |
| 12/02/2010 | US20100301263 Slurry composition for a chemical mechanical polishing process and method of manufacturing a semiconductor device using the slurry composition |
| 12/02/2010 | US20100301262 Composition and process for controlling particle size of metal oxides |
| 12/02/2010 | US20100301014 Polishing Composition and Polishing Method Using the Same |
| 12/02/2010 | US20100301010 ETCHANT COMPOSITIONS AND ETCHING METHOD FOR METALS Cu/Mo |
| 11/30/2010 | US7842193 for barrier metal material on interlayer insulation material; polishing particles containing silicon oxide and dispersed in aqueous solution, and compound such as 1,2,3,4-tetrazole, 5-amino-1,2,3,4-tetrazole, 5-methyl-1,2,3,4-tetrazole, 1,2,3-triazole, 4-amino-1,2,3-triazole, 4,5-diamino-1,2,3-triazole |
| 11/30/2010 | US7842192 Multi-component barrier polishing solution |
| 11/30/2010 | US7842191 chemical mechanical polishing (CMP) copper films via slurry of polyvinylpyrrolidone, oxidizing agent, protective film-forming agent containing complexing agent (containing quinaldinic acid, quinolinic acid, and alkylbenzene sulfonate) for forming water-insoluble complex, and colloidal sol |
| 11/25/2010 | US20100294983 Polishing composition |
| 11/18/2010 | US20100291722 Etchant and method of manufacturing an array substrate using the same |
| 11/18/2010 | US20100288725 Acid Chemistries and Methodologies for Texturing Transparent Conductive Oxide Materials |
| 11/16/2010 | US7833435 Polishing agent |
| 11/16/2010 | US7833431 Aqueous dispersion for CMP, polishing method and method for manufacturing semiconductor device |
| 11/11/2010 | US20100282712 Etching Compositions, Methods and Printing Components |
| 11/10/2010 | EP1381656B1 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
| 11/09/2010 | US7829852 Device having etched feature with shrinkage carryover |
| 11/04/2010 | US20100275952 Selective etching of reactor surfaces |
| 11/03/2010 | CN101876076A Indium oxalate dissolving agent composition |
| 11/02/2010 | US7824568 High concentrate aqueous solution obtained by dissolving powdered 1 H-benzotriazole in the presence of an anionic surfactant, preferably sodium octyl sulfate, and optionally a polyacrylic acid; filtering out microparticles; improved storage stability and wear resistance; chemical mechanical polishing |
| 10/28/2010 | US20100270495 Liquid resin composition for abrasive articles |
| 10/26/2010 | US7820068 Chemical assisted lapping and polishing of metals |
| 10/26/2010 | US7820067 chemical mechanical polishing composition; abrasive silica particles, hydrogen peroxide, halogen compound, and benzotriazole; tantalum and copper |
| 10/21/2010 | US20100267843 Mixed fluoroalkyl-alkyl surfactants |
| 10/21/2010 | US20100267315 Polishing composition |
| 10/21/2010 | US20100267244 Method for treating germanium surfaces and solutions to be employed therein |
| 10/21/2010 | US20100267241 Process for the production of microelectromechanical systems |
| 10/21/2010 | US20100264360 Use of oxidants for the processing of semiconductor wafers, use of a composition and composition therefore |
| 10/14/2010 | WO2010117673A1 Glass having anti-glare surface and method of making |
| 10/14/2010 | WO2010086745A8 Method of etching lanthanum-containing oxide layers |
| 10/14/2010 | US20100258528 Chemical mechanical polishing of silicon carbide comprising surfaces |
| 10/13/2010 | CN101015043B Method for selective etching |
| 10/07/2010 | WO2010115075A1 Etchant composition and method |
| 10/07/2010 | WO2010113744A1 Agent for removing conductive film and method for removing conductive film |
| 10/07/2010 | US20100255681 Slurry composition and method of fabricating damascene structure using the same |
| 10/07/2010 | US20100255626 high viscosity etchant and a selective etching method for photovoltaic element substrates of solar cells using the same |
| 10/07/2010 | US20100252775 Method for forming an indium cap layer |
| 10/07/2010 | US20100252774 Chemical mechanical polishing aqueous dispersion, method of preparing the same, chemical mechanical polishing aqueous dispersion preparation kit, and chemical mechanical polishing method |
| 10/07/2010 | US20100252530 Etchant composition and method |
| 10/06/2010 | CN1682354B Polishing compound composition, method for producing same and polishing method |
| 10/06/2010 | CN101851145A Method for preparing 1,2,3,4-tetrachloro-hexafluoro butane |
| 09/30/2010 | US20100248495 Silicon etching liquid and etching method |
| 09/30/2010 | US20100243950 Polishing agent for synthetic quartz glass substrate |
| 09/30/2010 | US20100243471 Composition, method and process for polishing a wafer |
| 09/23/2010 | US20100239818 Textured silicon substrate and method |
| 09/21/2010 | US7799686 Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same |
| 09/16/2010 | US20100233880 Chemical mechanical planarization using nanodiamond |
| 09/16/2010 | US20100230631 Etching liquid composition |
| 09/10/2010 | WO2010099982A1 Etching composition, in particular for silicon materials, method for characterizing defects on surfaces of such materials and process of treating such surfaces with the etching composition |
| 09/09/2010 | US20100224593 Acid Corrosion Solution for Preparing Polysilicon Suede and the Applied Method of It |
| 09/08/2010 | EP2226374A1 Etching composition, in particular for silicon materials, method for characterizing defects of such materials and process of treating such surfaces with etching composition |
| 09/02/2010 | US20100221983 Multi-layered chemical-mechanical planarization pad |
| 09/02/2010 | US20100221918 Aqueous dispersion for chemical mechanical polishing and method for preparing the same, kit for preparing aqueous dispersion for chemical mechanical polishing, and chemical mechanical polishing method for semiconductor device |
| 08/31/2010 | US7785487 used for chemical mechanical polishing comprising oxidizing agents, abrasive particles, polyvinyl pyrrolidone, antistatic agents, a phosphate compound selected from ammonium phosphate, potassium phosphate or dipotassium phosphate, ammonium chloride, citric acid and water, having a pH of at least 8 |
| 08/26/2010 | US20100216315 Etching composition for metal material and method for manufacturing semiconductor device by using same |
| 08/26/2010 | US20100216309 Cmp polishing liquid and method for polishing substrate using the same |
| 08/19/2010 | WO2010056051A3 Etching solution for a transparent conductive film |
| 08/19/2010 | US20100210184 Cmp slurry for silicon film polishing and polishing method |
| 08/19/2010 | US20100210109 Cmp polishing slurry and method of polishing substrate |
| 08/19/2010 | US20100207058 Polishing composition |
| 08/19/2010 | US20100207057 Polishing composition |
| 08/18/2010 | EP2217679A1 Tetrafluoroborate compounds, compositions and related methods of use |
| 08/18/2010 | EP1240673B1 Method for raw etching silicon solar cells |
| 08/17/2010 | US7776231 Chemical mechanical polishing slurries, their applications and method of use thereof |