C09K 13 - Etching, surface-brightening or pickling compositions

Patents for C09K 13 - Etching, surface-brightening or pickling compositions (3,392)
12/2011
12/08/2011	US20110300778 Abrading agent and abrading method
12/08/2011	US20110300710 Method for Forming Through-Base Wafer Vias for Fabrication of Stacked Devices
12/08/2011	US20110297873 Etching solution compositions for metal laminate films
12/06/2011	US8071180 Forming electronic device having a semiconducting active layer; aligning columns of disc-shaped molecules parallel to each other by bringing into a liquid crystalline discotic phase; poly-9,9-dioctylfluorene and/or polythiophene polymers
12/01/2011	US20110295045 Azeotrope-Like Composition of Hexafluoropropane, Hexafluoropropene and Hydrogen Fluoride
11/2011
11/24/2011	WO2011146206A1 Improved chemistries for the texturing of silicon substrates
11/22/2011	US8062548 Polishing slurry
11/22/2011	US8062547 CMP slurry, preparation method thereof and method of polishing substrate using the same
11/16/2011	CN102241985A Wet etching solution composition for transparent conductive film
11/15/2011	US8057697 Lapping composition and method using same
11/10/2011	US20110275223 Solution for increasing wafer sheet resistance and/or photovoltaic cell power density level
11/10/2011	US20110275222 Silicon Texture Formulations With Diol Additives And Methods of Using The Formulations
11/10/2011	US20110275221 Method for treatment substrates and treatment composition for said method
11/10/2011	US20110275217 Polishing solution for cmp and polishing method using the polishing solution
11/10/2011	US20110275164 Composition and method for recycling semiconductor wafers having low-k dielectric materials thereon
11/10/2011	US20110272625 Surface cleaning and texturing process for crystalline solar cells
11/09/2011	CN102234513A Stripping solution for titanium-containing film and using method for stripping solution
11/08/2011	US8053404 Compositions comprising tetrafluoropropene and carbon dioxide
11/08/2011	US8052889 Etchant composition, and methods of patterning conductive layer and manufacturing flat panel display device using the same
11/03/2011	WO2011135435A1 Additive for alkaline etching solutions, in particular for texture etching solutions, and process for producing it
11/03/2011	US20110269312 Chemical mechanical polishing (cmp) polishing solution with enhanced performance
11/03/2011	US20110266494 Stripper Solution and Method of Manufacturing Liquid Crystal Display Using the Same
11/03/2011	DE102010018982A1 New substituted imidazolonaphthalene compounds, useful e.g. as pigments and colorants for dyeing purposes and decorative purposes, as watercolor paints and inks for inkjet printers, and as material for leak testing of closed systems
10/2011
10/27/2011	WO2011052941A3 Etching composition for texturing crystalline silicon-based wafer
10/27/2011	US20110260097 Additive for alkaline etching solutions, in particular for texture etching solutions, and process for producing it
10/26/2011	CN102226087A Transparent conductive film wet-process etching solution composition
10/25/2011	US8043525 Wet etching solution
10/20/2011	US20110256712 Etchant for electrode and method of fabricating thin film transistor array panel using the same
10/20/2011	US20110253668 Etch patterning of nanostructure transparent conductors
10/19/2011	CN102220133A Stripping solution of titanium carbide and/or titanium nitride film and stripping method
10/13/2011	WO2011125603A1 Ink for conductive polymer etching and method for patterning conductive polymer
10/13/2011	US20110250762 Method of cleaning and micro-etching semiconductor wafers
10/13/2011	US20110250754 Polishing Composition and Polishing Method
10/13/2011	CA2795210A1 A method of fabricating structured particles composed of silicon or a silicon-based material and their use in lithium rechargeable batteries
10/12/2011	CN102217047A Additive for alkaline etching solutions, in particular for texture etching solutions, and process for producing it
10/06/2011	US20110244684 Polishing liquid and polishing method
10/06/2011	US20110244184 Alkaline etching solution for texturing a silicon wafer surface
10/06/2011	US20110240912 Titanium etchant composition and method of forming a semiconductor device using the same
10/06/2011	US20110240594 Polishing liquid composition for magnetic-disk substrate
10/06/2011	US20110240592 Texture processing liquid for transparent conductive film mainly composed of zinc oxide and method for producing transparent conductive film having recesses and projections
10/06/2011	US20110240002 Cutting fluid composition for wiresawing
10/05/2011	EP2372753A1 Gas Compositions for Cleaning the Interiors of Reactors as Well as for Etching Films of Silicon-Containing Compounds
10/05/2011	EP1868769B1 Method for polishing organic polymer-based ophthalmic substrates
09/2011
09/28/2011	CN101243159B Improved microetching solution
09/27/2011	US8025813 Chemical mechanical polishing composition and methods relating thereto
09/27/2011	US8025812 Selective etch of TiW for capture pad formation
09/27/2011	US8025811 Composition for etching a metal hard mask material in semiconductor processing
09/22/2011	US20110230053 Etching agent, etching method and liquid for preparing etching agent
09/22/2011	US20110229831 Apparatus for processing substrate and method of doing the same
09/22/2011	US20110226727 Etchant for metal wiring and method for manufacturing metal wiring using the same
09/21/2011	CN102191063A Liquid composition, method of producing silicon substrate, and method of producing liquid discharge head substrate
09/15/2011	WO2011052989A3 Etching solution composition
09/15/2011	US20110223764 Chemical-Mechanical Polishing Compositions And Methods Of Making And Using The Same
09/09/2011	WO2011052987A3 Etching solution composition
09/08/2011	US20110217845 Polishing Composition and Polishing Method Using The Same
09/07/2011	CN102177219A Etching solution for a transparent conductive film
09/01/2011	WO2011105129A1 Copper oxide etchant and etching method using same
09/01/2011	WO2011055915A3 Etchant composition
09/01/2011	WO2011052909A3 Etchant composition
09/01/2011	US20110212621 Abrasive composition and method for manufacturing semiconductor integrated circuit device
08/2011
08/25/2011	WO2011102268A1 Method for producing semiconductor gas
08/25/2011	WO2011059281A3 Etchant composition for a single molybdenum film
08/25/2011	US20110207327 Abrasive, polishing method, method for manufacturing semiconductor integrated circuit device
08/25/2011	US20110207326 Slurry for polishing and planarization method of insulating layer using the same
08/25/2011	US20110204283 Fumed silica of controlled aggregate size and processes for manufacturing the same
08/25/2011	US20110204027 Slurry manufacturing method, slurry and polishing method and apparatus using slurry
08/24/2011	EP2115093B1 Power transmission cable
08/24/2011	CN101423761B Etching agent and method for controlling recovery of silicon wafer
08/23/2011	CA2473276C Method for inspecting a titanium-based component
08/18/2011	WO2011098271A1 Method for determining the concentration of nitric acid
08/18/2011	US20110198531 Composition for polishing silicon nitride and method of controlling selectivity using same
08/17/2011	EP2356192A2 Barrier slurry for low-k dielectrics
08/11/2011	US20110195142 Heat-reactive resist material, layered product for thermal lithography using the material, and method of manufacturing a mold using the material and layered product
08/10/2011	EP2355138A1 Liquid composition, method of producing silicon substrate, and method of producing liquid discharge head substrate
08/10/2011	CN102149789A Chemical-mechanical polishing compositions and methods of making and using the same
08/10/2011	CN101462078B Hydrogenation catalyst steeping fluid composition and preparation method of hydrogenation catalyst
08/04/2011	WO2011093263A1 Dry etching agent and dry etching method using the same
08/04/2011	US20110186542 Slurry containing multi-oxidizer and mixed nano-abrasives for tungsten cmp
08/03/2011	EP2351072A1 Additive for alkaline etching solutions, in particular for texture etching solutions, and process for producing it
08/02/2011	US7988878 Selective barrier slurry for chemical mechanical polishing
07/2011
07/28/2011	US20110183476 Etching solution composition and method of etching using the same
07/28/2011	US20110183448 Liquid composition, method of producing silicon substrate, and method of producing liquid discharge head substrate
07/28/2011	US20110180747 Trioka Acid Semiconductor Cleaning Compositions and Methods of Use
07/28/2011	US20110180511 Polishing Composition and Polishing Method Using the Same
07/27/2011	CN102134492A Staining solution for semiconductor chip junction
07/27/2011	CN102134491A Gallium nitride surface corrosion liquid and corrosion method
07/21/2011	US20110177690 Polishing solution for cmp, and method for polishing substrate using the polishing solution for cmp
07/21/2011	US20110177680 Etchant composition for metal wiring and method of manufacturing thin film transistor array panel using the same
07/21/2011	US20110175018 Polishing liquid and polishing method
07/20/2011	CN102127447A Morphology design of transparent conductive metal oxide films
07/20/2011	CN101058711B Grinding fluid for metal and grinding method
07/19/2011	US7981317 Composition for surface modification of a heat sink and method for surface treatment of the heat sink for printed circuit boards using the same
07/19/2011	US7981316 Selective barrier metal polishing method
07/14/2011	US20110171834 Silicon etchant and etching method
07/14/2011	US20110171832 Chemical-Mechanical Polishing Formulation and Methods of Use
07/13/2011	EP2342738A2 Use of surfactant/defoamer mixtures for enhanced metals loading and surface passivation of silicon substrates
07/12/2011	US7977128 Etchant for etching double-layered copper structure and method of forming array substrate having double-layered copper structures
07/12/2011	US7976723 Method for kinetically controlled etching of copper
07/07/2011	WO2011028037A3 Etchant for thin film transistor-liquid crystal display
07/07/2011	WO2011019222A3 Etchant composition for forming copper interconnects

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