Patents
Sitemap › C09 - Dyes; Paints; Polishes; Natural resins; Adhesives; Compositions not otherwise provided for; Applications of materials not otherwise provided for › C09K - Materials for applications not otherwise provided for; Applications of materials not otherwise provided for › C09K 13 - Etching, surface-brightening or pickling compositions
Patents for C09K 13 - Etching, surface-brightening or pickling compositions (3,392)
10/2012
10/02/2012US8277681 Metal polishing slurry and chemical mechanical polishing method
09/2012
09/26/2012CN102695778A Additive for alkaline etching solutions, in particular for texture etching solutions, and process for producing it
09/25/2012US8273697 Pipe unblocker with visual temperature and rinsing indicator
09/20/2012WO2012125401A1 Novel etching composition
09/20/2012US20120238094 Cmp polishing solution and polishing method
09/20/2012US20120235081 Process for removing a bulk material layer from a substrate and a chemical mechanical polishing agent suitable for this process
09/13/2012US20120231632 Novel Etching Composition
09/13/2012US20120231630 Etching Gas
09/13/2012US20120231627 Process for removing a bulk material layer from a substrate and a chemical mechanical polishing agent suitable for this process
09/13/2012US20120228543 Method for purifying fluoride etching solution by using hydroxide compound and ion exchange resin absorption
09/11/2012US8262928 Etchant and method of manufacturing an array substrate using the same
09/06/2012US20120225563 Etching liquid for etching silicon substrate rear surface in through silicon via process and method for manufacturing semiconductor chip having through silicon via using the etching liquid
09/06/2012US20120225556 Stable, concentratable, water soluble cellulose free chemical mechanical polishing composition
09/06/2012US20120225555 Stable, concentratable chemical mechanical polishing composition and methods relating thereto
09/05/2012CN102656250A Aqueous acidic etching solution and method for texturing the surface of single crystal and polycrystal silicon substrates
09/05/2012CN101541910B Slurry composition and method for polishing organic polymer-based ophthalmic substrates
09/04/2012US8257617 Functional paste
09/04/2012US8257609 Etchant for etching metal wiring layers and method for forming thin film transistor by using the same
08/2012
08/30/2012WO2012091395A9 Composition for a texture-etching solution, and texture-etching method for crystalline silicon wafers
08/23/2012US20120214307 Chemical-mechanical polishing liquid, and semiconductor substrate manufacturing method and polishing method using said polishing liquid
08/22/2012CN102648270A Etching solution composition
08/22/2012CN102648269A Etchant composition for a single molybdenum film
08/16/2012US20120208344 Chemical mechanical polishing (cmp) composition comprising inorganic particles and polymer particles
08/16/2012US20120205578 Polishing Composition and Method Using Same
08/15/2012EP1490454B1 Method for making an integrated circuit device and corresponding integrated circuit device
08/09/2012US20120202305 Etchant for etching double-layered copper structure and method of forming array substrate having double-layered copper structures
08/08/2012CN1883012B Functional paste
08/08/2012CN102627972A Formula of GaAs semiconductor material etching liquid
08/07/2012US8236704 Etchant and array substrate having copper lines etched by the etchant
08/02/2012WO2012101545A1 Use of surfactants having at least three short-chain perfluorinated groups for manufacturing integrated circuits having patterns with line-space dimensions below 50nm
08/02/2012WO2012083082A8 Printable etchant compositions for etching silver nanowire-based transparent, conductive films
08/02/2012US20120193773 Adhesion Promoting Composition for Metal Leadframes
08/02/2012US20120193573 Additive for polishing composition
08/02/2012US20120192735 Fountain solutions for offset lithographic printing inks
08/01/2012EP2480627A1 Aqueous acidic etching solution and method for texturing the surface of single crystal and polycrystal silicon substrates
08/01/2012EP2109648B1 Chemical mechanical planarization composition, system, and method of use
07/2012
07/26/2012US20120190210 Silicon etching solution and etching method
07/26/2012US20120190201 Multi-selective polishing slurry composition and a semiconductor element production method using the same
07/26/2012US20120190200 Abrasive Free Silicon Chemical Mechanical Planarization
07/26/2012US20120190199 Silicon polishing compositions with improved psd performance
07/26/2012US20120187336 Conditioning compositions for solar cells
07/26/2012US20120187335 Wet etchants including at least one etch blocker
07/26/2012US20120187334 Method for preparing chemical mechanical polishing slurry composition
07/26/2012US20120187333 Adjuvant for controlling polishing selectivity and chemical mechanical polishing slurry comprising the same
07/26/2012US20120187087 Etching solution composition for metal thin film consisting primarily of copper
07/25/2012EP2478068A1 Ink jet printable etching inks and associated process
07/25/2012CN101580452B Preparation process of carbon tetrafluoride and equipment thereof
07/24/2012US8226849 a mixture of oxidizers, oxidized-metal etchants, protective film-forming agents and diluents, used for polishing semiconductors
07/19/2012WO2012061010A3 Polymer etchant and method of using same
07/19/2012US20120181668 Ink jet printable etching inks and associated process
07/19/2012US20120181473 Fluorinated cationic surfactant
07/19/2012US20120180852 Etching composition
07/18/2012CN102597163A Etchant composition
07/18/2012CN102597162A Etching solution composition
07/18/2012CN102593263A Preparation method of N-type crystalline silicon back emitter junction solar battery and corrosive liquid
07/18/2012CN102585833A Etching solution composition for alloy layer comprising mo and ti, or induim oxide layer
07/18/2012CN102585832A Low-tension ITO (Indium Tin Oxide) etching liquid and preparation method thereof
07/12/2012WO2012051380A3 Composition for and method of suppressing titanium nitride corrosion
07/12/2012US20120175550 Aqueous dispersion for chemical mechanical polishing and chemical mechanical polishing method using same
07/11/2012CN102559192A Etching liquor used for etching microwave dielectric film and preparation method thereof
07/11/2012CN101565536B Flame-retardant polybutylece terephthalate resin composition with high glow wire ignition temperature
07/05/2012WO2012091395A2 Composition for a texture-etching solution, and texture-etching method for crystalline silicon wafers
07/04/2012EP2470619A1 Additive for alkaline etching solutions, in particular for texture etching solutions, and process for producing it
07/04/2012CN102533273A Cleaning composition for semiconductor device and method of cleaning semiconductor device using the same
07/04/2012CN101298322B Purification of phosphoric acid rich streams
07/03/2012US8211193 Ultrapure colloidal silica for use in chemical mechanical polishing applications
07/03/2012CA2399282C Method for low temperature bonding and bonded structure
06/2012
06/28/2012WO2012057467A3 Copper-containing etchant composition for a metal layer, and etching method using same
06/28/2012US20120164833 Polishing Agent, Compound Semiconductor Manufacturing Method, and Semiconductor Device Manufacturing Method
06/28/2012US20120161067 Dental etching gel composition and method of use thereof
06/28/2012US20120160804 Polishing agent for copper polishing and polishing method using same
06/28/2012US20120160320 Aqueous acidic etching solution and method for texturing the surface of single crystal and polycrystal silicon substrates
06/27/2012EP2467873A1 Method for etching of silicon surfaces
06/27/2012CN101319172B Alkaline aqueous solution composition used for washing or etching substrates
06/21/2012WO2012083082A1 Printable etchant compositions for etching silver nanoware-based transparent, conductive film
06/21/2012WO2012081768A1 Etching paste, a production method therefor and a pattern forming method using the same
06/21/2012US20120156968 Polishing liquid composition for magnetic disk substrate
06/21/2012US20120156874 Chemical mechanical polishing slurry composition and method for producing semiconductor device using the same
06/21/2012US20120153287 Etchant, display device and method for manufacturing display device using the same
06/21/2012US20120153218 Polishing composition
06/20/2012CN1990541B Crosslinkabe compositions, process for preparation, and use thereof
06/20/2012CN1896822B Etching agent and method for manufacturing liquid crystal display using same
06/20/2012CN102509693A Chemical unsealing method of plastic package electronic component using aluminum wire as connecting wire and preparation method of etching solution used in chemical unsealing method
06/19/2012US8202445 Metal polishing composition and chemical mechanical polishing method
06/14/2012US20120145951 Highly dilutable polishing concentrates and slurries
06/14/2012US20120145950 Ultrapure colloidal silica for use in chemical mechanical polishing applications
06/14/2012US20120145949 Method for producing electronic grade aqueous ammonium fluoride solution
06/13/2012EP1255797B1 Method for roughening copper surfaces for bonding to substrates
06/13/2012CN102498188A Ink jet printable etching inks and associated process
06/07/2012US20120142191 Chemical Mechanical Planarization Composition And Method With Low Corrosiveness
06/07/2012US20120138851 Polishing composition and polishing method
06/07/2012US20120138850 Etchant gas
06/05/2012US8192644 Highly dilutable polishing concentrates and slurries
06/05/2012US8192636 Composition and method for improved adhesion of polymeric materials to copper alloy surfaces
05/2012
05/30/2012CN102484060A Method for etching of silicon surfaces
05/24/2012US20120129346 Polishing agent, concentrated one-pack type polishing agent, two-pack type polishing agent and method for polishing substrate
05/23/2012CN102471688A 用于形成铜互连的蚀刻组合物 Etching for forming copper interconnects composition
05/23/2012CN102471687A 用于形成金属互连的刻蚀剂组合物 Etchant compositions for forming a metal interconnect
05/23/2012CN102471686A 用于形成金属线的蚀刻组合物 The etching composition for forming a metal line
05/17/2012US20120122999 Urethane and urea fluorosurfactants
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