Patents
Sitemap › C09 - Dyes; Paints; Polishes; Natural resins; Adhesives; Compositions not otherwise provided for; Applications of materials not otherwise provided for › C09K - Materials for applications not otherwise provided for; Applications of materials not otherwise provided for › C09K 13 - Etching, surface-brightening or pickling compositions
Patents for C09K 13 - Etching, surface-brightening or pickling compositions (3,392)
02/2013
02/05/2013US8366959 Abrasive compositions for chemical mechanical polishing and methods for using same
02/05/2013US8366958 Etching solutions
01/2013
01/31/2013US20130029489 Polishing slurry, polishing method and manufacturing method of semiconductor integrated circuit device
01/31/2013US20130026134 Copper oxide etchant and etching method using the same
01/29/2013US8361177 Polishing slurry, method of producing same, and method of polishing substrate
01/29/2013CA2780401A1 Process for cleaning polycrystalline silicon chunks
01/24/2013WO2013010612A1 Structuring antistatic and antireflection coatings and corresponding stacked layers
01/22/2013US8357311 Polishing liquid composition
01/17/2013WO2012157908A3 Texturing composition of a substrate and method of using same
01/17/2013US20130015471 Etchant for metal layer including copper or a copper alloy, method of manufacturing a display substrate using the same and display substrate
01/16/2013CN1966594B Polishing composition including an inhibitor of tungsten etching
01/10/2013US20130011936 Selective etching bath methods
01/10/2013US20130009310 Semiconductor device structures and compositions for forming same
01/09/2013CN101760199B Two-liquid acid etching liquid oxidant
01/08/2013US8349207 Aqueous dispersion for chemical mechanical polishing and chemical mechanical polishing method for semiconductor device
01/03/2013WO2013002283A1 Etching solution and etching process using same
01/03/2013US20130005219 Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method using same
01/03/2013US20130005149 Chemical-mechanical planarization of substrates containing copper, ruthenium, and tantalum layers
01/03/2013US20130000214 Abrasive Particles for Chemical Mechanical Polishing
01/02/2013EP2540800A1 Process for etching using sulfur compounds
01/02/2013CN102858915A Ink For Conductive Polymer Etching And Method For Patterning Conductive Polymer
12/2012
12/27/2012WO2012177017A2 Metal wire etchant liquid and method for manufacturing a liquid crystal display using the etchant
12/27/2012US20120329279 CMP Slurry/Method for Polishing Ruthenium and Other Films
12/27/2012US20120329200 Silicon surface texturing method for reducing surface reflectance
12/27/2012US20120326076 Tool for manufacturing semiconductor structures and method of use
12/26/2012CN102839377A Improved polycrystalline texturing composition and method
12/26/2012CN102838994A Etching glue composition used for manufacturing mono-crystalline silicon solar cell selective emitter
12/25/2012US8337716 Sarcosine compound used as corrosion inhibitor
12/25/2012US8337715 CMP slurry for metallic film, polishing method and method of manufacturing semiconductor device
12/20/2012WO2012144733A3 Texture-etchant composition for a crystalline silicon wafer, and texture-etching method
12/20/2012US20120322264 Aqueous polishing agent and graft copolymers and their use in a process for polishing patterned and unstructured metal surfaces
12/20/2012US20120322187 Etchants and methods of fabricating metal wiring and thin film transistor substrate using the same
12/19/2012EP2534222A1 Method for determining the concentration of nitric acid
12/19/2012CN102827611A Etchants and methods of fabricating metal wiring and thin film transistor substrate using the same
12/13/2012WO2012169722A1 Texture etching solution composition and texture etching method for crystalline silicon wafer
12/13/2012WO2012169721A1 Texture etching solution composition and texture etching method for crystalline silicon wafer
12/13/2012US20120315763 Polishing liquid for cmp and polishing method using the same
12/11/2012US8328892 High concentrate aqueous solution obtained by dissolving powdered 1 H-benzotriazole in the presence of an anionic surfactant, preferably sodium octyl sulfate, and optionally a polyacrylic acid; filtering out microparticles; improved storage stability and wear resistance; chemical mechanical polishing
12/06/2012WO2012091395A3 Composition for a texture-etching solution, and texture-etching method for crystalline silicon wafers
12/06/2012US20120309854 Aldohexose-based fluoroadditives
12/06/2012US20120309853 Aldohexose-based fluoroadditives
11/2012
11/29/2012US20120302687 Adhesive
11/29/2012US20120301351 Pretreatment process for aluminum and high etch cleaner used therein
11/29/2012US20120299158 Cmp polishing liquid, method for polishing substrate, and electronic component
11/29/2012US20120298911 Dry Etching Agent and Dry Etching Method Using the Same
11/28/2012CN102803439A Etching paste having doping function, and formation method of selective emitter of solar cell using same
11/28/2012CN102796526A Etching solution and etching method for etching indium phosphide monocrystal wafer
11/27/2012US8318042 Systems, methods and solutions for chemical polishing of GaAs wafers
11/22/2012US20120295443 Method for reclaiming semiconductor wafer and polishing composition
11/22/2012US20120295399 Oxide-based thin film transistor, method of fabricating the same, zinc oxide etchant, and a method of forming the same
11/22/2012US20120295390 Single-crystalline silicon alkaline texturing with glycerol or ethylene glycol additives
11/22/2012US20120292559 Methods and Compositions for Acid Treatment of a Metal Surface
11/22/2012US20120292201 Stripping Gold Components and the Method of Stripping Gold
11/21/2012CN102791830A Method for determining the concentration of nitric acid
11/20/2012US8314028 Slurry compositions and methods of polishing a layer using the slurry compositions
11/15/2012WO2012154712A1 Burnthrough formulations
11/15/2012WO2012028727A3 Method for the wet-chemical etching back of a solar cell emitter
11/15/2012US20120289056 Selective silicon nitride etch
11/13/2012US8308972 Additive for polishing composition
11/08/2012US20120280170 Compositions for polishing silicon-containing substrates
11/07/2012CN202519195U Preparation device for ITO etching solution
11/06/2012US8304346 Abrasive composition and method for manufacturing semiconductor integrated circuit device
11/06/2012US8303839 Trioka acid semiconductor cleaning compositions and methods of use
11/01/2012US20120273715 Polishing composition for nickel phosphorous memory disks
11/01/2012US20120273454 Etching liquid for conductive polymer, and method for patterning conductive polymer
10/2012
10/31/2012CN102762525A Method for producing semiconductor gas
10/30/2012US8298438 Acid corrosion solution for preparing polysilicon suede and the applied method of it
10/30/2012US8298437 Alkali etching liquid for silicon wafer and etching method using same
10/26/2012WO2012144733A2 Texture-etchant composition for a crystalline silicon wafer, and texture-etching method
10/26/2012WO2012142987A1 Method for producing a textured silicon substrate
10/25/2012US20120270401 Chemical mechanical polishing slurry, its preparation method and use for the same
10/25/2012US20120270400 Slurry for chemical mechanical polishing and polishing method for substrate using same
10/25/2012US20120270399 Slurry composition for cmp, and polishing method
10/25/2012US20120270396 Etchant and method for manufacturing semiconductor device using same
10/25/2012US20120267627 Polycrystalline texturing composition and method
10/24/2012EP2514799A1 Improved polycrystalline texturing composition and method
10/24/2012CN102753652A Etchant composition
10/24/2012CN102753651A Copper oxide etchant and etching method using same
10/24/2012CN101410481B Composition for etching a metal hard mask material in semiconductor processing
10/23/2012US8293694 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
10/18/2012WO2012139548A1 Etching solution and process for structuring a zinc oxide layer and zinc oxide layer
10/18/2012WO2012028723A3 Method for the wet-chemical etching of a highly doped semiconductor layer
10/18/2012US20120264304 Compositions and methods for selective polishing of silicon nitride materials
10/18/2012US20120264303 Chemical mechanical polishing slurry, system and method
10/18/2012US20120261608 Etchant and method for manufacturing semiconductor device using same
10/17/2012EP2511948A1 Dry etching agent and dry etching method using the same
10/17/2012CN102741987A Dry etching agent and dry etching method using the same
10/17/2012CN102732254A Etching solution composition for transparent conductive film
10/17/2012CN102732253A Ferric trichloride ITO etching solution and its preparation method
10/17/2012CN102732252A Novel aqua regia system ITO (indium tin oxide) etching solution and its preparation method
10/16/2012US8288282 Polishing liquid for metal and method of polishing
10/11/2012WO2012028728A3 Method for the wet-chemical etching back of a solar cell emitter
10/11/2012US20120258598 Stabilized Chemical Mechanical Polishing Composition and Method of Polishing a Substrate
10/11/2012US20120256122 Composition for etching of ruthenium-based metal, and process for preparation of the same
10/11/2012US20120255929 Etching solution composition for transparent conductive film
10/11/2012US20120255651 Fluoroalkylalkoxylates
10/11/2012DE102011016335A1 Nickelhaltige und ätzende druckbare Paste insbesondere zur Kontaktbildung mit Silizium beim Herstellen einer Solarzelle Nickel-containing and corrosive printable paste particularly for contact formation with silicon in manufacturing a solar cell
10/10/2012CN102719132A Conducting polymer etching ink and preparation method thereof
10/04/2012WO2012133500A1 Azeotropic composition or azeotrope-like composition
10/04/2012US20120252148 Echtant and method for manufacturing display device using the same
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