Patents for C09K 13 - Etching, surface-brightening or pickling compositions (3,392)
07/2014
07/15/2014US8778217 Polishing slurry for CMP, and polishing method
07/15/2014US8778211 GST CMP slurries
07/15/2014US8778210 Compositions and methods for the selective removal of silicon nitride
07/09/2014CN103911159A 至少包含铟和镓的氧化物的蚀刻液以及蚀刻方法 Comprising at least an etching solution and etching method of an oxide of indium and gallium
07/09/2014CN103911158A 用于金属氧化物层的蚀刻剂组合物 Etchant composition for a metal oxide layer,
07/09/2014CN103911157A 用于金属氧化物层的蚀刻剂组合物 Etchant composition for a metal oxide layer,
07/09/2014CN103911156A 用于金属氧化物层的蚀刻剂组合物 Etchant composition for a metal oxide layer,
07/03/2014US20140186996 Etchant and etching process for oxides containing at least indium and gallium
06/2014
06/26/2014WO2014094103A1 Process and method for in-situ dry cleaning of thin film deposition reactors and thin film layers
06/26/2014US20140174312 Composition for gravure offset printing and gravure offset printing process
06/25/2014CN103890139A 结晶性硅晶片的织构蚀刻液组合物及织构蚀刻方法 Texture etching liquid composition and the crystalline silicon wafer etching method Texture
06/19/2014WO2014089941A1 Etchant and preparation method and application thereof
06/18/2014DE102012024727A1 Cellulose- und Celluloseether-Lösungen und deren Verwendung Cellulose and cellulose ether solutions and their use
06/18/2014CN103865541A Etching size applicable to solar cells, and preparation method and application method of etching size
06/18/2014CN101649202B Etching bath composition for transparent conductive film
06/12/2014WO2014087004A1 Process for metallizing nonconductive plastic surfaces
06/12/2014US20140162403 Etching solution for copper/molybdenum-based multilayer thin film
06/11/2014CN103224796B Method for preparing alkaline etching liquid by using constant boiling hydrochloric acid
06/11/2014CN102286288B Acetic acid ITO (Indium Tin Oxide) etching liquid and preparation process thereof
06/11/2014CN102177219B Etching solution for a transparent conductive film
06/10/2014US8747693 Silica having metal ions absorbed thereon and fabricating method thereof
05/2014
05/28/2014EP2735216A1 Structuring antistatic and antireflection coatings and corresponding stacked layers
05/28/2014CN103824808A 蚀刻剂组合物、形成lcd布线的方法、阵列基板及其制法 The method of the etchant composition, formed lcd wiring, the array substrate and its preparation method
05/27/2014US8735293 Chemical mechanical polishing composition and methods relating thereto
05/21/2014CN103805203A 选择性氧化铟锡蚀刻液 Selective etching solution of indium tin oxide
05/21/2014CN103805202A 氧化铜用蚀刻液以及使用其的蚀刻方法 Copper oxide etching solution and the etching method using the same
05/20/2014US8728341 Polishing agent, concentrated one-pack type polishing agent, two-pack type polishing agent and method for polishing substrate
05/15/2014WO2013169208A8 Non-acidic isotropic etch-back for silicon wafer solar cells
05/15/2014US20140134778 Aqueous alkaline compositions and method for treating the surface of silicon substrates
05/14/2014CN103797088A 烧穿制剂 Burn preparations
05/14/2014CN103013523B 一种蚀刻剂及其制备和应用 One etchant and preparation and application
05/13/2014US8721918 Method for purifying fluoride etching solution by using hydroxide compound and ion exchange resin absorption
05/13/2014US8721917 Polishing of sapphire with composite slurries
05/08/2014WO2014070546A1 Foam etchant and methods for etching glass
05/08/2014US20140127907 Methods of forming semiconductor structures and related sulfur dioxide etch chemistries
05/07/2014EP2727977A1 Etching solution and etching process using same
05/07/2014CN103773374A 碱性腐蚀液及腐蚀多晶硅片的方法 Alkaline etching solution and method of etching the polysilicon sheet
05/06/2014US8715524 Polishing liquid
05/01/2014US20140121145 Treatment of shaped bodies comprising copper with a mixture comprising chlorine-free acids and oxidizing agent
04/2014
04/30/2014CN103756681A BOE (buffer oxide etchant) composition
04/30/2014CN103756680A Method for preparing BOE (Buffer Oxide Etch) etching liquid
04/29/2014US8709278 Polishing composition
04/29/2014US8709277 Etching composition
04/24/2014WO2014061245A1 Etching material
04/23/2014CN103741184A Etching treatment process of engineering plastic surface treatment
04/23/2014CN102838994B Etching glue composition used for manufacturing mono-crystalline silicon solar cell selective emitter
04/22/2014US8703085 Crystalline cerium oxide and preparation method of the same
04/22/2014US8703007 Polishing composition and polishing method using the same
04/17/2014US20140106566 Method For Etching an Ultra Thin Film
04/17/2014US20140103251 Compositions for use in semiconductor devices
04/16/2014CN102358837B Etching paste and preparation method thereof
04/15/2014US8696930 Silicon wafer reclamation process
04/15/2014US8696929 Polishing slurry and polishing method
04/09/2014CN103717706A Perfluoroalkyl sulfonamides surfactants for photoresist rinse solutions
04/03/2014US20140091058 Copper oxide etchant and etching method using the same
04/03/2014US20140091052 Iodine-based etching solution and etching method
04/02/2014CN102191063B Liquid composition, method of producing silicon substrate, and method of producing liquid discharge head substrate
04/01/2014US8685273 Etching agent for type II InAs/GaInSb superlattice epitaxial materials
04/01/2014US8685272 Composition for etching silicon oxide layer, method for etching semiconductor device using the same, and composition for etching semiconductor device
03/2014
03/27/2014US20140087551 Etching polysilicon
03/26/2014CN103688600A Structuring antistatic and antireflection coatings and corresponding stacked layers
03/26/2014CN103666479A Etching composition and method for etching semiconductor wafer
03/26/2014CN103666478A Non-ionic ammonium hydrogen fluoride etching solution with low surface tension
03/26/2014CN103666477A Etching solution, method for manufacturing piezoelectric element and etching method
03/20/2014US20140077126 Method of etching a high aspect ratio contact
03/19/2014CN103649271A Etching solution and etching process using same
03/13/2014US20140073707 Compositions comprising a fluorosurfactant and a fluoro-free hydrotrope
03/13/2014US20140073226 Polypyrrolidone polishing composition and method
03/12/2014CN103635608A Metal wire etchant liquid and method for manufacturing a liquid crystal display using the etchant
03/12/2014CN103627400A Etchant composition for molybdenum alloy film and indium oxide film
03/11/2014US8668840 Solution used in the fabrication of a porous semiconductor material, and a method of fabricating said material
03/06/2014WO2014032143A1 Surface cleaning method with isotropic etching for textured silicon wafers
03/06/2014US20140065836 Texturing of monocrystalline semiconductor substrates to reduce incident light reflectance
03/06/2014US20140061531 Methods, process and fabrication technology for high-efficiency low-cost crystalline silicon solar cells
02/2014
02/27/2014US20140054266 Compositions and methods for selective polishing of platinum and ruthenium materials
02/27/2014US20140054260 Selectively etching of a polymer matrix on pet
02/25/2014US8658053 Etching composition for metal material and method for manufacturing semiconductor device by using same
02/20/2014WO2013076587A4 Etching agent for copper or copper alloy
02/19/2014CN101768445B Environment-friendly sull etching paste
02/18/2014US8652972 Stabilized etching solutions for CU and CU/NI layers
02/18/2014US8652350 Chemical mechanical polishing aqueous dispersion, chemical mechanical polishing method using the same, and method of recycling chemical mechanical polishing aqueous dispersion
02/13/2014US20140042360 Silicon surface texturing method for reducing surface reflectance
02/12/2014CN103571495A Etchant composition and manufacturing method for thin film transistor using the same
02/12/2014CN102220133B Stripping solution of titanium carbide and/or titanium nitride film and stripping method
02/11/2014US8647527 Polishing composition and polishing method using the same
02/11/2014US8647526 Two component etching
02/06/2014WO2014022004A1 Oxide coated metal pigments and film-forming compositions
02/05/2014CN103562344A Texture etching solution composition and texture etching method for crystalline silicon wafer
02/04/2014US8641920 Polishing composition for planarizing metal layer
02/04/2014CA2673032C Power transmission cable
01/2014
01/30/2014US20140030896 Etching method, and etching liquid to be used therein and method of producing a semiconductor substrate product using the same
01/29/2014CN103547654A Texture etching solution composition and texture etching method for crystalline silicon wafer
01/29/2014CN103540322A Etching solution and method for metal barrier layers
01/29/2014CN103540321A Etching paste, method of preparing the same, and method of forming pattern using the same
01/28/2014US8637405 Silicon surface texturing method for reducing surface reflectance
01/28/2014US8636917 Solution for forming polishing slurry, polishing slurry and related methods
01/23/2014WO2014014420A1 Masked etch-back method and process for fabrication of selective emitter silicon wafer solar cells
01/23/2014WO2014012809A1 Frosted glass sheet
01/23/2014US20140024216 Gst cmp slurries
01/23/2014US20140021400 Printable etchant compositions for etching silver nanoware-based transparent, conductive film
1 2 3 4 5 6 7 8 9 10 11 12 ... 34