| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 06/19/2013 | CN103160806A Gas inlet system, cavity apparatus and substrate processing device |
| 06/19/2013 | CN103160805A Vertical film deposition apparatus and vertical film deposition method capable of rapid large-scale production |
| 06/19/2013 | CN103160804A Workpiece positioning system |
| 06/19/2013 | CN103160803A Graphite boat pretreatment method |
| 06/19/2013 | CN103160802A Preparation method of nitrogen-doped titanium oxide thin film |
| 06/19/2013 | CN103160801A Method of preparing diamond-like carbon film on inner surface of metal |
| 06/19/2013 | CN103160800A Method for preparing fluorine-containing carbon-based film on silicon substrate surface |
| 06/19/2013 | CN103160799A Neutron-sensitive coating film and forming method thereof |
| 06/19/2013 | CN103160781A Manufacture method of multilayer gradient nano-composite diamond film of surface of die steel |
| 06/19/2013 | CN103160780A Preparation method of multilayer nano-composite-class diamond films on surface of camshaft |
| 06/19/2013 | CN103160779A Ultralow-friction silicon-aluminum double-element mixed amorphous carbon film preparing method |
| 06/19/2013 | CN102505107B Process method for plating film on surface of wooden pencil |
| 06/19/2013 | CN102433548B Uniform gas flow gas inlet device and uniform gas inlet method for vapor deposition |
| 06/19/2013 | CN102424957B Multi-layer product support for vapor deposition, and chemical vapor deposition reaction chamber |
| 06/19/2013 | CN102345114B MOCVD heating device, formation method thereof and method for forming film by MOCVD |
| 06/19/2013 | CN102157617B Preparation method of silicon-based nano-wire solar cell |
| 06/19/2013 | CN102066606B Machine for processing vessels made of thermoplastic material |
| 06/19/2013 | CN102016115B Method for depositing ultra fine crystal particle polysilicon thin film |
| 06/19/2013 | CN101971091B Method for processing an object with miniaturized structures |
| 06/19/2013 | CN101842165B Mechanically integrated and closely coupled print head and mist source |
| 06/19/2013 | CN101795528B Inductively coupled plasma processing apparatus |
| 06/19/2013 | CN101736319B Gas injector and film deposition apparatus |
| 06/19/2013 | CN101542015B Solid precursor-based delivery of fluid utilizing controlled solids morphology |
| 06/19/2013 | CN101124656B Shadow mask deposition of materials using reconfigurable shadow masks |
| 06/19/2013 | CN101065335B Method for transferring a functional organic molecule onto a transparent substrate |
| 06/18/2013 | US8465811 Method of depositing film by atomic layer deposition with pulse-time-modulated plasma |
| 06/18/2013 | US8465802 Chemical vapor deposition reactor and method |
| 06/18/2013 | US8465801 Gas mixer and manifold assembly for ALD reactor |
| 06/18/2013 | US8465791 Method for counting particles in a gas |
| 06/18/2013 | US8465593 Substrate processing apparatus and gas supply method |
| 06/18/2013 | US8465592 Film deposition apparatus |
| 06/18/2013 | US8465591 Film deposition apparatus |
| 06/18/2013 | US8465589 Machine and process for sequential multi-sublayer deposition of copper indium gallium diselenide compound semiconductors |
| 06/18/2013 | US8464419 Methods of and factories for thin-film battery manufacturing |
| 06/14/2013 | DE202013101850U1 Vakuumanordnung Vacuum assembly |
| 06/13/2013 | WO2013086087A1 Chemical vapor deposition (cvd) of ruthenium films and applications for same |
| 06/13/2013 | WO2013085885A1 Gas injector apparatus for plasma applicator |
| 06/13/2013 | WO2013085557A1 Amorphous ionically-conductive metal oxides, method of preparation, and battery |
| 06/13/2013 | WO2013084604A1 Film conveying and forming apparatus |
| 06/13/2013 | WO2013083450A1 Process for preparing trialkylgallium compounds |
| 06/13/2013 | WO2013083449A1 Process for preparing trialkyl compounds of metals of group iiia |
| 06/13/2013 | WO2013083447A1 Hard-material-coated bodies composed of metal, cemented hard material, cermet or ceramic and processes for producing such bodies |
| 06/13/2013 | WO2013083196A1 Substrate holder for full area processing, carrier and method of processing substrates |
| 06/13/2013 | WO2013083016A1 Low-pressure chemical vapor deposition apparatus and thin-film deposition method thereof |
| 06/13/2013 | WO2013055141A3 Apparatus and method for surface modification of biological material |
| 06/13/2013 | WO2012134663A3 Method and apparatus utilizing a single lift mechanism for processing and transfer of substrates |
| 06/13/2013 | WO2012076276A3 Electric machine with a rotor |
| 06/13/2013 | US20130149871 Chemical vapor deposition film profile uniformity control |
| 06/13/2013 | US20130149870 Substrate carrier and applications thereof |
| 06/13/2013 | US20130149868 Masking Method and Apparatus |
| 06/13/2013 | US20130149551 Diffusion coating method and chromium coat produced therewith |
| 06/13/2013 | US20130149473 Insulating glass units with low-e and antireflective coatings, and/or methods of making the same |
| 06/13/2013 | US20130149470 Process and apparatus for the application of solid layers |
| 06/13/2013 | US20130149469 Combinatorial rf bias method for pvd |
| 06/13/2013 | US20130149467 Film deposition apparatus, film deposition method, and computer-readable recording medium |
| 06/13/2013 | US20130149462 Surface treatment and deposition for reduced outgassing |
| 06/13/2013 | US20130149461 Electroless copper deposition |
| 06/13/2013 | US20130149447 Method of forming carbonaceous particles and articles therefrom |
| 06/13/2013 | US20130149446 Nozzle head and apparatus |
| 06/13/2013 | US20130146564 Plasma treatment apparatus and plasma treatment method |
| 06/13/2013 | US20130146468 Chemical vapor deposition (cvd) of ruthenium films and applications for same |
| 06/13/2013 | US20130145989 Substrate processing tool showerhead |
| 06/13/2013 | US20130145988 Substrate Processing Bubbler Assembly |
| 06/13/2013 | DE112011102857T5 Anordnung Arrangement |
| 06/13/2013 | DE112011102835T5 Wasserreaktives, Al-basiertes Verbundsmaterial, wasserreaktiver, Al-basierter,thermisch gespritzter Film, Verfahren für die Herstellung eines solchen Al-basierten, thermisch gespritzten Films und Bestandteil für eine Filmbildungskammer Water activated, Al-based composite material, water-reactive Al-based, thermally sprayed film, method for the production of such Al-based, thermally sprayed film and part of a film forming chamber |
| 06/13/2013 | DE112011102311T5 Gleitlager Plain bearings |
| 06/13/2013 | DE102011121078A1 Cyclic evaporation using volatile precursor and carrier gas, comprises supplying the precursor vapor, introducing carrier gas and modulating in mass flow, such that a cyclic change in pressure is obtained and a pressure gradient is formed |
| 06/13/2013 | DE102009011960B4 Verfahren zur Überwachung von Plasma-Entladungen A method for monitoring plasma discharges |
| 06/12/2013 | EP2602813A1 Plasma treatment device |
| 06/12/2013 | EP2602356A1 Vacuum processing apparatus and plasma processing method |
| 06/12/2013 | EP2602353A1 Diamond film coated member and manufacturing method of the same |
| 06/12/2013 | EP2601329A1 Exhaust for cvd reactor |
| 06/12/2013 | CN202996788U Mixing block and CVD system |
| 06/12/2013 | CN202989278U Electromagnetic heating device for MOCVD (Metal Organic Chemical Vapor Deposition) reaction chamber |
| 06/12/2013 | CN202989276U Horizontal fine adjustment and record device of heating platform of wafer coating film |
| 06/12/2013 | CN202985579U Sensor triggering transmission and mechanical arm |
| 06/12/2013 | CN103155718A Plasma processing apparatus |
| 06/12/2013 | CN103155717A System, method and apparatus for controlling ion energy distribution |
| 06/12/2013 | CN103155134A Tray for loading substrates |
| 06/12/2013 | CN103155120A Induction heating device |
| 06/12/2013 | CN103155103A Plasma treatment device |
| 06/12/2013 | CN103154331A Method for growing white color diamonds by using diborane and nitrogen in combination in a microwave plasma chemical vapor deposition system |
| 06/12/2013 | CN103154315A Vapor phase growing apparatus |
| 06/12/2013 | CN103154314A Mechanically fluidized reactor systems and methods, suitable for production of silicon |
| 06/12/2013 | CN103154313A Film-formation device and film-formation method |
| 06/12/2013 | CN103154312A Thermalizing gas injectors, material deposition systems, and related methods |
| 06/12/2013 | CN103153868A Nbon film, method for producing nbon film, hydrogen generation device, and energy system provided with same |
| 06/12/2013 | CN103151335A Cobalt nitride layers for copper interconnects and methods for forming them |
| 06/12/2013 | CN103147071A Chemical vapor deposition film profile uniformity control |
| 06/12/2013 | CN103147070A Method for controlling film thickness uniformity of DLC deposited film and adjustment base plate |
| 06/12/2013 | CN103147069A Manufacturing method for metalorganic epitaxial thin film |
| 06/12/2013 | CN103147068A Gas injector and film deposition apparatus having the sam |
| 06/12/2013 | CN103147067A Low-pressure chemical vapor deposition device and thin-film deposition method thereof |
| 06/12/2013 | CN103147066A Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants |
| 06/12/2013 | CN103147065A Gallium nitride film for solar cell window layer and preparation method thereof |
| 06/12/2013 | CN103147064A Electronic type gallium nitride (n-GaN) thin film and preparation method thereof |
| 06/12/2013 | CN103147063A Method for preparing diamond coating on surface of TiNi alloy |
| 06/12/2013 | CN103147062A Methods of preparing thin films by atomic layer deposition using monocyclopentadienyl trialkoxy hafnium and zirconium precursors |
| 06/12/2013 | CN103146935A Pyrolyzing furnace for preparing nickel rod through chemical vapor deposition method and method for preparing nickel rod |
| 06/12/2013 | CN103146892A Femtosecond laser surface pretreatment method for improving bonding state of layer base or film base |