Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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08/29/2013 | WO2011110162A8 Method and device for plasma-treating workpieces |
08/29/2013 | US20130224519 Coating For Improved Wear Resistance |
08/29/2013 | US20130224455 Display substrate having a blocking layer |
08/29/2013 | US20130224401 Silicon seed rod assembly of polycrystalline silicon, method of forming the same, polycrystalline silicon producing apparatus, and method of producing polycrystalline silicon |
08/29/2013 | US20130224400 Apparatus for treating an object, more particularly the surface of an object made of polymer |
08/29/2013 | US20130224399 Method of forming nitrogen-free dielectric anti-reflection layer |
08/29/2013 | US20130224381 Thin-film forming method and thin-film forming apparatus |
08/29/2013 | US20130224380 Single-Unit Reactor Design for Combined Oxidative, Initiated, and Plasma-Enhanced Chemical Vapor Deposition |
08/29/2013 | US20130223469 Controlling the emissive properties of materials-improved lasers and upconversion materials |
08/29/2013 | US20130221834 Planar mirco-tube discharger structure and method for fabricating the same |
08/29/2013 | US20130221420 Structure comprising a ruthenium metal material |
08/29/2013 | US20130220551 Substrate processing apparatus |
08/29/2013 | US20130220523 Coating compositions, applications thereof, and methods of forming |
08/29/2013 | US20130220377 Method of cleaning a film-forming apparatus |
08/29/2013 | US20130220222 Gas Distribution Apparatus with Heat Exchanging Channels |
08/29/2013 | US20130220221 Method and apparatus for precursor delivery |
08/29/2013 | DE112011103330T5 System und Verfahren zur schnellen Puls-Gasabgabe System and method for fast pulse-gassing |
08/29/2013 | DE102012101456A1 Verfahren zum Herstellen einer Solarzelle A method of manufacturing a solar cell |
08/29/2013 | DE102012101438A1 Method for cleaning process chamber of chemical vapor deposition (CVD) reactor, involves removing susceptor from process chamber, and cleaning process chamber cover at specific temperature |
08/28/2013 | EP2631332A1 Method for metalizing a substrate |
08/28/2013 | EP2631331A1 Production of agglomerates from gas phase |
08/28/2013 | EP2631330A1 Production of agglomerates from gas phase |
08/28/2013 | EP2631329A1 Vicinal surfaces of polycrystalline structures |
08/28/2013 | EP2631326A1 Ballpoint pen tip and ballpoint pen |
08/28/2013 | EP2631025A1 Plasma spray method |
08/28/2013 | EP2630273A1 Method and device for plasma-treating workpieces |
08/28/2013 | EP2630272A1 Device and process for coating a substrate |
08/28/2013 | EP2630271A1 Modular coater separation |
08/28/2013 | EP1640474B1 Thin film forming device |
08/28/2013 | CN203159709U Atomic layer deposition device |
08/28/2013 | CN203159708U Graphite boat automatic running system adapting to multi-pipe PECVD (Plasma Enhanced Chemical Vapor Deposition) device |
08/28/2013 | CN203159707U Metal-organic chemical vapor deposition (MOCVD) apparatus having multiple sub-reactor structures |
08/28/2013 | CN203159706U Multi-box film-plating machine |
08/28/2013 | CN203159697U Mask frame and corresponding mask assembly thereof |
08/28/2013 | CN103270194A Gas lock, and coating apparatus comprising a gas lock |
08/28/2013 | CN103270193A Rear-side cover of a photovoltaic module |
08/28/2013 | CN103270192A Retaining device for substrates and method for coating a substrate |
08/28/2013 | CN103266352A Low cost high-performance polycrystalline silicon base film preparation method |
08/28/2013 | CN103266310A Dispersing plate and film coating device provided with same |
08/28/2013 | CN103266309A Apparatus and methods for deposition reactors |
08/28/2013 | CN103266308A Zinc oxide based photoelectric position sensing material and preparation method thereof |
08/28/2013 | CN103266307A Reaction cavity |
08/28/2013 | CN103266306A Method for preparing graphene or ultrathin carbon film by PVD (physical vapor deposition) technique |
08/28/2013 | CN102602920B Preparation method of iron-coated graphene nanocomposite material |
08/28/2013 | CN102362007B Recovery of monobutyltin trichloride |
08/28/2013 | CN102157423B Substrate mounting table and method for manufacturing the same, and substrate processing apparatus |
08/28/2013 | CN102140630B Coating device |
08/28/2013 | CN102137952B High-k dielectric films and methods of producing using cerium-based precursors |
08/28/2013 | CN102108493B Soft board coating device |
08/28/2013 | CN101809719B Methods and arrangements for plasma processing system with tunable capacitance |
08/28/2013 | CN101772589B Method of coating semiconductor processing apparatus with protective yttrium-containing coatings |
08/28/2013 | CN101709457B Device of chemical vapor deposition diamond or other substances |
08/27/2013 | US8518553 Layered structure |
08/27/2013 | US8518491 Preparation of epitaxial graphene surfaces for atomic layer deposition of dielectrics |
08/27/2013 | US8518488 Method for using apparatus configured to form germanium-containing film |
08/27/2013 | US8518487 Method of forming organic film |
08/27/2013 | US8518486 Methods of forming and utilizing rutile-type titanium oxide |
08/27/2013 | US8518484 easy to clean because of the removable top wall member, maintains purity of the liquid precursor chemical, increases usage rate of the liquid or solid precursor chemical and thereby reduces waste; ampoules |
08/27/2013 | US8518483 Diptube apparatus and method for delivering vapor phase reagent to a deposition chamber |
08/27/2013 | US8518482 Vessel with a removable top wall, a sidewall and a bottom wall forming an internal vessel to hold a source chemical and an inner gas volume above the fill level; temperature sensor and a source chemical level sensor |
08/27/2013 | US8518284 Plasma treatment apparatus and method for plasma-assisted treatment of substrates |
08/27/2013 | US8518211 System and method for controlling plasma with an adjustable coupling to ground circuit |
08/27/2013 | US8518209 Apparatus for determining the endpoint of a cleaning or conditioning process in a plasma processing system |
08/27/2013 | US8518184 Methods and systems for controlling temperature during microfeature workpiece processing, E.G., CVD deposition |
08/27/2013 | US8518183 Film deposition apparatus, substrate process apparatus, film deposition method, and computer readable storage medium |
08/27/2013 | US8518182 Substrate processing apparatus |
08/27/2013 | US8518181 Film forming apparatus and film forming method |
08/22/2013 | WO2013123185A1 Deposition system and method of forming a metalloid-containing material therewith |
08/22/2013 | WO2013123143A1 Silicon nitride films for semiconductor device applications |
08/22/2013 | WO2013123039A1 Electrodes formed by oxidative chemical vapor deposition and related methods and devices |
08/22/2013 | WO2013122954A1 Linear pecvd apparatus |
08/22/2013 | WO2013121102A2 Nozzle and nozzle head |
08/22/2013 | WO2013098794A3 Nickel allyl amidinate precursors for deposition of nickel-containing films |
08/22/2013 | WO2013095733A3 Selenophene-based low band gap active layers by chemical vapor deposition |
08/22/2013 | WO2013082488A3 Optical coating method, apparatus and product |
08/22/2013 | WO2012092064A8 Wafer processing with carrier extension |
08/22/2013 | US20130217214 Closed-Space Annealing Process for Production of CIGS Thin-Films |
08/22/2013 | US20130217211 Controlled-Pressure Process for Production of CZTS Thin-Films |
08/22/2013 | US20130217177 Crystallization Annealing Processes for Production of CIGS and CZTS Thin-Films |
08/22/2013 | US20130217176 Closed-Space Annealing of Chalcogenide Thin-Films with Volatile Species |
08/22/2013 | US20130217155 Pattern forming method, pattern forming apparatus, and method for manufacturing semiconductor device |
08/22/2013 | US20130216800 Perovskite to brownmillerite complex oxide crystal structure transformation induced by oxygen deficient getter layer |
08/22/2013 | US20130216777 Nanostructured Multi-Layer Coating on Carbides |
08/22/2013 | US20130216731 Control of differential pressure in pecvd systems |
08/22/2013 | US20130216728 Continuous Low Vacuum Coating Apparatus |
08/22/2013 | US20130216711 Apparatus for treating and/or coating the surface of a substrate component |
08/22/2013 | US20130216710 Thin film forming method and thin film forming apparatus |
08/22/2013 | US20130216708 Precursor evaporators and methods of forming layers using the same |
08/22/2013 | US20130213573 State-based adjustment of power and frequency |
08/22/2013 | US20130213464 Conductive film substrate, photovoltaic cell having the same, and method of manufacturing the same |
08/22/2013 | US20130213299 Liquid tank and thin film deposition apparatus using the same |
08/22/2013 | DE112005001387B4 Anwendung einer vom waferemissionsvermögen unabhängigen aktiven wafertemperaturregeleinrichtung, verfahren, vorrichtung und maschinenlesbares medium Application of a wafer from emission assets independent active wafer temperature regulating device, process, apparatus and computer readable medium |
08/22/2013 | DE102012222672A1 Gerät zur Abscheidung organischer Schichten und Verfahren zum Fertigen von Geräten mit organischer lichtemittiereder Anzeige unter Verwendung desselben Apparatus for deposition of organic layers, and method of fabricating devices with organic lichtemittiereder display using the same |
08/22/2013 | DE102009028579B4 Beschichtete Körper aus Metall, Hartmetall, Cermet oder Keramik sowie Verfahren zur Beschichtung derartiger Körper Coated body made of metal, hard metal, cermet or ceramic and method for coating such body |
08/22/2013 | DE102008024372B4 Verfahren zum Transport von Substraten in Vakuumbeschichtungseinrichtungen A method for transporting substrates in vacuum coating installations |
08/21/2013 | EP2628823A2 Chemical vapour deposition apparatus |
08/21/2013 | EP2628822A1 Current insulated bearing components and bearings |
08/21/2013 | EP2628821A1 Apparatus and methods for deposition reactors |
08/21/2013 | EP2628820A1 Apparatus and methods for deposition reactors |
08/21/2013 | EP2628817A1 A coated article of martensitic steel and a method of forming a coated article of steel |