| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 07/17/2013 | CN102352512B Method for preparing high-adhesion diamond coating with pulse laser |
| 07/17/2013 | CN102352490B Preparation method for nitrogen-doped carbon nanometer tube |
| 07/17/2013 | CN102337524B Preparation method of Bi-based chalcogenide thermoelectric thin film |
| 07/17/2013 | CN102337518B Support plate recovery control method, system and film deposition device and method |
| 07/17/2013 | CN102277560B Method for improving oxidation resistance of graphite electrode by obtaining SiC/C gradient surface coating through chemical vapor deposition |
| 07/17/2013 | CN102140625B Method for preparing plasma-oriented tungsten coating used in fusion reactor by using tungsten carbonyl as precursor |
| 07/17/2013 | CN102086514B PECVD (plasma enhanced chemical vapor deposition) system |
| 07/17/2013 | CN101809195B Process for selective area deposition of inorganic materials |
| 07/17/2013 | CN101748387B Film deposition apparatus |
| 07/17/2013 | CN101678642B Molded plastic with vapor-deposited film and process for producing the same |
| 07/17/2013 | CN101543141B Plasma processing apparatus |
| 07/17/2013 | CN101541701B Method of making a low-resistivity, doped zinc oxide coated glass article and the coated glass article made thereby |
| 07/17/2013 | CN101528974B Method for deposition of dielectric layer in clearance formed on a substrate and filling the clearance using the dielectric material |
| 07/17/2013 | CN101511713B Load port module |
| 07/17/2013 | CN101495674B Method for forming porous insulating film |
| 07/16/2013 | US8486737 Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same |
| 07/16/2013 | US8486726 Method for improving performance of a substrate carrier |
| 07/16/2013 | US8486488 Method and device for coating a polymer film with an oxide layer |
| 07/16/2013 | US8486487 Gas barrier film, gas barrier film manufacturing method, resin substrate for organic electroluminescent device using the aforesaid gas barrier film, and organic electroluminescent device using the aforementioned gas barrier film |
| 07/16/2013 | US8486485 Method of dispensing imprintable medium |
| 07/16/2013 | US8486242 Deposition apparatus and methods to reduce deposition asymmetry |
| 07/16/2013 | US8486196 Vaporizing apparatus and film forming apparatus provided with vaporizing apparatus |
| 07/16/2013 | US8486195 Atomic layer deposition apparatus and method of fabricating atomic layer using the same |
| 07/16/2013 | US8486194 Apparatus for efficient removal of halogen residues from etched substrates |
| 07/16/2013 | US8486193 Systems for forming semiconductor materials by atomic layer deposition |
| 07/16/2013 | US8486192 Thermalizing gas injectors for generating increased precursor gas, material deposition systems including such injectors, and related methods |
| 07/16/2013 | US8486191 Substrate reactor with adjustable injectors for mixing gases within reaction chamber |
| 07/16/2013 | US8485128 Movable ground ring for a plasma processing chamber |
| 07/16/2013 | US8485127 Processing apparatus |
| 07/16/2013 | CA2556066C Vapor phase growth apparatus |
| 07/11/2013 | WO2013103965A1 Automated dewpoint oxygen measurement system |
| 07/11/2013 | WO2013103076A1 Method for forming tin film and storage medium |
| 07/11/2013 | WO2013102577A1 Heat transfer control in pecvd systems |
| 07/11/2013 | WO2013102362A1 Atomic layer deposition apparatus |
| 07/11/2013 | WO2013102360A1 Method for preparing graphene by reaction with cl2 based on annealing with assistant metal film |
| 07/11/2013 | WO2013102359A1 Method for preparing graphene on sic substrate based on annealing with assistant metal film |
| 07/11/2013 | WO2013007389A3 Method for forming a layer on a substrate at low temperatures |
| 07/11/2013 | US20130177760 Mixed metal oxide barrier films and atomic layer deposition method for making mixed metal oxide barrier films |
| 07/11/2013 | US20130177717 Method for producing wavelength plate |
| 07/11/2013 | US20130177695 Methods of Manufacturing End Effectors for Energy-Based Surgical Instruments |
| 07/11/2013 | US20130174982 Metal hard mask fabrication |
| 07/11/2013 | US20130174783 Film-forming apparatus |
| 07/11/2013 | US20130174782 Low Temperature Deposition Apparatus |
| 07/11/2013 | DE112008001548B4 Plasmabearbeitungsvorrichtung und Plasmabearbeitungsverfahren Plasma processing apparatus and plasma processing method |
| 07/11/2013 | DE102012206598A1 Herstellung von metall-hartmasken Manufacture of metal hard mask |
| 07/11/2013 | DE102012200211A1 Vorrichtung und Verfahren zur Oberflächenbearbeitung eines Substrates An apparatus and method for surface processing a substrate |
| 07/11/2013 | DE102012100176A1 Verfahren zur chemischen Gasphaseninfiltration von refraktären Stoffen A method of chemical vapor infiltration of refractory materials |
| 07/10/2013 | EP2612948A2 Process for coating a turbine rotor and articles thereof |
| 07/10/2013 | EP2612544A1 System, method and apparatus for controlling ion energy distribution |
| 07/10/2013 | EP2611947A1 Method of coating a substrate for manufacturing a solar cell |
| 07/10/2013 | DE202013102834U1 Durchlauf-Substratbehandlungsanlage Pass substrate treatment plant |
| 07/10/2013 | CN203049035U Device for improving PECVD (plasma enhanced chemical vapor deposition) coating uniformity |
| 07/10/2013 | CN203049034U Substrate supporting seat |
| 07/10/2013 | CN203049033U Device for improving uniformity of plasma enhanced chemical vapor deposition (PECVD) coating films |
| 07/10/2013 | CN203049032U Chemical vapor deposition device |
| 07/10/2013 | CN203049029U Thin resin material coating clamp |
| 07/10/2013 | CN203049019U Mask film device used for preparing back electrode of thin-film solar cell |
| 07/10/2013 | CN103202105A Plasma processing apparatus |
| 07/10/2013 | CN103201408A Radical reactor with multiple plasma chambers |
| 07/10/2013 | CN103201062A Alumina layer with multitexture components |
| 07/10/2013 | CN103199007A Metal hard mask fabrication |
| 07/10/2013 | CN103194738A Reinforced diffusion plate and manufacturing method thereof |
| 07/10/2013 | CN103194737A Gas distributor used in atomic layer deposition device |
| 07/10/2013 | CN103194736A Gas distributor and atomic layer deposition device |
| 07/10/2013 | CN103194735A Manufacturing process of step drill for processing rivet holes of automobile brake pads |
| 07/10/2013 | CN103194734A Preparation method of self-assembled three-dimensional hafnium carbide whisker network structure |
| 07/10/2013 | CN103194733A Atomic layer deposition device |
| 07/10/2013 | CN103194732A PECVD deposition device heater temperature-homogenizing plate fixing apparatus |
| 07/10/2013 | CN103194731A Method for preparing nitrogen-doped titanium dioxide porous membrane |
| 07/10/2013 | CN103194730A Titanium nitride chemical vapor deposition device |
| 07/10/2013 | CN103194729A Method for preparing metal chalcogenide film |
| 07/10/2013 | CN103193220A Silicon nanocone composite graphene nanosheet material and preparation method thereof |
| 07/10/2013 | CN103193217A Method for preparing boron-doped diamond and carbon nanotube composite nanocone |
| 07/10/2013 | CN102647847B 等离子体处理装置 The plasma processing apparatus |
| 07/10/2013 | CN102618849B Method for preparing one-dimensional ZnO/SnO2 core/shell structure nano heterojunction semiconductor material |
| 07/10/2013 | CN102433544B Method for growing large-area graphene by utilizing multi-benzene-ring carbon source low-temperature chemical vapor deposition |
| 07/10/2013 | CN102424956B Spraying apparatus for metal-organic chemical vapor deposition equipment |
| 07/10/2013 | CN102234788B Vapor phase deposition system and cooling water device |
| 07/10/2013 | CN102197159B Take-up vacuum processing device |
| 07/10/2013 | CN102165098B Surface treatment nozzle device |
| 07/10/2013 | CN102027151B Water-reactive Al composite material, water-reactive Al film, method for production of the Al film, and structural member for film-forming chamber |
| 07/10/2013 | CN101809196B Deposition system for thin film formation |
| 07/10/2013 | CN101473060B Vacuum processing chamber suitable for etching high aspect ratio features |
| 07/10/2013 | CN101052463B Micro-channel reactor with catalysts applied directly to alumina, methods using same and oxidative dehydrogenation |
| 07/10/2013 | CA2798753A1 Methods of manufacturing end effectors for energy-based surgical instruments |
| 07/09/2013 | US8481122 Methods of forming material over substrates |
| 07/09/2013 | US8481121 Methods of forming thin metal-containing films by chemical phase deposition |
| 07/09/2013 | US8481120 Method for coating a substrate and metal alloy vacuum deposition facility |
| 07/09/2013 | US8481119 Bisamineazaallylic ligands and their use in atomic layer deposition methods |
| 07/09/2013 | US8481118 Multi-gas straight channel showerhead |
| 07/09/2013 | US8481117 Method for applying a thermal barrier coating |
| 07/09/2013 | US8481102 Temperature control method for chemical vapor deposition apparatus |
| 07/09/2013 | US8480861 Method of treating gas |
| 07/09/2013 | US8480850 Plasma treatment system |
| 07/09/2013 | US8480848 Plasma processing apparatus |
| 07/09/2013 | US8480806 Bonding structure and semiconductor device manufacturing apparatus |
| 07/09/2013 | US8480805 System and method for sealing a vapor deposition source |
| 07/09/2013 | US8480804 Thin film, method and apparatus for forming the same, and electronic component incorporating the same |
| 07/08/2013 | DE202013102775U1 Transportwalze und Transporteinrichtung für eine horizontale Durchlauf-Substratbehandlungsanlage Transport roller and conveyor device for horizontal scrolling substrate treatment plant |
| 07/04/2013 | WO2013101303A1 Heteroleptic pyrrolecarbaldimine precursors |