Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
08/2013
08/21/2013EP2627797A1 Apparatus and method for atomic layer deposition on a surface
08/21/2013CN203150595U Tail gas treatment, recovery and recycling apparatus of MOCVD grown gallium nitride wafer
08/21/2013CN203144511U Pyrolysis furnace for preparing nickel rod by chemical vapour deposition method
08/21/2013CN203144510U Hook for plasma chemical vapor deposition equipment
08/21/2013CN203144505U Cleaning device
08/21/2013CN103262207A Multi-layer substrate structure and manufacturing method for the same
08/21/2013CN103261760A Low-friction sliding ring having an economical diamond coating
08/21/2013CN103261478A Apparatus and method for atomic layer deposition on a surface
08/21/2013CN103261477A Apparatus and method for depositing a layer onto a substrate
08/21/2013CN103261476A Sliding element, in particular a piston ring, having a coating
08/21/2013CN103258763A Wafer loading platform structure commonly used by wafers of different sizes
08/21/2013CN103256306A Current insulated bearing components and bearings
08/21/2013CN103255395A PECVD processing chamber ion source diffusion plate device
08/21/2013CN103255394A Manufacturing method of heater for metal organic chemical vapor deposition
08/21/2013CN103255393A Semiconductor manufacturing apparatus
08/21/2013CN103255392A Spray head and vapour deposition equipment
08/21/2013CN103255391A Water bath tank and film deposition apparatus using same
08/21/2013CN103255390A Heater of metal organic chemical vapor deposition
08/21/2013CN103255389A Method for epitaxial growth of III nitride semiconductor material on silicon substrate
08/21/2013CN103255388A Plasma chemical vapor deposition method of phosphosilicate glass film
08/21/2013CN103253648A Preparation method of carbon nanotube by growing on foamed nickel substrate
08/21/2013CN103252938A Coated article of martensitic steel and method of forming coated article of steel
08/21/2013CN103252509A A surface coating cutting tool with a hard coating layer exhibiting excellent broken fracture resistance
08/21/2013CN102650046B Device for largely and continuously preparing two-dimensional nanometer films in large
08/21/2013CN102409318B Thermochemical vapor deposition reactor and method for improving thermal radiance in reactor
08/21/2013CN102383113B Method and device for improving efficiency of preparing diamond coating on tool surface and coating evenness
08/21/2013CN102345112B Semiconductor processing device and gas spray head cooling plate thereof
08/21/2013CN102325921B Mocvd reactor having cylindrical gas inlet element
08/21/2013CN102282291B Raw material for chemical vapor deposition, and process for forming silicon-containing thin film using same
08/21/2013CN102234785B Substrate coating and forming method thereof
08/21/2013CN102037791B Plasma processing apparatus
08/21/2013CN101994097B Film coating device
08/21/2013CN101970716B Body coated with hard material
08/21/2013CN101883652B A new product and method for its manufacture within material processing
08/21/2013CN101714506B Capacitor with hafnium oxide and aluminum oxide alloyed dielectric layer and method for fabricating the same
08/21/2013CN101688298B Method and device for preparing a multilayered coating on a substrate
08/21/2013CN101313092B Interconnects and heat dissipators based on nanostructures
08/21/2013CN101195193B Laser processing apparatus, laser processing method, substrate, manufacturing method of substrate, manufacturing method of display apparatus
08/20/2013US8513137 Plasma processing apparatus and plasma processing method
08/20/2013US8512816 Method of fabricating thin film by microplasma processing and apparatus for same
08/20/2013US8512807 Method of making cutting tool inserts with high demands on dimensional accuracy
08/20/2013US8512806 Large volume evaporation source
08/20/2013US8512798 Threading substrate strands through reactor;mixing yttrium-barium-copper oxide superconducting precursor vapor with inert gas, nitrous oxide, and oxygen; energizing diatomic oxygen to form monoatomic oxygen and excite precursors to high energy state; microwave plasma injection; continuous translation
08/20/2013US8512612 Nano-fibered membrane for western blot and manufacturing method of the same
08/20/2013US8512511 Mounting table and plasma processing apparatus
08/20/2013US8512510 Plasma processing method and apparatus
08/20/2013US8512474 Apparatus for precursor delivery system for irradiation beam instruments
08/20/2013US8512473 Substrate centering device and organic material deposition system
08/20/2013US8512472 Method and apparatus to enhance process gas temperature in a CVD reactor
08/20/2013US8511504 Demisable fuel supply system
08/20/2013CA2555032C Cylindrical microwave chamber
08/15/2013WO2013119430A1 Pressure control valve assembly of plasma processing chamber and rapid alternating process
08/15/2013WO2013117955A1 Method for the deposition of a ruthenium containing film using arene diazadiene ruthenium(0) precursors
08/15/2013WO2013117885A1 Device for supporting mechanical seal faces
08/15/2013WO2013089805A3 Electrically conducting nanocomposite wire comprising tow of multiwalled carbon nanotubes and transverse metal bridges
08/15/2013WO2013056831A3 Drill having a coating
08/15/2013US20130210241 Precursors for Plasma Activated Conformal Film Deposition
08/15/2013US20130210232 Cut-mask patterning process for fin-like field effect transistor (finfet) device
08/15/2013US20130209780 Tunable nanoporous films on polymer substrates, and method for their manufacture
08/15/2013US20130209767 Coated article of martensitic steel and a method of forming a coated article of steel
08/15/2013US20130209766 Lubricity vessel coating, coating process and apparatus
08/15/2013US20130209757 Using chemical vapor deposited films to control domain orientation in block copolymer thin films
08/15/2013US20130209706 Apparatus and method for coating substrates using the eb/pvd process
08/15/2013US20130209704 Power lance and plasma-enhanced coating with high frequency coupling
08/15/2013US20130209703 Hollow-cathode gas lance for the interior coating of containers
08/15/2013US20130209701 Method of preparing sample for tem observation
08/15/2013US20130209700 Tem sample preparation method
08/15/2013US20130209685 Doping method of atomic layer deposition
08/15/2013US20130209684 Method and apparatus for igniting silicon rods outside a cvd-reactor
08/15/2013US20130209198 Techniques for handling media arrays
08/15/2013US20130209183 Fabrication method for diamond film coating of drill bit
08/15/2013US20130209006 Current insulated bearing components and bearings
08/15/2013US20130206725 Creation of off-axis null magnetic field locus for improved uniformity in plasma deposition and etching
08/15/2013US20130206337 Arrangements for controlling plasma processing parameters
08/15/2013US20130206070 Deposition ring
08/15/2013US20130206069 Deposition apparatus
08/15/2013US20130206068 Linear pecvd apparatus
08/14/2013EP2626890A1 Epitaxial wafer, light-receiving element, optical sensor device, and method for manufacturing epitaxial wafer and light-receiving element
08/14/2013EP2626446A1 Power lance and plasma-assisted coating with the input of a high frequency
08/14/2013EP2626445A1 Hollow cathode gas lance for internally coating containers
08/14/2013EP2625309A1 Control of differential pressure in pecvd systems
08/14/2013EP2625308A2 Mechanically fluidized reactor systems and methods, suitable for production of silicon
08/14/2013EP2625307A2 Wear resistant coating, article, and method
08/14/2013DE10319206B4 Verwendung von KrF-Excimerlasern zur Laserpulsabscheidung und zur Spannungsreduzierung von dünnen Schichten Using KrF excimer lasers for laser pulse deposition and voltage reduction of thin layers
08/14/2013DE102012210068A1 Vacuum substrate treatment-throughput processing system comprises vacuum chamber, substrate processing device in vacuum chamber, and transport device for conveying plate-shaped substrates, which comprises a number of transport rollers
08/14/2013DE102012202086A1 Prozesswalze zur Aufnahme und Führung von bandförmigen Substraten in Vakuum-Beschichtungsanlagen Process roller for receiving and guiding of band-shaped substrates in vacuum coating equipment
08/14/2013DE102012201956A1 Hohlkathoden-Gaslanze für die Innenbeschichtung von Behältern Hollow cathode gas lance for the internal coating of containers
08/14/2013DE102012201955A1 Powerlanze und plasmaunterstützte Beschichtung mit Hochfrequenzeinkopplung Power lance, and plasma-assisted coating with high-frequency coupling
08/14/2013DE102012201953A1 Verfahren und Vorrichtung zur Passivierung von Solarzellen mit einer Aluminiumoxid-Schicht Method and apparatus for the passivation of solar cells with an alumina layer
08/14/2013DE102010062357B4 Vorrichtung und Verfahren zur Herstellung eines mit zumindest einer Korrosionsschutzschicht beschichteten magnesiumhaltigen Substrats Apparatus and method for making a coated with at least one anti-corrosion layer containing magnesium substrate
08/14/2013CN203128659U Microwave exciting CVD (chemical vapor deposition) coating equipment
08/14/2013CN203128658U Laser CVD (chemical vapor deposition) coating equipment
08/14/2013CN203128657U Laser exciting CVD (chemical vapor deposition) coating equipment
08/14/2013CN203128656U CVD (chemical vapor deposition) device adopting light heating
08/14/2013CN203128655U Gas-flow distribution panel
08/14/2013CN203128654U Chemical vapor deposition (CVD) device adopting electromagnetic heating
08/14/2013CN203128653U Quartz outer tube protective device and furnace tube
08/14/2013CN203128652U Etching and baking device
08/14/2013CN1853832B Cutting tool coated with hard alloy and spraying target material for producing same
08/14/2013CN103249865A Plasma cvd apparatus
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