Patents for C09K 13 - Etching, surface-brightening or pickling compositions (3,392) |
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04/01/2010 | US20100081281 Abrasive compositions for chemical mechanical polishing and methods for using same |
04/01/2010 | US20100078589 Method for purifying chemical added with chelating agent |
03/31/2010 | CN101684408A Etching agent composite for organic led display device |
03/25/2010 | US20100075502 Barrier slurry for low-k dielectrics |
03/25/2010 | US20100075501 Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method |
03/25/2010 | US20100075500 Metal polishing slurry and chemical mechanical polishing method |
03/25/2010 | US20100074974 Metal-rich siliceous compositions and methods of producing same |
03/25/2010 | US20100072418 Polishing slurry |
03/25/2010 | US20100072417 Liquid suspensions and powders of cerium oxide particles and polishing applications thereof |
03/24/2010 | EP2164938A2 New antioxidants for post-cmp cleaning formulations |
03/24/2010 | EP2164813A2 Method for the wet-chemical etching of tio2 thin-films and tio2 particles and etching reagent |
03/24/2010 | CN101680093A Etching solution, and method for metallization of plastic surface employing the method |
03/24/2010 | CN100595893C Etching solution, etched article and mehtod for etched article |
03/18/2010 | WO2010030499A1 Chemical-mechanical polishing compositions and methods of making and using the same |
03/18/2010 | US20100068890 Printable medium for etching oxidic, transparent and conductive layers |
03/18/2010 | US20100068889 Particle-containing etching pastes for silicon surfaces and layers |
03/18/2010 | US20100068883 Cmp slurry composition for forming metal wiring line |
03/11/2010 | US20100059705 Method and apparatus for removing material from microfeature workpieces |
03/11/2010 | US20100059704 Fumed silica of controlled aggregate size and processes for manufacturing the same |
03/10/2010 | CN101668830A Selective etch of tiw for capture pad formation |
03/04/2010 | US20100055909 Semiconductor polishing compound, process for its production and polishing method |
03/02/2010 | US7670496 Process for producing structural body and etchant for silicon oxide film |
02/25/2010 | WO2009137676A3 Systems and methods for staining surfaces |
02/25/2010 | US20100044625 Method for preparing cerium oxide powder using organic solvent and cmp slurry comprising the same |
02/25/2010 | US20100044624 Etchant which can be removed without residue |
02/24/2010 | CN101654617A Medicine liquid for dissolving deformation and dissolving deformation processing method |
02/23/2010 | US7666238 Comprising an abrasive and water, wherein the polishing composition has an index of degree of sedimentation of 80 or more and 100 or less; prevents clogging of a polishing pad |
02/18/2010 | US20100038584 Polishing Composition and Polishing Method Using the Same |
02/17/2010 | CN101649202A Etching bath composition for transparent conductive film |
02/16/2010 | US7662762 Aqueous solution containing fluorine compound, amine and chelate compound |
02/11/2010 | US20100035785 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
02/11/2010 | US20100035436 Composition for etching silicon oxide layer, method for etching semiconductor device using the same, and composition for etching semiconductor device |
02/11/2010 | US20100035435 Composition and Method for Improved Adhesion of Polymeric Materials to Copper or Copper Alloy Surfaces |
02/11/2010 | US20100035433 Polishing agent composition and method for manufacturing semiconductor integrated circuit device |
02/11/2010 | US20100035378 Etching method, pattern forming process, thin-film transistor fabrication process, and etching solution |
02/11/2010 | US20100032613 Etchant composition, and methods of patterning conductive layer and manufacturing flat panel display device using the same |
02/10/2010 | CN101643648A Composition for etching silicon oxide layer, method for etching semiconductor device using the same, and composition for etching semiconductor device |
02/04/2010 | US20100029080 Aqueous cerium oxide dispersion |
02/04/2010 | US20100029079 Chemical mechanical polishing composition and methods relating thereto |
02/04/2010 | US20100025624 Alkali etching liquid for silicon wafer and etching method using same |
02/04/2010 | US20100025623 Additive for polishing composition |
01/28/2010 | US20100019292 Transistor having a metal nitride layer pattern, etchant and methods of forming the same |
01/28/2010 | US20100018952 Process for removing a coating from a substrate |
01/21/2010 | US20100015806 Cmp polishing slurry, additive liquid for cmp polishing slurry, and substrate-polishing processes using the same |
01/14/2010 | US20100009540 Polishing compound, its production process and polishing method |
01/14/2010 | US20100009539 Cerium oxide powder, method for preparing the same, and cmp slurry comprising the same |
01/14/2010 | US20100009538 Silicon nitride polishing liquid and polishing method |
01/14/2010 | US20100009517 Process for Inhibiting Corrosion and Removing Contaminant from a Surface During Wafer Dicing and Composition Useful Therefor |
01/14/2010 | US20100006799 Method and Composition for Selectively Stripping Nickel from a Substrate |
01/12/2010 | US7645393 Metal surface treatment composition |
01/12/2010 | CA2297447C Method for roughening copper surfaces for bonding to substrates |
01/07/2010 | US20100003821 Wetting agent for semiconductors, and polishing composition and polishing method employing it |
01/07/2010 | US20100003737 Partially fluorinated sulfonated surfactants |
01/07/2010 | US20100001229 Cmp slurry for silicon film |
12/31/2009 | US20090325383 Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method for semiconductor device |
12/31/2009 | US20090325323 Aqueous dispersion for chemical mechanical polishing, production method thereof, and chemical mechanical polishing method |
12/31/2009 | US20090321390 Chemical mechanical polishing of moisture sensitive surfaces and compositions thereof |
12/29/2009 | CA2320051C Method for etching |
12/24/2009 | US20090317974 Polishing composition for silicon wafer, polishing composition kit for silicon wafer and method of polishing silicon wafer |
12/24/2009 | US20090317638 Polishing slurry, method for manufacturing the polishing slurry, nitride crystalline material and method for plishing surface of the nitride crystalline material |
12/24/2009 | US20090314744 CMP method for metal-containing substrates |
12/23/2009 | WO2009111719A9 Non-selective oxide etch wet clean composition and method of use |
12/23/2009 | CN101611116A Novel polishing slurries and abrasive-free solutions having a multifunctional activator |
12/23/2009 | CN100572602C Etching solution composition for metal films |
12/22/2009 | US7635789 Fluoroalkyl acid amide surfactants |
12/22/2009 | CA2398420C Method and composition to decrease iron sulfide deposits in pipe lines |
12/17/2009 | US20090311864 Polishing slurry |
12/17/2009 | US20090311628 Method for etching an ultra thin film |
12/17/2009 | US20090308836 Dihydroxy enol compounds used in chemical mechanical polishing compositions having metal ion oxidizers |
12/16/2009 | CN101605869A Compositions and methods for the selective removal of silicon nitride |
12/16/2009 | CN101604615A Method for etching an ultra thin film |
12/10/2009 | US20090302266 Aqueous dispersion for chemical mechanical polishing, chemical mechanical polishing method, and kit for preparing aqueous dispersion for chemical mechanical polishing |
12/10/2009 | US20090302003 Aqueous Solution for Chemical Polishing and Deburring and Process for Polishing and Deburring A Part made of Pure Nickel or Nickel-200 Therein |
12/09/2009 | CN101600779A Printable medium for etching of oxidic, transparent and conducting layers |
12/09/2009 | CN100567453C Chip-removing solution for integrated circuit packaging after treatment |
12/08/2009 | US7629257 Combined etching and doping substances |
12/03/2009 | WO2009145984A1 Post-contact opening etchants for post-contact etch cleans and methods for fabricating the same |
12/03/2009 | US20090298290 Polishing liquid and polishing method |
12/03/2009 | US20090298289 Chemical Mechanical Polishing Composition for Copper Comprising Zeolite |
12/02/2009 | EP2125288A2 Slurry composition and method for polishing organic polymer-based ophthalmic substrates |
11/26/2009 | US20090291620 Chemical mechanical polishing aqueous dispersion, chemical mechanical polishing method, and chemical mechanical polishing aqueous dispersion preparation kit |
11/26/2009 | US20090289032 Method and kit for surface preparation |
11/26/2009 | US20090288688 Non-corrosive chemical rinse system |
11/24/2009 | US7622049 Passivation for cleaning a material |
11/19/2009 | US20090286885 Ethylene-tetrafluoroethylene phosphate composition |
11/19/2009 | US20090286360 Etchant and method for fabricating electric device including thin film transistor using the same |
11/19/2009 | US20090283714 Etching gas for removing organic layers |
11/18/2009 | CN101580452A Preparation process of carbon tetrafluoride and equipment thereof |
11/12/2009 | WO2009137676A2 Systems and methods for staining surfaces |
11/12/2009 | WO2009111719A3 Non-selective oxide etch wet clean composition and method of use |
11/12/2009 | US20090280253 Process and composition for treating metal surfaces using trivalent chromium compounds |
11/12/2009 | US20090278081 Pad properties using nanoparticle additives |
11/12/2009 | US20090278080 Polishing Slurry |
11/11/2009 | EP2115093A1 Power transmission cable |
11/05/2009 | US20090275188 Slurry for polishing phase change material and method for patterning polishing phase change material using the same |
11/05/2009 | US20090272937 Aluminium oxide powder, dispersion and coating composition |
10/29/2009 | US20090267021 Colloidal silica for semiconductor wafer polishing and production method thereof |
10/29/2009 | US20090266414 Process for producing semiconductor substrate, semiconductor substrate for solar application and etching solution |
10/28/2009 | CN101565536A Flame-retardant polybutylece terephthalate resin composition with high glow wire ignition temperature |
10/22/2009 | US20090261291 Chemical-Mechanical Planarization Composition Having Benzenesulfonic Acid and Per-Compound Oxidizing Agents, and Associated Method for Use |