| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 02/27/2014 | US20140057050 Organic ruthenium compound for chemical vapor deposition raw material and production method for said organic ruthenium compound |
| 02/27/2014 | US20140056579 Electrode cover and evaporation device |
| 02/27/2014 | US20140054325 Evaporator with internal restriction |
| 02/27/2014 | US20140053779 Micro-balance sensor integrated with atomic layer deposition chamber |
| 02/27/2014 | US20140053777 Vapor deposition apparatus |
| 02/27/2014 | US20140053776 Gas line weldment design and process for cvd aluminum |
| 02/27/2014 | US20140053775 Chemical-Vapor-Deposition Repair Apparatus |
| 02/26/2014 | EP2701184A1 COMPOUND GaN SUBSTRATE AND METHOD FOR PRODUCING SAME, AND GROUP III NITRIDE SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SAME |
| 02/26/2014 | EP2700739A1 Epitaxial silicon carbide single-crystal substrate and process for producing same |
| 02/26/2014 | EP2700646A1 Organic platinum compound for chemical vapor deposition, and chemical vapor deposition method using organic platinum compound |
| 02/26/2014 | EP2699711A1 Hot-wire method for depositing semiconductor material on a substrate and device for performing the method |
| 02/26/2014 | EP2699706A1 Method for depositing a transparent barrier layer system |
| 02/26/2014 | EP2699522A1 Method for coating substrates |
| 02/26/2014 | CN203451618U Jointing type PECVD (Plasma Enhanced Chemical Vapor Deposition) support plate guide rail |
| 02/26/2014 | CN203451617U Welding type PECVD (Plasma Enhanced Chemical Vapor Deposition) support plate guide rail |
| 02/26/2014 | CN203451616U PECVD (Plasma Enhanced Chemical Vapor Deposition) support plate conversion device |
| 02/26/2014 | CN203451615U Quartz platform for growing graphene |
| 02/26/2014 | CN103608700A Low reflectance fingerprint resistant surface for displays |
| 02/26/2014 | CN103608486A System for and method of fast pulse gas delivery |
| 02/26/2014 | CN103608485A Laminated film and electronic device |
| 02/26/2014 | CN103602964A Method for preparing metal electrode on grapheme conductive film |
| 02/26/2014 | CN103602962A Continuous material surface normal-pressure plasma multi-stage treatment device |
| 02/26/2014 | CN103602961A Coating method of crystalline silicon solar battery with high parallel resistance |
| 02/26/2014 | CN103602960A Plate-type PECVD (plasma enhanced chemical vapor deposition) coating carrier plate |
| 02/26/2014 | CN103602959A Atomic layer deposition precursor body output device |
| 02/26/2014 | CN103602958A Laser-assisted thin film preparation method and equipment |
| 02/26/2014 | CN103602957A Equipment for preparing alpha_SiH membrane |
| 02/26/2014 | CN103602956A Vacuum depositing system and rotary feed-in device thereof |
| 02/26/2014 | CN103599733A Vibration feeding device applied in deposition fluidized bed |
| 02/26/2014 | CN102575347B Film-forming device, film-forming head, and film-forming method |
| 02/26/2014 | CN102337511B Shield member, components thereof and substrate mounting table comprising shield member |
| 02/26/2014 | CN102290260B Electric contact and preparation method thereof |
| 02/26/2014 | CN101826447B Film deposition apparatus and film deposition method |
| 02/25/2014 | US8658947 Rapid conductive cooling using a secondary process plane |
| 02/25/2014 | US8658945 Backside rapid thermal processing of patterned wafers |
| 02/25/2014 | US8658545 Vapor deposition device, vapor deposition method and organic EL display device |
| 02/25/2014 | US8658259 Nanolayer deposition process |
| 02/25/2014 | US8658249 Heteroleptic iridium precursors to be used for the deposition of iridium-containing films |
| 02/25/2014 | US8658247 Film deposition method |
| 02/25/2014 | US8658246 Manufacturing method of group of whiskers |
| 02/25/2014 | US8658010 Filtered cathodic arc deposition method and apparatus |
| 02/25/2014 | US8657959 Apparatus for atomic layer deposition on a moving substrate |
| 02/25/2014 | US8657958 CVD-Siemens monosilane reactor process with complete utilization of feed gases and total recycle |
| 02/25/2014 | US8657397 Portable device and method for printing an image, recording medium, pen and benchmark for said device |
| 02/25/2014 | US8656859 Mask and mask assembly having the same |
| 02/20/2014 | WO2014027861A1 Aluminum precursor composition |
| 02/20/2014 | WO2014027521A1 Functional film and organic el device |
| 02/20/2014 | WO2014027472A1 Method for manufacturing heat resistant composite material and manufacturing device |
| 02/20/2014 | WO2014026974A2 Method for producing a surface that is not completely ceramic |
| 02/20/2014 | WO2014026930A1 Thick polycrystalline synthetic diamond wafers for heat spreading applications and microwave plasma chemical vapour deposition synthesis techniques |
| 02/20/2014 | WO2014026907A1 Protective window device for a coating system |
| 02/20/2014 | WO2014026823A1 Device and method for producing hermetically-sealed cavities |
| 02/20/2014 | US20140050932 Method for producing a hardened, coated metal component |
| 02/20/2014 | US20140050865 Apparatus and method for coating using a hot wire |
| 02/20/2014 | US20140050861 System and method for surface modification by laser diffusion |
| 02/20/2014 | US20140050852 Vaporizer, center rod used therein, and method for vaporizing material carried by carrier gas |
| 02/20/2014 | US20140050850 Vacuum apparatus, method for cooling heat source in vacuum, and thin film manufacturing method |
| 02/20/2014 | US20140050849 Method of Catalytic Film Deposition |
| 02/20/2014 | US20140050848 Aluminum precursor composition |
| 02/20/2014 | US20140050847 Deposition device and deposition method using joule heating |
| 02/20/2014 | US20140049923 Thin film disposition |
| 02/20/2014 | US20140048016 Microwave plasma reactor for manufacturing synthetic diamond material |
| 02/20/2014 | DE112010000717B4 Plasmaverarbeitungsvorrichtung Plasma processing apparatus |
| 02/20/2014 | DE102013210625A1 Übertragung von kompressiver Verspannung in einem Zwischenschichtdielektrikum einer Halbleitervorrichtung durch Bereitstellen einer Zweischicht mit verbesserter Haftung und innerer Verspannung Transmission of compressive stress in an interlayer of a semiconductor device by providing a two-layer with improved adhesion and internal stress |
| 02/20/2014 | DE102012214784A1 Anlage zur chemischen Gasphasenabscheidung mit Kohlenstofffaser-Filamenten Plant for chemical vapor deposition with carbon fiber filaments |
| 02/19/2014 | EP2698837A1 Metal oxide thin film substrate, method of fabricating the same, photovoltaic cell and OLED including the same |
| 02/19/2014 | EP2698446A2 Crack-resistant environmental barrier coatings |
| 02/19/2014 | EP2698373A2 Precursors for gst films in ald/cvd processes |
| 02/19/2014 | EP2697514A1 Vacuum pumping system |
| 02/19/2014 | EP2697295A1 Organic resin laminate |
| 02/19/2014 | CN203440444U Diffusion device |
| 02/19/2014 | CN203440443U Mask for deposition |
| 02/19/2014 | CN103597625A CVD mask alignment for OLED processing |
| 02/19/2014 | CN103597583A Method of washing semiconductor manufacturing apparatus component, apparatus for washing semiconductor manufacturing apparatus component, and vapor phase growth apparatus |
| 02/19/2014 | CN103597118A Hard-film-covered member covered by hard film, and method for manufacturing same |
| 02/19/2014 | CN103597115A Plasma film forming apparatus and plasma film forming method |
| 02/19/2014 | CN103597114A Method and apparatus for ion-assisted atomic layer deposition |
| 02/19/2014 | CN103597113A Gas distribution showerhead for inductively coupled plasma etch reactor |
| 02/19/2014 | CN103594551A Silicon-based gallium arsenide epitaxial material and device manufacturing equipment and manufacturing method |
| 02/19/2014 | CN103592715A Preparation method of color filter based on porous alumina |
| 02/19/2014 | CN103590020A Tray assembly and MOCVD equipment with the same |
| 02/19/2014 | CN103590019A Multi-gas independent channel spraying method combining stereo partitioning and plane partitioning |
| 02/19/2014 | CN103590018A Gas treatment system and chemical vapor deposition equipment |
| 02/19/2014 | CN103590017A Precursors for GST films in ALD/CVD processes |
| 02/19/2014 | CN103590016A Method and device of plating carbon film for quartz container |
| 02/19/2014 | CN103590015A Method and device for preparing P-type amorphous-silicon-doped thin film |
| 02/19/2014 | CN103590014A Method for efficient passivation of silicon wafer for crystalline silicon heterojunction solar cell employing oxygen-doped hydrogenated amorphous silicon film |
| 02/19/2014 | CN103590004A Plasma physical and chemical codeposition apparatus and deposition method thereof |
| 02/19/2014 | CN102534570B Method for preparing microcrystalline silicon film by plasma-enhanced chemical vapor deposition |
| 02/19/2014 | CN102395704B 等离子体沉积 Plasma deposition |
| 02/19/2014 | CN102373443B Plasma processing apparatus and deposition method |
| 02/19/2014 | CN102356451B Treatment device |
| 02/19/2014 | CN102326231B Method for forming epitaxial wafer and method for manufacturing semiconductor element |
| 02/19/2014 | CN102099506B Metal/cnt and/or fullerene composite coating on strip materials |
| 02/19/2014 | CN101925550B Method for increasing durability of glass and glass product |
| 02/19/2014 | CN101660139B Film deposition apparatus and method |
| 02/18/2014 | US8653573 Dielectric layers and memory cells including metal-doped alumina |
| 02/18/2014 | US8652950 C-rich carbon boron nitride dielectric films for use in electronic devices |
| 02/18/2014 | US8652588 Method of coating a surface of an article against aquatic bio fouling |
| 02/18/2014 | US8652573 Method of CVD-depositing a film having a substantially uniform film thickness |