Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
---|
05/22/2014 | WO2014076933A1 Production method for semiconductor epitaxial wafer, semiconductor epitaxial wafer, and production method for solid-state imaging element |
05/22/2014 | WO2014076921A1 Production method for semiconductor epitaxial wafer, semiconductor epitaxial wafer, and production method for solid-state imaging element |
05/22/2014 | WO2014076276A1 Method for producing a layer on a surface area of an electronic component |
05/22/2014 | WO2014075729A1 Method and system for maintaining an edge exclusion shield |
05/22/2014 | WO2014075601A1 Tray apparatus, reaction chamber and mocvd device |
05/22/2014 | US20140141674 Apparatus and methods for plasma enhanced chemical vapor deposition of dielectric/polymer coatings |
05/22/2014 | US20140141255 Laminate body, gas barrier film, and method of manufacturing the same |
05/22/2014 | US20140141253 Method of manufacturing multilayer body, method of processing substrate, and multilayer body |
05/22/2014 | US20140141218 Laminate body, gas barrier film, method of manufacturing laminate body, and laminate body manufacturing apparatus |
05/22/2014 | US20140141177 Manufacturing method of deposition material, manufacturing apparatus of deposition material, electron beam irradiation deposition method and deposition material for electron beam irradiation deposition |
05/22/2014 | US20140141165 Method for manufacturing molybdenum oxide-containing thin film, starting material for forming molybdenum oxide-containing thin film, and molybdenum amide compound |
05/22/2014 | US20140138352 Method for making a film of uniformly arranged core-shell nanoparticles on a substrate |
05/22/2014 | US20140137802 Deposition method and apparatus |
05/22/2014 | US20140137801 Epitaxial chamber with customizable flow injection |
05/22/2014 | DE112012003488T5 Direkte Flüssigkeitsinjektion für Halidgasphasen-Epitaxiesysteme sowie Verfahren dafür Direct liquid injection for Halidgasphasen-Epitaxiesysteme and method therefor |
05/22/2014 | DE112012003485T5 Depositionssysteme einschließlich eines in einer Reaktionskammer enthaltenenVorläufergasofens sowie Verfahren dafür Deposition systems, including one in a reaction chamber containing precursor gas furnace and method therefor |
05/22/2014 | DE102013112838A1 Reaktionsbehältersystem mit geschlossenen Strömungskanälen und Verfahren zur Herstellung eines Katalysator- oder Trägermaterials Reaction vessel system with closed flow channels and process for producing a catalyst or carrier material |
05/22/2014 | DE102012220986A1 Dosiereinheit und Verfahren zur Abscheidung einer Schicht auf einem Substrat Dosing unit and method for depositing a layer on a substrate |
05/22/2014 | DE102012220314B4 Verfahren zur Herstellung einer transparenten Kohlenstoff-Nanoröhren-Graphen-Hybriddünnschicht, Nanoröhren-Graphen-Hybriddünnschicht und Feldeffekttransistor mit dieser A method for producing a transparent carbon nanotube-graphene hybrid thin film nanotube-graphene hybrid thin film field effect transistor and with this |
05/22/2014 | DE102012111218A1 Material discharge head of material discharge device comprises material discharge surface comprising material discharge openings, and connecting channel for direct connection to the material discharge opening with material storage container |
05/22/2014 | DE102012022744A1 Device for adjusting gaseous phase in reaction chamber for use in production of solar cells, has heating elements that are resistant to thermal radiation with shielding element, such that temperature of heating elements is adjusted |
05/22/2014 | DE102012018360B4 Beschichtete Pelletiermatrizen Coated Pelletiermatrizen |
05/21/2014 | EP2733232A1 Device for protecting external surfaces when aluminizing hollow components |
05/21/2014 | EP2733125A1 Method for manufacturing layered-film-bearing glass substrate |
05/21/2014 | EP2732071A2 Mixed metal oxide barrier films and atomic layer deposition method for making mixed metal oxide barrier films |
05/21/2014 | EP2732070A1 Floating substrate monitoring and control device, and method for the same |
05/21/2014 | EP2732069A1 Gas inlet member of a cvd reactor |
05/21/2014 | EP2732067A1 Methods and systems for monitoring and controlling silicon rod temperature |
05/21/2014 | EP2732065A2 Method for forming a layer on a substrate at low temperatures |
05/21/2014 | CN203602711U 一种微波等离子体化学气相沉积装置 A microwave plasma chemical vapor deposition apparatus |
05/21/2014 | CN203602710U 等离子体气相沉积用半自动插片机 Plasma vapor deposition using a semi-automatic machine inserts |
05/21/2014 | CN203602709U 用于硅基多晶硅膜沉积的气体传输装置 Polycrystalline silicon for the film deposition gas delivery device |
05/21/2014 | CN103814155A 等离子体处理室中的同步且缩短的主从式射频脉冲 Plasma processing chamber and shortened synchronous master-slave RF pulse |
05/21/2014 | CN103814153A 薄膜形成方法、薄膜形成装置、形成有覆膜的被处理物、模具以及工具 A thin film forming method, a thin film forming apparatus has a film forming material to be processed, the mold and the tools |
05/21/2014 | CN103814149A 用于监测和控制硅棒温度的方法和系统 For monitoring and controlling the temperature of the silicon rod in the method and system |
05/21/2014 | CN103813875A 切削工具 Cutting Tools |
05/21/2014 | CN103811862A 一种透明天线的制作方法 Method of making a transparent antenna |
05/21/2014 | CN103811375A 分批处理硅片的装卸载装置和设备及方法 Batch loading and unloading apparatus and equipment and method for processing wafers |
05/21/2014 | CN103805995A 碳/碳复合材料抗氧化用铼/铱涂层表面缺陷的修复方法 Carbon / carbon composites with antioxidant fix rhenium / iridium coating surface defects |
05/21/2014 | CN103805968A 等离子体处理装置和等离子体产生装置 The plasma processing apparatus and a plasma generating means |
05/21/2014 | CN103805967A 金属有机化学气相沉积装置 Metal organic chemical vapor deposition apparatus |
05/21/2014 | CN103805966A 用于加热静电卡盘上晶片的方法、系统及cvd设备 A method for the electrostatic chuck of the wafer is heated, a system and apparatus cvd |
05/21/2014 | CN103805965A 一种板式pecvd石墨块镀膜用挂钩组件 A plate coated with graphite blocks pecvd hook assembly |
05/21/2014 | CN103805964A 能产生气幕的气体喷洒装置及其薄膜沉积装置 Nengchan angry curtain gas spray device and thin film deposition apparatus |
05/21/2014 | CN103805963A 成膜装置 Film forming apparatus |
05/21/2014 | CN103805962A 芯片位置校准工具及校准方法、化学气相沉积反应腔室 Chip position calibration tools and calibration methods, chemical vapor deposition reaction chamber |
05/21/2014 | CN103805961A 金属有机化学气相沉积系统及其传输承载腔与传输方法 Metal organic chemical vapor deposition system and its transmission bearing cavity and the transmission method |
05/21/2014 | CN103805960A 一种氧化铬薄膜的制备方法 A method for preparing a thin film of chromium oxide |
05/21/2014 | CN103805959A 图案化缝隙片框架组件 Patterning slit sheet frame assembly |
05/21/2014 | CN103805958A 化学气相沉积装置及其清洁方法 Chemical vapor deposition apparatus cleaning method and |
05/21/2014 | CN103801718A 表面包覆切削工具 Coated cutting tool |
05/21/2014 | CN102899633B 一种选择性发射极电池掩膜的制备方法 Preparation of a selective emitter electrode battery mask |
05/21/2014 | CN102677019B 一种运动磁场辅助增强化学气相沉积方法及装置 A moving magnetic field assisted enhanced chemical vapor deposition method and apparatus |
05/21/2014 | CN102560426B 自动循环等离子气相沉积系统 Automatic cycle plasma vapor deposition system |
05/21/2014 | CN102414342B 用于在气动传输期间在颗粒上进行原子或分子层沉积的设备和方法 Used during the pneumatic conveying apparatus and method of atomic or molecular layer deposition on the particulate |
05/20/2014 | US8731701 Substrate treatment method and substrate treatment system |
05/20/2014 | US8728957 Thin film formation method and film formation apparatus |
05/20/2014 | US8728954 Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium |
05/20/2014 | US8728588 Method of treating a surface of at least one part by means of individual sources of an electron cyclotron resonance plasma |
05/20/2014 | US8728585 Method for enhancing adhesion of thin film |
05/20/2014 | US8728576 Method for producing photocatalytically active titanium dioxide layers |
05/20/2014 | US8728575 Method for synthesizing a thin film |
05/20/2014 | US8728571 Fabrication method for functional surface |
05/20/2014 | US8728565 Method for inhibiting generation of copper sulfide |
05/20/2014 | US8728252 Treatment of metal components |
05/20/2014 | US8728242 Single disc vapor lubrication |
05/20/2014 | US8728240 Apparatus for vapor condensation and recovery |
05/20/2014 | US8728239 Methods and apparatus for a gas panel with constant gas flow |
05/20/2014 | US8726838 Combinatorial plasma enhanced deposition and etch techniques |
05/20/2014 | US8726837 Semiconductor process chamber vision and monitoring system |
05/20/2014 | US8726836 Liquid crystal coating apparatus and liquid crystal coating method |
05/20/2014 | US8726829 Chemical bath deposition apparatus for fabrication of semiconductor films through roll-to-roll processes |
05/16/2014 | CA2825168A1 Interlayer composite substrates |
05/15/2014 | WO2014074229A1 Method for preparing an organo-functional silane |
05/15/2014 | WO2014074209A1 Method to deposit cvd ruthenium |
05/15/2014 | WO2014073806A1 Shower head, and thin film deposition apparatus including same |
05/15/2014 | WO2014073609A1 Resin container coating device |
05/15/2014 | WO2014073438A1 Electronic device and gas barrier film fabrication method |
05/15/2014 | WO2014072221A1 Method for thermochemically treating a part while masking a portion and corresponding mask |
05/15/2014 | WO2014022872A3 Apparatus and method for the plasma coating of a substrate, in particular a press platen |
05/15/2014 | WO2013058980A3 Integrated multi-headed atomizer and vaporization system and method |
05/15/2014 | US20140134851 Ozone gas generation processing apparatus, method of forming silicon oxide film, and method for evaluating silicon single crystal wafer |
05/15/2014 | US20140134849 Combinatorial Site Isolated Plasma Assisted Deposition |
05/15/2014 | US20140134832 Polycrystalline silicon manufacturing apparatus and polycrystalline silicon manufacturing method |
05/15/2014 | US20140134352 Amorphous carbon-boron nitride nanotube hybrids |
05/15/2014 | US20140134351 Method to deposit cvd ruthenium |
05/15/2014 | US20140134332 Distribution of Gas Over A Semiconductor Water in Batch Processing |
05/15/2014 | US20140134331 Method for producing substrate with metal body |
05/15/2014 | US20140134324 Automatic lithium target regenerating apparatus and automatic lithium target regenerating method |
05/15/2014 | US20140131659 Gallium Nitride Devices With Aluminum Nitride Intermediate Layer |
05/15/2014 | US20140130742 Apparatus and method for deposition |
05/15/2014 | US20140130739 Atomic layer deposition apparatus |
05/15/2014 | DE112007001605B4 Zinkoxiddünnfilm vom p-Typ und Verfahren zur Ausbildung desselben und lichtemittierendes Element Zinc oxide thin film of the same p-type and method of forming and emitting element |
05/15/2014 | DE102013100443A1 Schutzfenstervorrichtung für eine Beschichtungsanlage Windows device for a coating system |
05/15/2014 | DE102012220571A1 Method for manufacturing sensor for detecting particles, particularly soot particles in exhaust stream of internal combustion engine, involves applying supporting layer on substrate and applying heating element on supporting layer |
05/15/2014 | DE102012022343A1 Method for monitoring film growth during surface coating of substrate used in dispersive mirror production, involves computing degree and quality of film growth from spectral phase acquired from partial beams interference measurements |
05/15/2014 | DE102012022268A1 Method for preparing piston ring for internal combustion engine e.g. petrol engine, involves partially extending interruptions introduced into hard material layer as channel between flank surfaces in circumferential direction |
05/15/2014 | DE102012016298A1 Halbleiterbauelement mit einer Passivierungsschicht aus hydriertem Aluminiumnitrid sowie Verfahren zur Oberflächenpassivierung von Halbleiterbauelementen A semiconductor device with a passivation layer of hydrogenated aluminum nitride as well as methods for surface passivation of semiconductor devices |
05/15/2014 | DE102012016027A1 Rocker joint for bush chain or roller chain, has bush which is designed as straight circular cylinder in which through-channel is arranged in bush eccentrically to longitudinal axis of bush |
05/15/2014 | DE102006054695B4 Verfahren zur Regelung nanoskaliger elektronenstrahlinduzierter Abscheidungen Method for controlling nanoscale electron-beam-induced deposition |