Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
05/2014
05/22/2014WO2014076933A1 Production method for semiconductor epitaxial wafer, semiconductor epitaxial wafer, and production method for solid-state imaging element
05/22/2014WO2014076921A1 Production method for semiconductor epitaxial wafer, semiconductor epitaxial wafer, and production method for solid-state imaging element
05/22/2014WO2014076276A1 Method for producing a layer on a surface area of an electronic component
05/22/2014WO2014075729A1 Method and system for maintaining an edge exclusion shield
05/22/2014WO2014075601A1 Tray apparatus, reaction chamber and mocvd device
05/22/2014US20140141674 Apparatus and methods for plasma enhanced chemical vapor deposition of dielectric/polymer coatings
05/22/2014US20140141255 Laminate body, gas barrier film, and method of manufacturing the same
05/22/2014US20140141253 Method of manufacturing multilayer body, method of processing substrate, and multilayer body
05/22/2014US20140141218 Laminate body, gas barrier film, method of manufacturing laminate body, and laminate body manufacturing apparatus
05/22/2014US20140141177 Manufacturing method of deposition material, manufacturing apparatus of deposition material, electron beam irradiation deposition method and deposition material for electron beam irradiation deposition
05/22/2014US20140141165 Method for manufacturing molybdenum oxide-containing thin film, starting material for forming molybdenum oxide-containing thin film, and molybdenum amide compound
05/22/2014US20140138352 Method for making a film of uniformly arranged core-shell nanoparticles on a substrate
05/22/2014US20140137802 Deposition method and apparatus
05/22/2014US20140137801 Epitaxial chamber with customizable flow injection
05/22/2014DE112012003488T5 Direkte Flüssigkeitsinjektion für Halidgasphasen-Epitaxiesysteme sowie Verfahren dafür Direct liquid injection for Halidgasphasen-Epitaxiesysteme and method therefor
05/22/2014DE112012003485T5 Depositionssysteme einschließlich eines in einer Reaktionskammer enthaltenenVorläufergasofens sowie Verfahren dafür Deposition systems, including one in a reaction chamber containing precursor gas furnace and method therefor
05/22/2014DE102013112838A1 Reaktionsbehältersystem mit geschlossenen Strömungskanälen und Verfahren zur Herstellung eines Katalysator- oder Trägermaterials Reaction vessel system with closed flow channels and process for producing a catalyst or carrier material
05/22/2014DE102012220986A1 Dosiereinheit und Verfahren zur Abscheidung einer Schicht auf einem Substrat Dosing unit and method for depositing a layer on a substrate
05/22/2014DE102012220314B4 Verfahren zur Herstellung einer transparenten Kohlenstoff-Nanoröhren-Graphen-Hybriddünnschicht, Nanoröhren-Graphen-Hybriddünnschicht und Feldeffekttransistor mit dieser A method for producing a transparent carbon nanotube-graphene hybrid thin film nanotube-graphene hybrid thin film field effect transistor and with this
05/22/2014DE102012111218A1 Material discharge head of material discharge device comprises material discharge surface comprising material discharge openings, and connecting channel for direct connection to the material discharge opening with material storage container
05/22/2014DE102012022744A1 Device for adjusting gaseous phase in reaction chamber for use in production of solar cells, has heating elements that are resistant to thermal radiation with shielding element, such that temperature of heating elements is adjusted
05/22/2014DE102012018360B4 Beschichtete Pelletiermatrizen Coated Pelletiermatrizen
05/21/2014EP2733232A1 Device for protecting external surfaces when aluminizing hollow components
05/21/2014EP2733125A1 Method for manufacturing layered-film-bearing glass substrate
05/21/2014EP2732071A2 Mixed metal oxide barrier films and atomic layer deposition method for making mixed metal oxide barrier films
05/21/2014EP2732070A1 Floating substrate monitoring and control device, and method for the same
05/21/2014EP2732069A1 Gas inlet member of a cvd reactor
05/21/2014EP2732067A1 Methods and systems for monitoring and controlling silicon rod temperature
05/21/2014EP2732065A2 Method for forming a layer on a substrate at low temperatures
05/21/2014CN203602711U 一种微波等离子体化学气相沉积装置 A microwave plasma chemical vapor deposition apparatus
05/21/2014CN203602710U 等离子体气相沉积用半自动插片机 Plasma vapor deposition using a semi-automatic machine inserts
05/21/2014CN203602709U 用于硅基多晶硅膜沉积的气体传输装置 Polycrystalline silicon for the film deposition gas delivery device
05/21/2014CN103814155A 等离子体处理室中的同步且缩短的主从式射频脉冲 Plasma processing chamber and shortened synchronous master-slave RF pulse
05/21/2014CN103814153A 薄膜形成方法、薄膜形成装置、形成有覆膜的被处理物、模具以及工具 A thin film forming method, a thin film forming apparatus has a film forming material to be processed, the mold and the tools
05/21/2014CN103814149A 用于监测和控制硅棒温度的方法和系统 For monitoring and controlling the temperature of the silicon rod in the method and system
05/21/2014CN103813875A 切削工具 Cutting Tools
05/21/2014CN103811862A 一种透明天线的制作方法 Method of making a transparent antenna
05/21/2014CN103811375A 分批处理硅片的装卸载装置和设备及方法 Batch loading and unloading apparatus and equipment and method for processing wafers
05/21/2014CN103805995A 碳/碳复合材料抗氧化用铼/铱涂层表面缺陷的修复方法 Carbon / carbon composites with antioxidant fix rhenium / iridium coating surface defects
05/21/2014CN103805968A 等离子体处理装置和等离子体产生装置 The plasma processing apparatus and a plasma generating means
05/21/2014CN103805967A 金属有机化学气相沉积装置 Metal organic chemical vapor deposition apparatus
05/21/2014CN103805966A 用于加热静电卡盘上晶片的方法、系统及cvd设备 A method for the electrostatic chuck of the wafer is heated, a system and apparatus cvd
05/21/2014CN103805965A 一种板式pecvd石墨块镀膜用挂钩组件 A plate coated with graphite blocks pecvd hook assembly
05/21/2014CN103805964A 能产生气幕的气体喷洒装置及其薄膜沉积装置 Nengchan angry curtain gas spray device and thin film deposition apparatus
05/21/2014CN103805963A 成膜装置 Film forming apparatus
05/21/2014CN103805962A 芯片位置校准工具及校准方法、化学气相沉积反应腔室 Chip position calibration tools and calibration methods, chemical vapor deposition reaction chamber
05/21/2014CN103805961A 金属有机化学气相沉积系统及其传输承载腔与传输方法 Metal organic chemical vapor deposition system and its transmission bearing cavity and the transmission method
05/21/2014CN103805960A 一种氧化铬薄膜的制备方法 A method for preparing a thin film of chromium oxide
05/21/2014CN103805959A 图案化缝隙片框架组件 Patterning slit sheet frame assembly
05/21/2014CN103805958A 化学气相沉积装置及其清洁方法 Chemical vapor deposition apparatus cleaning method and
05/21/2014CN103801718A 表面包覆切削工具 Coated cutting tool
05/21/2014CN102899633B 一种选择性发射极电池掩膜的制备方法 Preparation of a selective emitter electrode battery mask
05/21/2014CN102677019B 一种运动磁场辅助增强化学气相沉积方法及装置 A moving magnetic field assisted enhanced chemical vapor deposition method and apparatus
05/21/2014CN102560426B 自动循环等离子气相沉积系统 Automatic cycle plasma vapor deposition system
05/21/2014CN102414342B 用于在气动传输期间在颗粒上进行原子或分子层沉积的设备和方法 Used during the pneumatic conveying apparatus and method of atomic or molecular layer deposition on the particulate
05/20/2014US8731701 Substrate treatment method and substrate treatment system
05/20/2014US8728957 Thin film formation method and film formation apparatus
05/20/2014US8728954 Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
05/20/2014US8728588 Method of treating a surface of at least one part by means of individual sources of an electron cyclotron resonance plasma
05/20/2014US8728585 Method for enhancing adhesion of thin film
05/20/2014US8728576 Method for producing photocatalytically active titanium dioxide layers
05/20/2014US8728575 Method for synthesizing a thin film
05/20/2014US8728571 Fabrication method for functional surface
05/20/2014US8728565 Method for inhibiting generation of copper sulfide
05/20/2014US8728252 Treatment of metal components
05/20/2014US8728242 Single disc vapor lubrication
05/20/2014US8728240 Apparatus for vapor condensation and recovery
05/20/2014US8728239 Methods and apparatus for a gas panel with constant gas flow
05/20/2014US8726838 Combinatorial plasma enhanced deposition and etch techniques
05/20/2014US8726837 Semiconductor process chamber vision and monitoring system
05/20/2014US8726836 Liquid crystal coating apparatus and liquid crystal coating method
05/20/2014US8726829 Chemical bath deposition apparatus for fabrication of semiconductor films through roll-to-roll processes
05/16/2014CA2825168A1 Interlayer composite substrates
05/15/2014WO2014074229A1 Method for preparing an organo-functional silane
05/15/2014WO2014074209A1 Method to deposit cvd ruthenium
05/15/2014WO2014073806A1 Shower head, and thin film deposition apparatus including same
05/15/2014WO2014073609A1 Resin container coating device
05/15/2014WO2014073438A1 Electronic device and gas barrier film fabrication method
05/15/2014WO2014072221A1 Method for thermochemically treating a part while masking a portion and corresponding mask
05/15/2014WO2014022872A3 Apparatus and method for the plasma coating of a substrate, in particular a press platen
05/15/2014WO2013058980A3 Integrated multi-headed atomizer and vaporization system and method
05/15/2014US20140134851 Ozone gas generation processing apparatus, method of forming silicon oxide film, and method for evaluating silicon single crystal wafer
05/15/2014US20140134849 Combinatorial Site Isolated Plasma Assisted Deposition
05/15/2014US20140134832 Polycrystalline silicon manufacturing apparatus and polycrystalline silicon manufacturing method
05/15/2014US20140134352 Amorphous carbon-boron nitride nanotube hybrids
05/15/2014US20140134351 Method to deposit cvd ruthenium
05/15/2014US20140134332 Distribution of Gas Over A Semiconductor Water in Batch Processing
05/15/2014US20140134331 Method for producing substrate with metal body
05/15/2014US20140134324 Automatic lithium target regenerating apparatus and automatic lithium target regenerating method
05/15/2014US20140131659 Gallium Nitride Devices With Aluminum Nitride Intermediate Layer
05/15/2014US20140130742 Apparatus and method for deposition
05/15/2014US20140130739 Atomic layer deposition apparatus
05/15/2014DE112007001605B4 Zinkoxiddünnfilm vom p-Typ und Verfahren zur Ausbildung desselben und lichtemittierendes Element Zinc oxide thin film of the same p-type and method of forming and emitting element
05/15/2014DE102013100443A1 Schutzfenstervorrichtung für eine Beschichtungsanlage Windows device for a coating system
05/15/2014DE102012220571A1 Method for manufacturing sensor for detecting particles, particularly soot particles in exhaust stream of internal combustion engine, involves applying supporting layer on substrate and applying heating element on supporting layer
05/15/2014DE102012022343A1 Method for monitoring film growth during surface coating of substrate used in dispersive mirror production, involves computing degree and quality of film growth from spectral phase acquired from partial beams interference measurements
05/15/2014DE102012022268A1 Method for preparing piston ring for internal combustion engine e.g. petrol engine, involves partially extending interruptions introduced into hard material layer as channel between flank surfaces in circumferential direction
05/15/2014DE102012016298A1 Halbleiterbauelement mit einer Passivierungsschicht aus hydriertem Aluminiumnitrid sowie Verfahren zur Oberflächenpassivierung von Halbleiterbauelementen A semiconductor device with a passivation layer of hydrogenated aluminum nitride as well as methods for surface passivation of semiconductor devices
05/15/2014DE102012016027A1 Rocker joint for bush chain or roller chain, has bush which is designed as straight circular cylinder in which through-channel is arranged in bush eccentrically to longitudinal axis of bush
05/15/2014DE102006054695B4 Verfahren zur Regelung nanoskaliger elektronenstrahlinduzierter Abscheidungen Method for controlling nanoscale electron-beam-induced deposition
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