| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 01/15/2014 | CN103511587A Gear structure with replaceable tooth portion and film depositing structure applying gear structure |
| 01/15/2014 | CN103510079A Vacuum treatment system valve assembly and chemical vapor deposition system |
| 01/15/2014 | CN103510078A Portable graphite boat |
| 01/15/2014 | CN103510077A High-efficiency graphite boat |
| 01/15/2014 | CN103510076A Novel graphite boat |
| 01/15/2014 | CN103510075A 石墨舟 Graphite boat |
| 01/15/2014 | CN103510074A Preparation method of composite inorganic-organic hybrid thin film based on ALD (atomic layer deposition) technology |
| 01/15/2014 | CN103510073A Gas mixer |
| 01/15/2014 | CN103510072A Suppression of parasitic deposition in substrate processing system by suppressing precursor flow and plasma outside of substrate region |
| 01/15/2014 | CN103510071A System, method and device for equalized gas distribution of processing modules of odd number |
| 01/15/2014 | CN103510070A Point of use valve manifold for atomic layer deposition and chemical vapor deposition reactors |
| 01/15/2014 | CN103510069A Feed-through apparatus for chemical vapor deposition device |
| 01/15/2014 | CN103510068A Reduced pressure processing chamber and exhaust arrangement |
| 01/15/2014 | CN103510067A Reactor in deposition device with multi-staged purging structure |
| 01/15/2014 | CN103510066A Dual-chamber reactor for chemical vapor deposition |
| 01/15/2014 | CN103510065A Substrate feeding manipulator, substrate feeding system, and PECVD device |
| 01/15/2014 | CN103510064A Vacuum processing device and method for controlling process particle deposition path |
| 01/15/2014 | CN103509962A Method for preparing reinforced titanium-based composite material of carbon nanometer tube through vacuum hot pressing |
| 01/15/2014 | CN103508438A Method for directly growing bamboo-like carbon nanometer tube on nano-porous copper |
| 01/15/2014 | CN103506819A Surface coated cutting tool |
| 01/15/2014 | CN103506640A Cutting tool with coating and manufacturing method of cutting tool |
| 01/15/2014 | CN103506639A Surface-coated cutting tool |
| 01/15/2014 | CN102703880B Method for preparing high-accuracy optical broadband anti-reflection multilayer film by utilizing atomic layer deposition |
| 01/15/2014 | CN102534567B Device and method for controlling basal heating in chemical gaseous phase sedimentary chamber |
| 01/15/2014 | CN102286728B Substrate treating apparatus and substrate treating method |
| 01/15/2014 | CN101942640B Canister for deposition apparatus, deposition apparatus using the same and method of depositing |
| 01/15/2014 | CN101660138B Activated gas injector, film deposition apparatus, and film deposition method |
| 01/15/2014 | CN101108328B Pressure reduction vessel, pressure reduction processing apparatus and method of manufacturing a pressure reduction vessel |
| 01/14/2014 | US8630720 Implantable device using ultra-nanocrystalline diamond |
| 01/14/2014 | US8629076 High surface area silicon carbide-coated carbon aerogel |
| 01/14/2014 | US8628640 Plasma processing unit and high-frequency electric power supplying unit |
| 01/14/2014 | US8628622 Gas driven rotation apparatus and method for forming crystalline layers |
| 01/14/2014 | US8628621 Gas injector and film deposition apparatus having the same |
| 01/14/2014 | US8628620 Vapor deposition device and vapor deposition method |
| 01/14/2014 | US8628619 Plasma coating system for accommodating substrates of different shapes |
| 01/14/2014 | US8628618 Precursor vapor generation and delivery system with filters and filter monitoring system |
| 01/14/2014 | US8628617 System and method for top-down material deposition |
| 01/14/2014 | US8628616 Vapor-phase process apparatus, vapor-phase process method, and substrate |
| 01/14/2014 | US8627783 Combined wafer area pressure control and plasma confinement assembly |
| 01/09/2014 | WO2014008365A1 Deposition of n-metal films comprising aluminum alloys |
| 01/09/2014 | WO2014008293A1 Thin film tantalum coating for medical implants |
| 01/09/2014 | WO2014008138A2 SiOx BARRIER FOR PHARMACEUTICAL PACKAGE AND COATING PROCESS |
| 01/09/2014 | WO2014008006A2 Textured surfaces to enhance nano-lubrication |
| 01/09/2014 | WO2014007594A1 Source container and reactor for vapor deposition |
| 01/09/2014 | WO2014007339A1 POLYCRYSTALLINE CaF2 MEMBER, MEMBER FOR PLASMA TREATMENT DEVICE, PLASMA TREATMENT DEVICE, AND PROCESS FOR PRODUCING FOCUSING RING |
| 01/09/2014 | WO2014007066A1 Plasma processing device |
| 01/09/2014 | WO2014007028A1 Film forming method and film forming device |
| 01/09/2014 | WO2014006324A1 Charging device and installation for densifying stackable frustoconical porous preforms |
| 01/09/2014 | WO2013139663A3 Method for producing a semiconductor wafer doped differently on both sides |
| 01/09/2014 | WO2013098702A3 Mixed mode pulsing etching in plasma processing systems |
| 01/09/2014 | US20140012115 Plasma deposited adhesion promoter layers for use with analyte sensors |
| 01/09/2014 | US20140011356 Plasma System, Chuck and Method of Making a Semiconductor Device |
| 01/09/2014 | US20140011342 Methods and apparatuses for forming semiconductor films |
| 01/09/2014 | US20140011038 Coating system for a gas turbine component |
| 01/09/2014 | US20140010997 Method for controlling the structure of pyrolytic carbon |
| 01/09/2014 | US20140010957 Vapor deposition particle emitting device, vapor deposition apparatus, vapor deposition method |
| 01/09/2014 | US20140010951 Porous metal implants made from custom manufactured substrates |
| 01/09/2014 | US20140009379 Cavity liners for electromechanical systems devices |
| 01/09/2014 | US20140007813 Ion control for a plasma source |
| 01/09/2014 | US20140007811 Repairing device for repairing disconnected line |
| 01/09/2014 | US20140007413 Plasma confinement structures in plasma processing systems and methods thereof |
| 01/09/2014 | DE102013106931A1 Plasmasystem, Spannvorrichtung und Verfahren zur Herstellung einer Halbleitervorrichtung Plasma system, tensioning device and method of manufacturing a semiconductor device |
| 01/09/2014 | DE102012211490A1 Piezoresistive dotierte DLC-Sensorschichten Piezoresistive sensor doped DLC layers |
| 01/09/2014 | DE102007059662B4 Vorrichtung für Mehrkammer-CVD Apparatus for multi-chamber CVD |
| 01/09/2014 | CA2877670A1 A loader device and an installation for densifying stackable frustoconical porous preforms |
| 01/08/2014 | EP2682980A1 Vaporizer, center rod used therein, and method for vaporizing material carried by carrier gas |
| 01/08/2014 | EP2682979A1 A method of etching |
| 01/08/2014 | EP2682501A1 Plasma coating apparatus and method for plasma coating a substrate |
| 01/08/2014 | EP2682500A2 Coated extrusion die |
| 01/08/2014 | EP2681229A1 Metal complexes with n-aminoamidinate ligands |
| 01/08/2014 | CN203382818U Device for plating diamond-like film on surface of flat plate |
| 01/08/2014 | CN203382817U Organometallic chemical vapor deposition device |
| 01/08/2014 | CN103503580A Plasma processing device and plasma processing method |
| 01/08/2014 | CN103503148A Semiconductor stacked body, method for manufacturing same, and semiconductor element |
| 01/08/2014 | CN103502508A Wafer processing with carrier extension |
| 01/08/2014 | CN103502507A Method for manufacturing high quality graphene using continuous heat treatment chemical vapor deposition method |
| 01/08/2014 | CN103502333A Organic resin laminate |
| 01/08/2014 | CN103502202A Alkoxide compound and raw material for forming thin film |
| 01/08/2014 | CN103498132A Method for preparing TiO2 film by gas-phase uniform deposition on basis of hydrolysis reaction |
| 01/08/2014 | CN103498131A Double-chamber vacuum membrane production equipment |
| 01/08/2014 | CN103496211A Titanium-nitrogen-carbon-aluminum- oxygen nano ceramic coating on low carbon steel surface and preparation method thereof |
| 01/08/2014 | CN102492932B In-situ surface passivation method in ALD (atomic layer deposition) production of GaAs-based MOS (Metal Oxide Semiconductor) devices |
| 01/08/2014 | CN102373445B Method for monitoring leakage rate in chemical vapor deposition reaction cavity |
| 01/08/2014 | CN102245803B Catalyst chemical vapor deposition apparatus |
| 01/07/2014 | US8626330 Atomic layer deposition apparatus |
| 01/07/2014 | US8623765 Processed object processing apparatus, processed object processing method, pressure control method, processed object transfer method, and transfer apparatus |
| 01/07/2014 | US8623466 Method for preparing an oriented-porosity dielectric material on a substrate by means of electromagnetic and photonic treatment |
| 01/07/2014 | US8623457 Vacuum processing system |
| 01/07/2014 | US8623456 Methods for atomic layer deposition |
| 01/07/2014 | US8623455 Multiple vacuum evaporation coating device and method for controlling the same |
| 01/07/2014 | US8623173 Substrate processing apparatus having electrode member |
| 01/07/2014 | US8623172 Gas flow path structure and substrate processing apparatus |
| 01/07/2014 | US8623171 Plasma processing apparatus |
| 01/07/2014 | US8623145 Substrate processing apparatus with composite seal |
| 01/07/2014 | US8623144 Apparatus for manufacturing large-area carbon nanotube films |
| 01/07/2014 | US8623143 Vapor deposition apparatus |
| 01/07/2014 | US8623142 Coating apparatus |
| 01/07/2014 | US8623141 Piping system and control for semiconductor processing |
| 01/07/2014 | US8623139 Apparatus for producing polycrystalline silicon |
| 01/07/2014 | US8623121 Stable catalyst layers for hydrogen permeable composite membranes |