Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
04/2014
04/08/2014US8691338 Polymerized film forming method and polymerized film forming apparatus
04/08/2014US8691337 Techniques for applying mar reducing overcoats to articles having layer stacks disposed thereon
04/08/2014US8691048 Plasma stabilization method and plasma apparatus
04/08/2014US8691047 Large area plasma processing chamber with at-electrode RF matching
04/08/2014US8691017 Heat equalizer and organic film forming apparatus
04/08/2014US8691016 Deposition apparatus, and deposition method
04/08/2014US8691015 Method and system for binding halide-based contaminants
04/08/2014US8689734 Deposition of active films
04/08/2014US8689733 Plasma processor
04/08/2014CA2597253C A method of densifying thin porous substrates by chemical vapor infiltration, and a loading device for such substrates
04/03/2014WO2014052642A1 Fluorine free tungsten ald/cvd process
04/03/2014WO2014052316A1 Cobalt precursors for low temperature ald or cvd of cobalt-based thin films
04/03/2014WO2014051983A2 Treatment process, oxide-forming treatment composition, and treated component
04/03/2014WO2014051872A1 Plasma deposition on a partially formed battery through a mesh screen
04/03/2014WO2014051683A1 Metallurgically bonded stainless steel
04/03/2014WO2014051331A1 Plasma enhanced chemical vapor deposition device
04/03/2014WO2014050979A1 Method for producing semiconductor device, substrate processing device, and recording medium
04/03/2014WO2014050793A1 Semiconductor device or crystal, and method for producing semiconductor device or crystal
04/03/2014WO2014050464A1 Substrate processing apparatus, substrate processing method, and semiconductor device manufacturing method
04/03/2014WO2014047703A1 Three-piece oil ring for internal combustion engines, expanding element and annular element
04/03/2014WO2013164700A3 Method for manufacturing a tco layer
04/03/2014WO2013078065A8 Chamber sealing member
04/03/2014US20140094356 Treatment process, oxide-forming treatment composition, and treated component
04/03/2014US20140093656 Method for manufacture and coating of nanostructured components
04/03/2014US20140093654 Irradiation Assisted Nucleation of Quantum Confinements by Atomic Layer Deposition
04/03/2014US20140093645 Atomic layer deposition of quaternary chalcogenides
04/03/2014US20140090597 Plasma processing method and plasma processing apparatus
04/03/2014US20140090594 Thin film forming apparatus and computer-readable medium
04/03/2014DE102012109251A1 Vorrichtung und Verfahren zur Beschichtung von Substraten Apparatus and method for coating substrates
04/02/2014EP2712372A1 Apparatus and method for multiple symmetrical divisional gas distribution
04/02/2014CN203513793U Gas inlet pipeline and gas inlet device
04/02/2014CN203513791U Vacuum buffer chamber for vacuum coating equipment
04/02/2014CN203513284U Graphene growth device
04/02/2014CN103703163A Plasma cvd device
04/02/2014CN103700743A Light-emitting diode and preparation method of buffer layer thereof
04/02/2014CN103695906A Preparation method of super-hydrophobic aluminum or aluminum alloy surface
04/02/2014CN103695870A PECVD (plasma enhanced chemical vapor deposition) coating device
04/02/2014CN103695869A Preparation method of graphene film
04/02/2014CN103695868A Linear plasma-enhanced chemical vapor deposition system with remote magnetic-mirror field constraint
04/02/2014CN103695867A Microwave plasma chemical vapor deposition device
04/02/2014CN103695866A Method for preparing Sb-doped p-type ZnO film by simple chemical vapor deposition method
04/02/2014CN103695865A TM021 modal high-power microwave plasma diamond film deposition device
04/02/2014CN103695864A Preparation method of carbon-coated cobalt metal nano-particles
04/02/2014CN103695863A Preparation method of boron-doped diamond film/carbon film composite electrode material
04/02/2014CN103695862A New technology applicable to low-temperature tempered workpiece hard coating
04/02/2014CN102936006B Low-cost low-pollution gallium nitride nano-wire preparation generation method
04/02/2014CN102864439B Method for preparing antireflection film with potential induced degradation (PID) effect resistance
04/02/2014CN102592973B Transfer method of large area graphene
04/02/2014CN102575340B Method for manufacturing optical component, and optical component
04/02/2014CN102569481B Nano silicon window layer with gradient band gap characteristic and preparation method thereof
04/02/2014CN102517563B Method for growing non-polar m-plane zinc oxide (ZnO) on silicon substrate
04/02/2014CN102318039B Method for manufacturing gallium nitride compound semiconductor, and semiconductor light emitting element
04/02/2014CN102217044B 等离子体处理装置及等离子体处理方法 Plasma processing apparatus and plasma processing method
04/02/2014CN102201550B Unit mask, mask assembly and method for manufacturing display device
04/02/2014CN102066313B Titanium complex, method for production of the complex, titanium-containing thin film, and method for production of the thin film
04/02/2014CN101807515B Multi-zone resitive heater
04/02/2014CN101562215B Preparation method for improving efficiency of monolocular precipitation microcrystal silicon-based thin film solar cell
04/01/2014US8685855 Tray for CVD and method for forming film using same
04/01/2014US8685500 Method for depositing a thin-film polymer in a low-pressure gas phase
04/01/2014US8685494 ALD method of forming thin film comprising a metal
04/01/2014US8685490 Undercoating layers providing improved photoactive topcoat functionality
04/01/2014US8685166 Apparatus for continuous fabricating superconducting tapes
04/01/2014US8683943 Plasma process apparatus and plasma process method
03/2014
03/27/2014WO2014047544A1 Deposition of metal films based upon complementary reactions
03/27/2014WO2014046627A1 Piston ring, piston comprising such ring and piston machine comprising at least one such piston
03/27/2014WO2014046242A1 Temperature gauge, substrate treatment device, temperature control method, and method for manufacturing semiconductor device
03/27/2014WO2014045779A1 Vapor phase growth device and method for manufacturing epitaxial wafer
03/27/2014WO2014045565A1 Plasma processing device and method
03/27/2014WO2014045252A1 Method for forming an epitaxial silicon layer
03/27/2014WO2014044907A1 A method for coating pharmaceutical substrates
03/27/2014US20140087567 Substrate processing apparatus and method of manufacturing semiconductor device
03/27/2014US20140087546 Method and device for coating substrates
03/27/2014US20140087138 3-dimensional nanoplasmonic structure and method of manufacturing the same
03/27/2014US20140087093 Deposition reactor with plasma source
03/27/2014US20140087092 Plasma deposition on a partially formed battery through a mesh screen
03/27/2014US20140087091 Apparatuses and methods for atomic layer deposition
03/27/2014US20140087090 Method for manufacturing pattern structure
03/27/2014US20140087076 Enhanced deposition of noble metals
03/27/2014US20140087075 System and method for deposition of a material on a substrate
03/27/2014US20140087074 Film formation jig and film formation method using the same
03/27/2014US20140087072 Vapor deposition system and method
03/27/2014US20140084389 Method of Manufacturing Semiconductor Device, Substrate Processing Method and Apparatus, Non-Transitory Computer Readable Recording Medium, and Semiconductor Device
03/27/2014US20140083453 Method for in situ cleaning of mocvd reaction chamber
03/27/2014US20140083451 Method for in situ cleaning of mocvd reaction chamber
03/27/2014US20140083362 Process chamber for dielectric gapfill
03/27/2014US20140083361 Controlling temperature in substrate processing systems
03/27/2014DE112012001618T5 Gestapelter Halbleiterkörper, Verfahren zum Herstellen desselben und Halbleiterelement Of the same stacked semiconductor body, method for manufacturing the semiconductor element and
03/27/2014DE102013109116A1 Bauteil mit Kühlkanälen und Verfahren zur Herstellung Component with cooling channels and methods for preparing
03/27/2014DE102012216978A1 Producing detection element for detecting substances by spectroscopy, preferably Raman spectroscopy, comprises detecting microstructures on a substrate; and partially providing substrate with its microstructures with a metal coating
03/27/2014DE102012108986A1 Substrate holder for use in process chamber of semiconductor substrate treatment device, has recess having bearing surfaces which lie in common plane, and wall in region of projections in plan view of top face is straight
03/27/2014DE102009053889B4 Verfahren zur Beschichtung einer metallischen Substratoberfläche mit einer durch einen ALD-Prozess aufgebrachten Materialschicht A process for coating a metallic substrate surface with an applied by an ALD process material layer
03/27/2014DE102006048658B4 PICVD-Beschichtung für Kunststoffbehälter und Verfahren zu deren Herstellung PICVD coating for plastic containers and methods of their production
03/26/2014EP2711974A1 Method of washing semiconductor manufacturing apparatus component, apparatus for washing semiconductor manufacturing apparatus component, and vapor phase growth apparatus
03/26/2014EP2711443A1 Gas injector and injector pipe thereof
03/26/2014EP2711153A1 Method of coating a metal mold surface with a polymer coating, mold for rubber products and method of molding rubber products
03/26/2014EP2710626A2 Coated electronic devices and associated methods
03/26/2014CN203498503U MOCVD (Metal Organic Chemical Vapor Deposition) slide tray up-and-down moving structure
03/26/2014CN203498468U Liner and adaptable chemical vapor deposition reaction equipment
03/26/2014CN203498467U Device for depositing film on internal surface of long pipe by using plasma enhanced chemical vapor deposition
03/26/2014CN203498096U Silicon seed crystalline rod holder for polycrystalline silicon deposition device
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