| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 05/07/2014 | CN102330072B 化学气相沉积设备及使用其形成半导体外延薄膜的方法 And the use of chemical vapor deposition apparatus which forms a thin film method for a semiconductor epitaxial |
| 05/07/2014 | CN102326457B 等离子装置 Plasma devices |
| 05/07/2014 | CN102315336B 非晶硅太阳能电池生产中沉积光伏吸收层的工艺 Depositing an amorphous silicon solar cell production process of a photovoltaic absorber layer |
| 05/07/2014 | CN102226272B 用于多个基板的固持器和具有该固持器的腔室 Holder for a plurality of substrates having the holder of the chamber |
| 05/07/2014 | CN102154628B 用于化学气相沉积反应器的多气体分配喷射器 Multi-gas for the chemical vapor deposition reactor distribution injector |
| 05/07/2014 | CN102112655B 原子层淀积设备和装载方法 Atomic layer deposition equipment and loading method |
| 05/07/2014 | CN101962757B 在基材上形成薄膜的方法和设备 Methods and apparatus for forming a thin film on a substrate |
| 05/07/2014 | CN101932750B 真空处理装置及真空处理装置的运转方法 The vacuum processing apparatus and method of operating a vacuum processing apparatus |
| 05/07/2014 | CN101522695B 混配型有机金属化合物 Mixed-type organometallic compounds |
| 05/06/2014 | US8716509 Process for preparing ruthenium(0)-olefin complexes |
| 05/06/2014 | US8715828 Emulsion of metallized particles comprising a compound having a pendant Si-H group |
| 05/06/2014 | US8715791 Method for forming porous insulating film and semiconductor device |
| 05/06/2014 | US8715789 Chemical vapor deposition for an interior of a hollow article with high aspect ratio |
| 05/06/2014 | US8715782 Surface processing method |
| 05/06/2014 | US8715609 Augmented reactor for chemical vapor deposition of ultra-long carbon nanotubes |
| 05/06/2014 | US8715418 Semiconductor processing system; a semiconductor processing chamber; and a method for loading, unloading and exchanging semiconductor work pieces from a semiconductor processing chamber |
| 05/06/2014 | US8715417 Film forming apparatus |
| 05/01/2014 | WO2014065428A1 Epitaxial growth apparatus |
| 05/01/2014 | WO2014065269A1 Correction value computation device, correction value computation method, and computer program |
| 05/01/2014 | WO2014065044A1 Plasma cvd apparatus |
| 05/01/2014 | WO2013192560A3 Deposition of ultra-thin inorganic oxide coatings on packaging |
| 05/01/2014 | US20140120737 Sub-saturated atomic layer deposition and conformal film deposition |
| 05/01/2014 | US20140120257 Apparatus for selective gas injection and extraction |
| 05/01/2014 | US20140120256 Vapor source using solutions of precursors in terpenes |
| 05/01/2014 | US20140119977 Metal heterocyclic compounds for deposition of thin films |
| 05/01/2014 | US20140117629 Anti-Diffusion Metal Coated O-Rings |
| 05/01/2014 | US20140117551 Processing system for forming film on target object |
| 05/01/2014 | US20140116544 Device to Generate a Gas Mixture |
| 05/01/2014 | US20140116470 Method of decontamination of process chamber after in-situ chamber clean |
| 05/01/2014 | US20140116340 Epitaxial growth device |
| 05/01/2014 | US20140116339 Process gas diffuser assembly for vapor deposition system |
| 05/01/2014 | US20140116338 Coating for performance enhancement of semiconductor apparatus |
| 04/30/2014 | EP2725603A1 Plasma microwave cavity |
| 04/30/2014 | EP2725124A1 N-type conductive aluminum nitride semiconductor crystal and manufacturing method thereof |
| 04/30/2014 | DE102012219667A1 Method for applying aluminum oxide layer on semiconductor substrate for photovoltaic solar cell, involves creating plasma zone between supply point of aluminum-containing gas and suction location of gases in process chamber |
| 04/30/2014 | DE102012110287A1 Substrate treatment apparatus for coating substrate, has pressure reducing unit that is arranged in transport path for reducing pressure difference between atmosphere pressure and pressure in pressure lock chamber |
| 04/30/2014 | DE102009012878B4 Schauerkopf und Substratbearbeitungsvorrichtung Shower head and substrate processing apparatus |
| 04/30/2014 | DE102005060883B4 Verwendung von Hohlkugeln mit einer Umhüllung sowie Vorrichtung zu ihrer Herstellung The use of hollow spheres with a coating device and for their preparation |
| 04/30/2014 | CN203569186U Chemical vapor deposition device, substrate tray and rotary shaft |
| 04/30/2014 | CN203569185U Chemical vapor deposition device, substrate tray and rotary shaft |
| 04/30/2014 | CN203569184U Composite poly-p-xylene water-proof film deposition device |
| 04/30/2014 | CN203569183U Normal pressure CVD (Chemical Vapor Deposition) film continuous growth furnace |
| 04/30/2014 | CN203569182U Double-chamber vacuum film preparation equipment |
| 04/30/2014 | CN103766004A Antenna for plasma processing apparatus, and plasma processing apparatus using antenna |
| 04/30/2014 | CN103766002A Plasma-generating source comprising a belt-type magnet, and thin-film deposition system using same |
| 04/30/2014 | CN103766001A Plasma generator and CVD device |
| 04/30/2014 | CN103766000A CVD device, and CVD film production method |
| 04/30/2014 | CN103765573A Susceptor |
| 04/30/2014 | CN103765559A SiC epitaxial wafer and method for manufacturing same |
| 04/30/2014 | CN103765558A Film forming method and storage medium |
| 04/30/2014 | CN103764870A Method and device for continuously coating substrates |
| 04/30/2014 | CN103764323A Surface-coated cutting tool |
| 04/30/2014 | CN103764322A Cutting tool |
| 04/30/2014 | CN103762321A Organic device film encapsulation method and device |
| 04/30/2014 | CN103757610A Process environmental pressure scheduling method based on material supply system model |
| 04/30/2014 | CN103757609A Micro-environment pressure scheduling method based on cascade control |
| 04/30/2014 | CN103757608A Gradient impedance module for regulating temperature and power spatial distribution |
| 04/30/2014 | CN103757607A Organic device packaging method and device |
| 04/30/2014 | CN103757606A Pressure difference control system of MOCVD (Metal Organic Chemical Vapor Deposition) gas circuit |
| 04/30/2014 | CN103757605A Chemical vapor deposition equipment |
| 04/30/2014 | CN103757604A Method for preparing silver product surface protection coating |
| 04/30/2014 | CN103757603A Method for preparing zirconium diboride coating |
| 04/30/2014 | CN103757602A Method for preparing single-layer molybdenum disulfide film |
| 04/30/2014 | CN103757601A Preparation method of diamond coated high-temperature high-pressure spray nozzle |
| 04/30/2014 | CN103757600A Method for preparing silicon-doped micro-nano composite diamond film through chemical vapor deposition (CVD) |
| 04/30/2014 | CN103755747A Organometallic compounds, and methods of use thereof |
| 04/30/2014 | CN102703900B Method for depositing film, panel and display |
| 04/30/2014 | CN102703856B Auxiliary device for preparing thin film electrode |
| 04/30/2014 | CN102534552B Chemical vapor deposition device |
| 04/30/2014 | CN102482758B Substrate processing method |
| 04/30/2014 | CN102443783B Gas distribution plate assembly for large area plasma enhanced chemical vapor deposition |
| 04/30/2014 | CN102345169B Array type diamond film and method for making the same |
| 04/30/2014 | CN102296284B Coating device |
| 04/30/2014 | CN102191486B 激光加工装置 The laser processing apparatus |
| 04/30/2014 | CN102127755B Direct current glow plasma device and preparation method of diamond chip |
| 04/30/2014 | CN101826446B Film deposition apparatus and film deposition method |
| 04/29/2014 | USRE44870 Aluminum oxide coated cutting tool and method of manufacturing thereof |
| 04/29/2014 | US8711338 Apparatus for counting particles in a gas |
| 04/29/2014 | US8710253 Solution based precursors |
| 04/29/2014 | US8709582 Optical article including an antireflecting coating having antifog properties and process for making same |
| 04/29/2014 | US8709551 Smooth silicon-containing films |
| 04/29/2014 | US8709541 Method for forming a film |
| 04/29/2014 | US8709540 Light-emitting device, film-forming method and manufacturing apparatus thereof, and cleaning method of the manufacturing apparatus |
| 04/29/2014 | US8709539 Process and apparatus for producing composite material that includes carbon nanotubes |
| 04/29/2014 | US8709538 Substantially aligned boron nitride nano-element arrays and methods for their use and preparation |
| 04/29/2014 | US8709537 Methods for enhancing tantalum filament life in hot wire chemical vapor deposition processes |
| 04/29/2014 | US8709528 Wafer processing method and system using multi-zone chuck |
| 04/29/2014 | US8709218 Vacuum processing apparatus, vacuum processing method, and electronic device manufacturing method |
| 04/29/2014 | US8709202 Upper electrode backing member with particle reducing features |
| 04/29/2014 | US8709162 Active cooling substrate support |
| 04/29/2014 | US8709161 Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same |
| 04/29/2014 | US8709160 Deposition apparatus having thermal hood |
| 04/29/2014 | US8709159 Vertical heat treatment apparatus |
| 04/29/2014 | US8709158 Thermal management of film deposition processes |
| 04/29/2014 | US8707899 Plasma processing apparatus |
| 04/24/2014 | WO2014062323A1 Shadow frame support |
| 04/24/2014 | WO2014062058A1 A method of manufacturing a multilayer semiconductor element, and a semiconductor element manufactured as such. |
| 04/24/2014 | WO2014062006A1 Method and vacuum system for removing metallic by-products |
| 04/24/2014 | WO2014062002A1 Susceptor for epitaxial growing and method for epitaxial growing |
| 04/24/2014 | WO2014062000A1 Susceptor for epitaxial growing and method for epitaxial growing |