Patents for C09K 13 - Etching, surface-brightening or pickling compositions (3,392) |
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10/21/2009 | EP2109648A1 Chemical mechanical planarization composition, system, and method of use |
10/21/2009 | CN100551971C Solvent free resin applied to vacuum pressure dipping technique for electrical motor in high voltage |
10/20/2009 | US7605113 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
10/15/2009 | WO2009125099A2 Glass etching composition free from ammonium ions and from difluoride ions |
10/15/2009 | US20090256109 Conditioning agent for the etching of enamel lesions |
10/15/2009 | US20090256108 Conditioning agent for etching enamel lesions |
10/14/2009 | CN100549824C Etching composition and etching processing method |
10/13/2009 | US7601273 Polishing slurry composition and method of using the same |
10/08/2009 | US20090253268 Post-contact opening etchants for post-contact etch cleans and methods for fabricating the same |
10/08/2009 | US20090250656 Free Radical-Forming Activator Attached to Solid and Used to Enhance CMP Formulations |
10/07/2009 | CN101550341A Etching solution compound for etching pattern of ITO conductive film |
10/07/2009 | CN101550340A Etching solution for etching pattern of indium tin oxide conductive film |
10/07/2009 | CN100547045C 抛光组合物 The polishing composition |
10/06/2009 | US7597819 Aqueous solution of water and hydrofluoric acid, and at least one redox buffer dissolved in solution that maintains redox potential of etchant solution so that redox buffer is preferentially oxidized over structural material, wherein redox buffer comprises a thio-phosphorous-based compound |
10/01/2009 | US20090246967 Semiconductor surface treatment agent |
10/01/2009 | US20090246957 Polishing liquid and polishing method |
10/01/2009 | US20090246956 Metal polishing composition and chemical mechanical polishing method |
09/24/2009 | US20090239380 Polishing liquid for metal and polishing method using the same |
09/24/2009 | US20090236559 Compositions for polishing aluminum/copper and titanium in damascene structures |
09/17/2009 | US20090233827 ortho, meta or paraaminobenzenesulfonic acid; water miscible organic solvent is selected from propylene glycol methyl ether, propylene glycol propyl ether, tri(propylene glycol) monomethyl ether, 2-(2-butoxyethoxy)ethanol, tetrahydrofurfuryl alcohol, and water to remove highly crosslinked resist |
09/17/2009 | US20090233444 Polishing method with inert gas injection |
09/17/2009 | US20090230085 Composition for surface modification of a heat sink and method for surface treatment of the heat sink for printed circuit boards using the same |
09/17/2009 | US20090229758 Apparatus for generating gas plasma, gas composition for generating plasma and method for manufacturing semiconductor device using the same |
09/17/2009 | DE102005012356B4 PAA-basiertes Ätzmittel und Verfahren, bei denen dieses Ätzmittel verwendet wird PAA-based etchant and procedures that are experiencing this etchant is used |
09/16/2009 | EP2099877A1 Etching paste containing particles for silicon surfaces and layers |
09/11/2009 | WO2009111719A2 Non-selective oxide etch wet clean composition and method of use |
09/10/2009 | US20090227115 Etching solution for substrate |
09/10/2009 | US20090227075 Etchant composition, patterning conductive layer and manufacturing flat panel, display device using the same |
09/10/2009 | US20090224200 Polishing slurries for chemical-mechanical polishing |
09/03/2009 | WO2009072810A3 Etchant composition for glass substrate |
09/03/2009 | US20090221152 Etching Solution And Method For Structuring A UBM Layer System |
09/03/2009 | US20090221145 Metal polishing slurry and chemical mechanical polishing method |
09/03/2009 | US20090220698 Nanoparticles of rare earth oxides |
09/03/2009 | US20090218542 Anisotropic silicon etchant composition |
09/02/2009 | CN101519593A Wet etching solution for transparent conductive film and manufacture method thereof |
09/02/2009 | CN101519592A Anisotropic silicon etchant composition |
08/27/2009 | WO2009104976A1 A method for manufacturing the patterned glass intended especially for building the solar collectors and batteries and glasshouses |
08/27/2009 | WO2009073596A3 Formulations for cleaning memory device structures |
08/27/2009 | US20090215275 Defect Etching of Germanium |
08/27/2009 | US20090215270 Polishing liquid and polishing method |
08/27/2009 | US20090215269 Integrated chemical mechanical polishing composition and process for single platen processing |
08/27/2009 | US20090215268 Polishing process for producing damage free surfaces on semi-insulating silicon carbide wafers |
08/27/2009 | US20090215265 Low-stain polishing composition |
08/27/2009 | US20090212021 Compositions and methods for selective removal of metal or metal alloy after metal silicide formation |
08/25/2009 | US7578968 Effecting biocidal activity in aqueous well fluid by blending with the fluid a biocidally-effective amount of a sulfamate stabilized, bromine-based biocide formed from a halogen source which is bromine chloride, bromine and chlorine, a source of sulfamate anions, alkali metal base, and water |
08/20/2009 | WO2008022259A8 Solution for forming polishing slurry, polishing slurry and related methods |
08/20/2009 | US20090209104 Polishing slurry for cmp, and polishing method |
08/20/2009 | US20090206450 Method of manufacturing a semiconductor device, semiconductor device obtained herewith, and slurry suitable for use in such a method |
08/19/2009 | EP2090675A1 Defect etching of germanium |
08/19/2009 | EP2089491A1 Printable medium for etching of oxidic, transparent and conducting layers |
08/19/2009 | EP1446460A4 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
08/19/2009 | CN101511969A Method and system for dry etching a hafnium containing material |
08/19/2009 | CN101511532A Composition and method for polishing a sapphire surface |
08/19/2009 | CN100529014C Aqueous phosphoric acid compositions for cleaning semiconductor devices |
08/13/2009 | US20090203215 Metal polishing slurry and chemical mechanical polishing method |
08/13/2009 | US20090203213 Slurry composition for chemical-mechanical polishing and method of chemical-mechanical polishing with the same |
08/06/2009 | US20090194504 Method for producing abrasive composition |
08/05/2009 | CN101501162A Solution for forming polishing slurry, polishing slurry and related methods |
08/05/2009 | CN101497793A Etching agent combination for etching indium tin oxide layer and its etching method |
08/05/2009 | CN101497684A Vegetable oil based polyurethane acrylic ester, preparing process and use thereof |
07/23/2009 | US20090184092 Palladium-Selective Etching Solution and Method for Controlling Etching Selectivity |
07/22/2009 | CN100516303C Removing liquid for tungsten metal and method for removing tungsten metal using such liquid |
07/21/2009 | US7563315 Composition and method for preparing chemically-resistant roughened copper surfaces for bonding to substrates |
07/16/2009 | US20090181539 Polishing agent for semiconductor integrated circuit device, polishing method, and method for manufacturing semiconductor integrated circuit device |
07/16/2009 | US20090179172 Polishing composition |
07/15/2009 | CN101481616A Metal and metallic oxide etching printing ink, as well as preparation method and use thereof |
07/09/2009 | US20090176375 Method of Etching a High Aspect Ratio Contact |
07/09/2009 | US20090176373 Polishing agent for semiconductor integrated circuit device, polishing method, and method for manufacturing semiconductor integrated circuit device |
07/09/2009 | US20090176372 Chemical mechanical polishing slurry and semiconductor device manufacturing method |
07/09/2009 | US20090176022 Surface modification liquid for plastic and method of metallizing plastic surface therewith |
07/09/2009 | US20090173910 Polishing composition |
07/09/2009 | US20090173717 Composition and method for polishing nickel-phosphorous-coated aluminum hard disks |
07/08/2009 | CN100510000C Method to remove iron sulfide deposits from pipe lines |
06/30/2009 | US7553430 using an aqueous slurry comprising dissolved ammonium dimolybdate and ammonium octamolybdate in water and an oxidizing agent; apply aqueous slurry between the copper and a polishing pad; apply a low pressure with high polish rates on the surface of semiconductor wafer |
06/30/2009 | CA2279786C A composition and method for selectively etching a silicon nitride film |
06/24/2009 | EP1360077A4 Compositions for cleaning organic and plasma etched residues for semiconductor devices |
06/23/2009 | US7550092 Comprises an abrasive component, a corrosion inhibitor, a surfactant, a diacid compound, a metal residue inhibitor, for example, 1,2,3,4-butanetetracarboxylic acid, and water; eliminates problems of metal dishing and metal residue while maintaining desired polishing rate |
06/18/2009 | US20090156008 Polishing Composition and Polishing Method Using The Same |
06/18/2009 | US20090156006 Compositions and methods for cmp of semiconductor materials |
06/17/2009 | EP1501916B1 Non-corrosive cleaning compositions for removing etch residues |
06/11/2009 | WO2009073596A2 Formulations for cleaning memory device structures |
06/11/2009 | WO2009072810A2 Etchant composition for glass substrate |
06/11/2009 | US20090148335 Process for surface treatment of metals |
06/11/2009 | US20090146101 Etchant for metal alloy having hafnium and molybdenum |
06/10/2009 | CN100497509C 抛光组合物和抛光方法 Polishing composition and polishing method |
06/09/2009 | US7544622 Passivation for cleaning a material |
06/09/2009 | US7544307 Metal polishing liquid and polishing method using it |
06/04/2009 | WO2009040794A4 Etching compositions, methods and printing components |
06/04/2009 | US20090142293 Polyammonium/Polysiloxane Copolymers |
06/04/2009 | US20090140199 Polishing compound and polishing method |
06/04/2009 | US20090140198 Method of preparing metal oxide suspension |
05/28/2009 | US20090136772 Etching tape and method of fabricating array substrate for liquid crystal display using the same |
05/28/2009 | US20090136771 Composition for preparing a surface for coating and methods of making and using same |
05/28/2009 | US20090134122 Copper-passivating CMP compositions and methods |
05/27/2009 | EP2061916A1 Additive for chromic acid applications |
05/27/2009 | CN101443480A Recyclable etching solution |
05/26/2009 | US7537709 Method for isotropic etching of copper |
05/22/2009 | CA2705589A1 Method and composition for removing contamination from surfaces in contact with water |
05/21/2009 | US20090127501 Polishing Composition for Silicon Wafer |
05/21/2009 | US20090127500 Polishing composition |