| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 10/17/2013 | US20130273363 Freestanding Network of Carbon Nanofibers |
| 10/17/2013 | US20130273326 Processing a sacrificial material during manufacture of a microfabricated product |
| 10/17/2013 | US20130273265 Apparatus and method for supplying electric power to a cvd-reactor |
| 10/17/2013 | US20130273264 Injection molding tool with embedded induction heater |
| 10/17/2013 | US20130273263 Cvd apparatus and cvd method |
| 10/17/2013 | US20130273262 Static deposition profile modulation for linear plasma source |
| 10/17/2013 | US20130273249 Evaporation method and film deposition method |
| 10/17/2013 | US20130273246 Efficient and simple method for metalorganic chemical vapor deposition |
| 10/17/2013 | US20130273237 Method to Determine the Thickness of a Thin Film During Plasma Deposition |
| 10/17/2013 | US20130270362 Showerhead apparatus for a linear batch chemical vapor deposition system |
| 10/17/2013 | US20130269615 Vertical wafer boat |
| 10/17/2013 | US20130269614 Vapour chamber and substrate processing equipment using same |
| 10/17/2013 | US20130269612 Gas Treatment Apparatus with Surrounding Spray Curtains |
| 10/17/2013 | US20130269610 Plasma cvd apparatus |
| 10/17/2013 | US20130269608 Apparatus, method and reaction chamber |
| 10/17/2013 | US20130269607 Plasma cvd apparatus |
| 10/17/2013 | DE112010000869B4 Plasmaverarbeitungsvorrichtung und Verfahren zum Bilden monokristallinen Siliziums The plasma processing apparatus and method for forming monocrystalline silicon |
| 10/17/2013 | DE102012206081A1 Beschichtung von Behältern mit Plasmadüsen Coating containers with plasma jets |
| 10/17/2013 | DE102012103254A1 Method for transferring substrate e.g. glass pane into vacuum treatment plant, involves transporting substrate composite into transfer chamber and reducing spacing within substrate composite in transport direction of substrates |
| 10/17/2013 | DE102012103204A1 Coating a substrate, comprises arranging substrate parallel with respect to first main surface, traversing substrate by film-forming raw material, forming sequence of layers, guiding raw material flowing via inlet opening and dissipating |
| 10/17/2013 | DE102012008848A1 Verfahren und Vorrichtung zur Herstellung von Glasfaser-Preformen Method and apparatus for production of fiber preforms |
| 10/17/2013 | DE102010040839B4 Verfahren zum Herstellen eines elektronsichen Bauelements und elektronisches Bauelement A process for producing an electrophotographic Sichen component and electronic component |
| 10/17/2013 | DE102010026987B4 Herstellvorrichtung und -verfahren für Halbleiterbauelement Fabrication and method for semiconductor device |
| 10/17/2013 | DE102009015545B4 Beschichtungsanlage mit Aktivierungselement, deren Verwendung sowie Verfahren zur Abscheidung einer Beschichtung Coating installation with activation element, the use thereof and processes for the deposition of a coating |
| 10/16/2013 | EP2650931A1 Method for manufacturing solar cell |
| 10/16/2013 | EP2650913A1 Dry cleaning method |
| 10/16/2013 | EP2650399A2 High temperature atomic layer deposition of silicon oxide thin films |
| 10/16/2013 | EP2649218A1 Apparatus and method for depositing a layer onto a substrate |
| 10/16/2013 | EP2649217A2 Article and method of making and using the same |
| 10/16/2013 | EP2649216A1 Method for producing lithium-based layers by cvd |
| 10/16/2013 | EP2649005A1 Process for manufacturing electro-mechanical systems |
| 10/16/2013 | CN203238350U 基片加热炉 Substrate furnace |
| 10/16/2013 | CN203238326U Chemical vapor deposition device for hot filaments |
| 10/16/2013 | CN203238325U Pressure control device in gas reactor |
| 10/16/2013 | CN203235718U Air knife and substrate coating equipment |
| 10/16/2013 | CN1990491B Volatile metal beta-ketoiminate and metal beta-diiminate complexes |
| 10/16/2013 | CN103352223A Preparation method of carbon fiber-perfluoropolyether oil composite coating |
| 10/16/2013 | CN103352222A Preparation method of carbon-based tungsten coating for tokamak device |
| 10/16/2013 | CN103352210A Method for visually displaying distribution of CVD (Chemical Vapor Deposition) graphene surface defects on metal substrate |
| 10/16/2013 | CN103352209A Preparation method for InN/GaN/glass structure |
| 10/16/2013 | CN103352208A Preparation method for InN film low temperature sedimentation on diamond plated film by adopting ECR-PEMOCVD |
| 10/16/2013 | CN103352207A Gas distribution system |
| 10/16/2013 | CN103352206A Chemical vapor deposition flow inlet elements and methods |
| 10/16/2013 | CN103352205A Cleaning method of chemical vapor deposition chamber |
| 10/16/2013 | CN103352204A Preparation method of InN/GaN/ self-support diamond film structure by adopting ECR-PEMOCVD system |
| 10/16/2013 | CN103352203A Preparation method for InN film low temperature sedimentation on AIN buffer layer/diamond film/Si multilayer film structure substrate by adopting ECR-PEMOCVD |
| 10/16/2013 | CN103352202A Controllable preparation method of normal-pressure chemical-vapor-deposition large-area high-quality double-layer graphene film |
| 10/16/2013 | CN103352201A Cathode liner and processing chamber having same |
| 10/16/2013 | CN102534545B Method for growing patterned graphene film on surface of hydroxyapatite |
| 10/16/2013 | CN102534511B Film vapor deposition device and application method thereof |
| 10/16/2013 | CN102453887B Plasma-assisted atomic layer deposition apparatus and controlling method thereof |
| 10/16/2013 | CN102362008B Method and apparatus for coating |
| 10/16/2013 | CN102358939B Method for preparing oxide/carbon tube composite nanomaterial |
| 10/16/2013 | CN102315327B Method for producing novel single crystal silicon solar cell |
| 10/16/2013 | CN102020482B Large resistive double-vacuum gas-phase carbon deposition device |
| 10/16/2013 | CN101809190B Process for making thin film transistors by atomic layer deposition |
| 10/16/2013 | CN101743338B Vacuum treatment unit and vacuum treatment process |
| 10/16/2013 | CN101481797B Gas injection unit and thin film deposition apparatus having the same |
| 10/16/2013 | CN101119859B System and method for increasing the emissivity of a material |
| 10/16/2013 | CN101090998B Multi-gas distribution injector for chemical vapor deposition reactors |
| 10/15/2013 | US8560107 Substrate processing system |
| 10/15/2013 | US8559002 Method for the formation of SERS substrates |
| 10/15/2013 | US8557687 Method for forming microcrystalline semiconductor film and method for manufacturing thin film transistor |
| 10/15/2013 | US8557339 Method for the deposition of a Ruthenium containing film |
| 10/15/2013 | US8557328 Non-orthogonal coater geometry for improved coatings on a substrate |
| 10/15/2013 | US8557046 Deposition source |
| 10/15/2013 | US8557045 Apparatus and method for fabricating photovoltaic modules using heated pocket deposition in a vacuum |
| 10/15/2013 | US8557044 Shadow mask, method of manufacturing the same and method of forming thin film using the same |
| 10/15/2013 | US8555809 Method for constant concentration evaporation and a device using the same |
| 10/15/2013 | US8555808 Substrate processing apparatus |
| 10/10/2013 | WO2013152068A1 Adhesion promotion of vapor deposited films |
| 10/10/2013 | WO2013151812A1 Methods and apparatuses for controlling plasma in a plasma processing chamber |
| 10/10/2013 | WO2013151430A1 Method for producing a substrate with stacked deposition layers |
| 10/10/2013 | WO2013151169A1 Laminate having hard coat layer, and method for manufacturing same |
| 10/10/2013 | WO2013150927A1 Insulating film, method for manufacturing semiconductor device, and semiconductor device |
| 10/10/2013 | WO2013150920A1 Semiconductor device manufacturing method and substrate treatment system |
| 10/10/2013 | WO2013150903A1 Film forming method and storage medium |
| 10/10/2013 | WO2013150587A1 METHOD FOR MANUFACTURING MONOCRYSTALLINE SiC EPITAXIAL SUBSTRATE, AND MONOCRYSTALLINE SiC EPITAXIAL SUBSTRATE |
| 10/10/2013 | WO2013150299A1 Atomic layer deposition |
| 10/10/2013 | WO2013149849A1 Device for depositing a layer on a semiconductor wafer by means of vapour deposition |
| 10/10/2013 | WO2013149572A1 Equipment for large-scale continuous preparation of two-dimensional nanometer thin film |
| 10/10/2013 | WO2013149417A1 Liquid catalyst assisted chemical vapor deposition method for preparing graphene |
| 10/10/2013 | US20130267100 Method of manufacturing semiconductor device, substrate processing apparatus and evaporation system |
| 10/10/2013 | US20130267077 Method and system for manufacturing semiconductor device |
| 10/10/2013 | US20130267045 Shower head apparatus and method for controllign plasma or gas distribution |
| 10/10/2013 | US20130266742 Chemical vapor deposition apparatus for synthesizing diamond film and method for synthesizing diamond film using the same |
| 10/10/2013 | US20130266739 Process for forming carbon film or inorganic material film on substrate by physical vapor deposition |
| 10/10/2013 | US20130266728 Thin film depositing apparatus and thin film depositing method using the same |
| 10/10/2013 | US20130266725 Ceramic-supported metal-containing composites for rechargeable oxide-ion battery (rob) cells |
| 10/10/2013 | US20130264713 Methods of forming conductive structures and methods of forming dram cells |
| 10/10/2013 | US20130264303 Method for the plasma treatment of workpieces and workpiece comprising a gas barrier layer |
| 10/10/2013 | US20130264194 Method for manufacturing carbon film and plasma cvd method |
| 10/10/2013 | US20130264169 Holder For Boring Head Coating |
| 10/10/2013 | US20130263783 Atomic layer deposition reactor |
| 10/10/2013 | US20130263782 Flip edge shadow frame |
| 10/10/2013 | US20130263779 Susceptor For Improved Epitaxial Wafer Flatness |
| 10/10/2013 | DE202013102034U1 Steuerungseinrichtung für einen Thermoaufdampfungsverlauf Control device for a Thermoaufdampfungsverlauf |
| 10/10/2013 | DE102012205616A1 Vorrichtung zum Abscheiden einer Schicht auf einer Halbleiterscheibe mittels Gasphasenabscheidung An apparatus for depositing a layer on a semiconductor wafer by chemical vapor deposition |
| 10/10/2013 | DE102006038885B4 Verfahren zum Abscheiden einer Ge-Sb-Te-Dünnschicht A method of depositing a Ge-Sb-Te thin film |
| 10/09/2013 | EP2646597A1 Sliding element, in particular a piston ring, having a coating |