C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/2013
11/06/2013	CN103382552A Monitoring method and system for abnormity of plasma chemical vapor deposition machine
11/06/2013	CN103382551A Semiconductor film formation apparatus and process
11/06/2013	CN103382550A Method for preparing copper-doped zinc oxide nano-comb
11/06/2013	CN103382549A Production method for multilayered structural high barrier film
11/06/2013	CN102605340B P-type doped ZnxCd1-xS nanomaterial and preparation method thereof
11/06/2013	CN102459694B Coating installation and method
11/06/2013	CN102420272B Layered film coating device for passivating layer of solar battery
11/06/2013	CN102388303B Origami sensor
11/06/2013	CN102347233B Method and tray for improving thickness evenness of silicon wafer in process of backlining the silicon wafer
11/06/2013	CN102308021B Ald reactor,method for loading ald reactor, and production line
11/06/2013	CN102251225B Treatment method and coating pretreatment liquid for reducing coking of furnace tube of hydrocarbon cracking furnace
11/06/2013	CN102136407B Guide rack of substrate processing device
11/06/2013	CN102077325B Film forming method and processing system
11/06/2013	CN102047750B Manufacturing apparatus for depositing a material and an electrode for use therein
11/06/2013	CN101921999B Multiple-reaction cavity metallorganic chemical vapor deposition equipment
11/06/2013	CN101889104B Coated article
11/06/2013	CN101421433B Method and apparatus for combinatorially varying materials, unit process and process sequence
11/05/2013	US8575076 Sliding member and production process thereof
11/05/2013	US8574721 Layered thermal barrier coating with blended transition and method of application
11/05/2013	US8574676 Substrate processing method
11/05/2013	US8574675 Method and composition for depositing ruthenium with assistive metal species
11/05/2013	US8574671 Method for adjusting the coolant consumption within actively cooled components, and component
11/05/2013	US8574661 Process for producing organic electroluminescent element and organic electroluminescent display device
11/05/2013	US8574411 Reactive sputtering chamber with gas distribution tubes
11/05/2013	US8574397 Bevel edge plasma chamber with top and bottom edge electrodes
11/05/2013	US8574367 Evaporation source
11/05/2013	US8574366 Vacuum processing apparatus
11/05/2013	US8573154 Plasma film forming apparatus
11/05/2013	US8573153 Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode
11/05/2013	US8573152 Showerhead electrode
11/05/2013	US8573151 Microwave plasma processing apparatus, dielectric window for use in the microwave plasma processing apparatus, and method for manufacturing the dielectric window
11/05/2013	US8573149 Film deposition apparatus for magnetic recording medium
10/2013
10/31/2013	WO2013163343A1 Methods of fabricating dielectric films from metal amidinate precursors
10/31/2013	WO2013163220A1 Electrostatic chuck with advanced rf and temperature uniformity
10/31/2013	WO2013163132A1 Compensating concentration uncertainity
10/31/2013	WO2013163055A1 Hood for metal-oxide vapor coating glass containers
10/31/2013	WO2013162697A1 Method and apparatus for substrate support with multi-zone heating
10/31/2013	WO2013162174A1 Method for forming nano-pattern
10/31/2013	WO2013162000A1 Substrate support device and method for installing thermocouple in substrate support device
10/31/2013	WO2013161893A1 Method for manufacturing laminated gas-barrier resin base material
10/31/2013	WO2013161819A1 Plasma processing method and plasma processing apparatus
10/31/2013	WO2013161809A1 Gas barrier film, and electronic device employing same
10/31/2013	WO2013161772A1 Film-forming method and film-forming device
10/31/2013	WO2013161768A1 Film forming method, film forming device, and film forming system
10/31/2013	WO2013161704A1 Iii nitride semiconductor multilayer substrate and iii nitride semiconductor field effect transistor
10/31/2013	WO2013161450A1 Method for manufacturing silicon carbide semiconductor element
10/31/2013	WO2013161381A1 Nitride semiconductor growth apparatus, and epitaxial wafer for nitride semiconductor power device
10/31/2013	WO2013160948A1 Vacuum processing device
10/31/2013	WO2013159642A1 Spraying nozzle for chemical vapor deposition process and method for improving process uniformity
10/31/2013	WO2013159453A1 Method for preparing graphene
10/31/2013	WO2013133983A4 Substrate support with ceramic insulation
10/31/2013	WO2013115711A3 Silicon carbide crystal growth in a cvd reactor using chlorinated chemistry
10/31/2013	US20130287969 Method for depositing a transparent barrier layer system
10/31/2013	US20130287967 Method Of Making A Golf Ball With A Superhydrophobic Surface
10/31/2013	US20130287949 Thin film vapor deposition method and thin film vapor deposition apparatus
10/31/2013	US20130287948 Method for Preparing Metal-Carbon Composite of Core-Shell Structure Through Simultaneous Vaporization and Metal-Carbon Composite of Core-Shell Structure Prepared Thereby
10/31/2013	US20130287947 Inverted Evaporation Apparatus
10/31/2013	US20130286567 Apparatuses, systems and methods for protecting electronic device assemblies
10/31/2013	US20130284935 Radiological image detection apparatus and method of manufacturing the same
10/31/2013	US20130284369 Two-phase operation of plasma chamber by phase locked loop
10/31/2013	US20130284093 Substrate treating apparatus
10/31/2013	US20130284092 Faceplate having regions of differing emissivity
10/31/2013	US20130284090 Compensating concentration uncertainity
10/31/2013	US20130283936 Material test structure
10/31/2013	DE102012207172A1 Vorrichtung und verfahren zur oberflächenbehandlung eines substrats und verfahren zum herstellen eines optoelektronischen bauelements An apparatus and method for surface treatment of a substrate and methods for producing an optoelectronic component
10/31/2013	DE102012103710A1 System, useful for plasma processing planar substrate, includes modules for processing substrate and plasma source, substrate transportation system, and gas supply and extraction device separated from each other and connected with modules
10/30/2013	EP2657957A1 Vaporizer
10/30/2013	EP2657365A2 Method for removal of carbon from an organosilicate material
10/30/2013	EP2657364A1 Reactor for atomic layer deposition (ALD), use for encapsulating an OLED device by depositing a transparent layer of Al2O3
10/30/2013	EP2657363A1 Method of depositing silicon dioxide films
10/30/2013	EP2656375A2 A microwave plasma reactor for manufacturing synthetic diamond material
10/30/2013	EP2656372A1 A microwave plasma reactor for manufacturing synthetic diamond material
10/30/2013	EP2656371A1 A microwave plasma reactor for manufacturing synthetic diamond material
10/30/2013	EP2656370A2 Microwave plasma reactors and substrates for synthetic diamond manufacture
10/30/2013	EP2655689A1 Microwave power delivery system for plasma reactors
10/30/2013	EP2655688A1 Method for producing a pyrolysis compatible component for a cooking appliance and pyrolysis compatible component for a cooking appliance
10/30/2013	EP2655687A1 Retaining device for substrates and method for coating a substrate
10/30/2013	CN203256330U Combustion chamber structure
10/30/2013	CN203256329U Flange furnace door of LPCVD (Low Pressure Chemical Vapour Deposition) system
10/30/2013	CN103380486A Vaporizer
10/30/2013	CN103380139A Metal complexes with N-aminoamidinate ligands
10/30/2013	CN103374713A Substrate processing apparatus
10/30/2013	CN103374712A Chemical vapor deposition apparatus with heat shield
10/30/2013	CN103374711A Apparatus for cleaning reaction chamber
10/30/2013	CN103374710A Cleaning method and cleaning system of reaction cavity
10/30/2013	CN103374709A Chemical vapor deposition system
10/30/2013	CN103374708A High temperature atomic layer deposition of silicon oxide thin films
10/30/2013	CN103372764A Surface-coated cutting tool with flaking-poof hard coating layer
10/30/2013	CN102560437B Device and method for fast preparing large-area vertically aligned graphene
10/30/2013	CN102517551B Preparation method for three-dimensional photonic crystal
10/30/2013	CN102492938B Single-contact rotation-revolution base boat
10/30/2013	CN102418082B Method and device for preparing film coating micronano texture
10/30/2013	CN102355968B Surface-coated cutting tool
10/30/2013	CN102239275B Organic compound steam generator and apparatus for producing organic thin film
10/30/2013	CN101981677B Epitaxial substrate for smeiconductor element, semiconductor element, and process for producing epitaxial substrate for semiconductor element
10/30/2013	CN101611168B Continuous film forming apparatus
10/30/2013	CN101573468B Method of making inorganic or inorganic/organic hybrid films
10/30/2013	CN101275219B Organosilane compounds for modifying dielectrical properties of silicon oxide and silicon nitride films
10/29/2013	US8569188 One piece shim
10/29/2013	US8569166 Methods of modifying interlayer adhesion

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