C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/2013
10/29/2013	US8568828 Amorphous tin-cadmium oxide films and the production thereof
10/29/2013	US8568827 Textured coating on a component surface
10/29/2013	US8568556 Plasma processing apparatus and method for using plasma processing apparatus
10/29/2013	US8568555 Method and apparatus for reducing substrate temperature variability
10/29/2013	US8568554 Movable gas introduction structure and substrate processing apparatus having same
10/29/2013	US8568530 Use of cyclopentadienyl type hafnium and zirconium precursors in atomic layer deposition
10/29/2013	US8568497 Aggregate abrasive grains for abrading or cutting tools production
10/24/2013	WO2013158492A1 Susceptor assemblies for supporting wafers in a reactor apparatus
10/24/2013	WO2013157901A1 Precursor compound containing group 4 transition metal, preparation method thereof, precursor composition containing same, and method for depositing thin film using same
10/24/2013	WO2013157770A1 Method for manufacturing moisture permeation prevention film using inorganic film, moisture permeation prevention film using inorganic film, and electrical / electronic sealing device
10/24/2013	WO2013157590A1 Laminated film
10/24/2013	WO2013157472A1 Surface-coated cutting tool
10/24/2013	WO2013157057A1 Vapor deposition apparatus and method associated
10/24/2013	WO2013121102A3 Nozzle and nozzle head
10/24/2013	WO2012054577A3 Methods for depositing bevel protective film
10/24/2013	US20130280833 Reactor for Atomic Layer Deposition (ALD), Application to Encapsulation of an OLED Device by Deposition of a Transparent Al2O3 Film
10/24/2013	US20130280542 Method for producing a pyrolysis compatible component for a cooking appliance and pyrolysis compatible component for a cooking appliance
10/24/2013	US20130280485 Superhydrophobic and Oleophobic Functional Coatings Comprised of Grafted Crystalline Polymers Comprising Perfluoroalkyl Moieties
10/24/2013	US20130280442 Adhesion Promotion of Vapor Deposited Films
10/24/2013	US20130280427 Tube Reactor for Chemical Vapor Deposition
10/24/2013	US20130280426 Methods Of Forming Material Over A Substrate And Methods Of Forming Capacitors
10/24/2013	US20130277333 Plasma processing using rf return path variable impedance controller with two-dimensional tuning space
10/24/2013	US20130276984 Coating apparatus having a hipims power source
10/24/2013	US20130276707 Vertical furnace with circumferentially distributed gas inlet system
10/24/2013	US20130276706 Deposition apparatus
10/24/2013	US20130276705 Substrate processing apparatus
10/24/2013	US20130276704 Wafter carrier for chemical vapor deposition systems
10/24/2013	US20130276703 Gas Treatment Apparatus with Surrounding Spray Curtains
10/24/2013	US20130276702 Gas reclamation and abatement system for high volume epitaxial silicon deposition system
10/24/2013	US20130276700 Apparatus for producing polycrystalline silicon
10/24/2013	DE112011103781T5 Verfahren zum Beschichten mikromechanischer Komponenten mit einer dualen Diamantbeschichtung A method for coating micromechanical components with a dual diamond coating
10/24/2013	DE102011015097B4 Kühleinheit mit hydrophiler Verbindungsschicht Cooling unit with a hydrophilic compound layer
10/23/2013	EP2654071A1 Capacitively coupled plasma reactor for thin film deposition
10/23/2013	EP2654070A1 Capacitively coupled plasma reactor for thin film deposition
10/23/2013	EP2653586A1 Plasma cvd apparatus
10/23/2013	EP2652369A1 Low-friction sliding ring having an economical diamond coating
10/23/2013	EP2652169A1 Method for the plasma treatment of workpieces and workpiece comprising a gas barrier layer
10/23/2013	EP2652168A1 Pressure based liquid feed system for suspension plasma spray coatings
10/23/2013	CN203247305U Chemical vapor deposition equipment for deformation-resistant hot filaments
10/23/2013	CN203247304U Workpiece rest limiting mechanism for cylindrical film coating chamber
10/23/2013	CN1924085B Suspending mechanism for making course processing chamber spray head
10/23/2013	CN103370454A Epitaxial silicon carbide single-crystal substrate and process for producing same
10/23/2013	CN103370442A Gas lock, and coating apparatus comprising a gas lock
10/23/2013	CN103370441A Method for producing a photocatalytic material
10/23/2013	CN103370440A Colloidal infrared reflective and transparent conductive aluminum-doped zinc oxide nanocrystals
10/23/2013	CN103370439A Substrate conveying roller, thin film manufacturing device, and thin film manufacturing method
10/23/2013	CN103365004A Transparent conducting layer, CF (Carrier-free) base plate with transparent conducting layer, and preparation method thereof
10/23/2013	CN103361636A Plasma vapor deposition material two-sided locally-growing device and method
10/23/2013	CN103361635A Chemical vapor deposition apparatus having susceptor and semiconductor manufacture device
10/23/2013	CN103361634A Gas inlet device
10/23/2013	CN103361633A Gas inlet device, reaction cavity and plasma processing equipment
10/23/2013	CN103361632A Method of manufacturing semiconductor device, substrate processing method, substrate processing apparatus, evaporation system, and atomizing filter
10/23/2013	CN103361631A Preparation method of zinc oxide doped titanium oxide film for photocatalysis
10/23/2013	CN103361630A Group 2 imidazolate formulations for direct liquid injection
10/23/2013	CN103361629A Preparation method for depositing InN film on GaN buffer layer/diamond film/Si multilayer film structure substrate at low temperature by ECR-PEMOCVD (electron cyclotron resonance-plasma-enhanced metal-organic chemical vapor deposition)
10/23/2013	CN103361628A Solar cell substrate selenization and sulfurization reactor
10/23/2013	CN103361627A Copper-indium-gallium-selenium solar cell substrate selenization and sulfurization reactor
10/23/2013	CN103361626A Preparation method of low-permeability pyrolytic carbon coating and chemical vapor deposition furnace
10/23/2013	CN103361625A Carbon nanofiber membrane photo-thermal converting material and preparation method thereof
10/23/2013	CN103361624A Metallo-organic compound chemical vapor deposition method and device
10/23/2013	CN103361622A Positioning device for reel-to-reel coating equipment
10/23/2013	CN103358326A Glove box and thin film deposition equipment with same
10/23/2013	CN102586754B Method for preparing pyrolytic boron nitride crucible easy to demould
10/23/2013	CN102560425B Chemical vapor deposition furnace
10/23/2013	CN102534573B Plasma enhanced chemical vapor deposition vacuum equipment
10/23/2013	CN102534550B Deposition method for silicon dioxide thin film of grid sidewall
10/23/2013	CN102479672B Method for forming silicon oxynitride layer
10/23/2013	CN102312214B Atomic layer deposition using metal amidinates
10/23/2013	CN102244143B Preparation method of crystalline silicon solar cell
10/23/2013	CN102239277B Method and apparatus for chemical vapor deposition
10/23/2013	CN101872739B Groove filling method
10/23/2013	CN101736320B Film deposition apparatus and cleaning method for same
10/23/2013	CN101684549B Method for manufacturing nitride semiconductor device
10/23/2013	CN101589172B High strip rate downstream chamber
10/22/2013	US8563239 Solid support having electrostatic layer and use thereof
10/22/2013	US8563096 Vertical film formation apparatus and method for using same
10/22/2013	US8563095 Silicon nitride passivation layer for covering high aspect ratio features
10/22/2013	US8563090 Boron film interface engineering
10/22/2013	US8563085 Precursor composition, methods of forming a layer, methods of forming a gate structure and methods of forming a capacitor
10/22/2013	US8562785 Gas distribution showerhead for inductively coupled plasma etch reactor
10/22/2013	US8562746 Sectional wafer carrier
10/22/2013	US8562745 Stable wafer-carrier system
10/22/2013	US8562744 Coating device
10/22/2013	US8562743 Method and apparatus for atomic layer deposition
10/22/2013	US8562742 Apparatus for radial delivery of gas to a chamber and methods of use thereof
10/22/2013	US8562741 Evaporation source for evaporating an organic electroluminescent layer
10/22/2013	US8562275 Transfer device and semiconductor processing system
10/22/2013	US8561572 Gas supply system, substrate processing apparatus and gas supply method
10/17/2013	WO2013155073A1 Susceptor for improved epitaxial wafer flatness and methods for fabricating a semiconductor wafer processing device
10/17/2013	WO2013154930A1 Ceramic lining for a firearm barrel
10/17/2013	WO2013154811A1 Method to determine the thickness of a thin film during plasma deposition
10/17/2013	WO2013154796A1 Static deposition profile modulation for linear plasma source
10/17/2013	WO2013154504A2 Apparatus for the growing diamonds by microwave plasma chemical vapour deposition process and substrate stage used therein
10/17/2013	WO2013153695A1 Method for producing photoelectric conversion device and photoelectric conversion device
10/17/2013	WO2013153336A1 Method for the treatment of silicon carbide fibres
10/17/2013	WO2013153031A1 METHOD FOR FORMING TiSin THIN LAYER BY USING ATOMIC LAYER DEPOSITION
10/17/2013	WO2013152872A1 Coating containers using plasma nozzles
10/17/2013	WO2013152805A1 Method and system for production and additive manufacturing of metals and alloys
10/17/2013	US20130273395 Two-dimensional nanostructured tungsten carbide and method for fabricating the same
10/17/2013	US20130273382 Coated cutting tools having a platinum group metal concentration gradient and related processes

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