Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/2013
10/01/2013US8545669 Sensor array for measuring plasma characteristics in plasma processing environments
10/01/2013US8545632 Coating holder and coating device having same
10/01/2013US8545631 Mask device, method of fabricating the same, and method of fabricating organic light emitting display device using the same
10/01/2013US8545630 Coating apparatus
10/01/2013US8545628 Temperature-controlled purge gate valve for chemical vapor deposition chamber
10/01/2013US8544411 Batch-type remote plasma processing apparatus
09/2013
09/26/2013WO2013142344A1 Methods and apparatus for atmospheric pressure atomic layer deposition
09/26/2013WO2013142173A1 Methods and apparatus for correcting for non-uniformity in a plasma processing system
09/26/2013WO2013142082A1 Vapor deposition system and method
09/26/2013WO2013142030A1 Keyed wafer carrier
09/26/2013WO2013141371A1 Substrate processing device and substrate processing method
09/26/2013WO2013141370A1 Method for manufacturing semiconductor device, method for processing substrate, substrate processing device and recording medium
09/26/2013WO2013141159A1 Substrate processing device, method for manufacturing semiconductor device, and method for processing substrate
09/26/2013WO2013141099A1 Self-supporting gallium nitride crystal substrate and method for manufacturing same
09/26/2013WO2013141084A1 Trap device and film formation device
09/26/2013WO2013141070A1 Air filter for cvd apparatus, and cvd apparatus having same
09/26/2013WO2013140986A1 Colored rigid decorative member
09/26/2013WO2013140926A1 Method for dry-cleaning metal film in film-formation apparatus
09/26/2013WO2013140868A1 Polylactic acid molding provided with deposited film and method for producing same
09/26/2013WO2013140021A1 Atomic layer deposition method and apparatuses
09/26/2013WO2013139288A1 Apparatus and method for controlling heating of base within chemical vapour deposition chamber
09/26/2013US20130252404 Keyed wafer carrier
09/26/2013US20130252016 Metamaterial thin films
09/26/2013US20130251998 Graphene-Coated Steel Sheet, and Method for Manufacturing Same
09/26/2013US20130251918 Strontium and barium precursors for use in chemical vapor deposition, atomic layer deposition and rapid vapor deposition
09/26/2013US20130251917 Device for Plasma Coating Product Containers, Such as Bottles
09/26/2013US20130251916 Suction valve in a plasma coating apparatus
09/26/2013US20130251914 Sample preparation method
09/26/2013US20130251907 Vapor deposition shadow mask system for backplane and display screen with any size and method thereof
09/26/2013US20130251904 Film deposition method and computer readable storage medium
09/26/2013US20130251903 Diazadiene-based metal compound, method for preparing same and method for forming a thin film using same
09/26/2013US20130251902 Thin Film Depositing Apparatus and Thin Film Depositing Method Used by the Same
09/26/2013US20130251889 Apparatuses, systems and methods for applying protective coatings to electronic device assemblies
09/26/2013US20130251769 Self-lubricating surfaces for food packaging and food processing equipment
09/26/2013US20130250017 Recording medium surface property modifying apparatus, recording medium, and inkjet printer system
09/26/2013US20130248769 Metal passivation of heat-exchanger exposed to synthesis gas
09/26/2013US20130248611 Epitaxial Deposition Apparatus, Gas Injectors, and Chemical Vapor Management System Associated Therewith
09/26/2013US20130247826 Apparatus for variable substrate temperature control
09/26/2013US20130247824 Method and system for modifying photoresist using electromagnetic radiation and ion implantion
09/26/2013US20130247822 Deposition apparatus
09/26/2013US20130247651 Valve-cell vacuum deposition apparatus including a leak detection device and method for detecting a leak in a vacuum deposition apparatus
09/26/2013DE112011104309T5 Vorrichtung zum Bilden einer organischen Dünnschicht An apparatus for forming an organic thin film
09/26/2013DE112011103491T5 Suszeptor und Verfahren zum Herstellen eines Epitaxialwafers Susceptor and method for manufacturing an epitaxial wafer
09/26/2013DE112010002747T5 Siliziumepitaxialwafer und Verfahren zur Herstellung desselben Siliziumepitaxialwafer and method of manufacturing the same
09/26/2013DE102012204690A1 Vorrichtung zum Plasmabeschichten von Füllgutbehältern, wie Flaschen An apparatus for plasma coating Füllgutbehältern, such as bottles
09/26/2013DE102012204689A1 Absaugventil in Plasmabeschichtungsvorrichtung Purge in plasma coater
09/26/2013DE102012102465A1 Telescopic arm for transporting bi-directional translational substrate within vacuum treatment equipment for aircraft engine, has clutches provided inside main tube to move telescopic pipes parallel to thrust units relative to tube
09/25/2013EP2642001A1 Method for producing epitaxial silicon carbide single crystal substrate
09/25/2013EP2641996A1 Method for growing magnesium-zinc-oxide-based crystal
09/25/2013EP2641995A1 Purge valve in a plasma deposition apparatus
09/25/2013EP2641994A1 Device for the plasma coating of bulk material containers, such as bottles
09/25/2013EP2640867A1 Surface treatment of metal objects
09/25/2013EP2640866A1 Method for connecting substrates, and composite structure obtainable thereby
09/25/2013CN203212644U Linear air distribution mechanism
09/25/2013CN203212636U Auxiliary mounting mechanism for optical coating machine workpiece clamp
09/25/2013CN203212635U Adjustable rotating bracket for optical coating machine workpiece tray
09/25/2013CN203212627U Manual door catch mechanism for small vacuum coating chamber
09/25/2013CN103325663A Preparation method of composite nanofiltration heterostructure capable of generating quantum dots on side wall of nanowire
09/25/2013CN103320773A Device for plasma coating product containers, such as bottles
09/25/2013CN103320772A Metal inner surface modification device and method
09/25/2013CN103320771A Shower head and vapor deposition equipment
09/25/2013CN103320770A Gas spraying head and vapor phase deposition reaction cavity
09/25/2013CN103320769A Reaction cavity
09/25/2013CN103320768A Chemical vapor deposition apparatus
09/25/2013CN103320767A Purge valve in plasma deposition apparatus
09/25/2013CN103320766A Method for depositing diamond like carbon film on surface of hard alloy cutting tool, and hard alloy cutting tool
09/25/2013CN103320765A Improvement of vacuum equipment
09/25/2013CN103320764A Method for preparing InN semiconductor device based on a-side GaN buffer layer on a-side 6H-SiC substrate
09/25/2013CN103320763A Metal chloride gas generator, hydride vapor phase epitaxy growth apparatus, and method for fabricating a nitride semiconductor template
09/25/2013CN103320762A Film-forming apparatus for the formation of silicon carbide and film-forming method for the formation of silicon carbide
09/25/2013CN102583331B Preparation method for large-area graphene based on Ni film auxiliary annealing and Cl2 reaction
09/25/2013CN102132380B Polysilicon deposition apparatus
09/25/2013CN101871099B Plasma uniformity control by gas diffuser curvature
09/25/2013CN101855707B Plasma processing apparatus
09/25/2013CN101660140B Film deposition apparatus and method, substrate processing apparatus
09/25/2013CN101621001B Mechanical enhancement of dense and porous organosilicate materials by uv exposure
09/25/2013CN101512041B High-throughput deposition system for oxide thin film growth by reactive coevaportation
09/24/2013US8542474 Electrostatic chuck
09/24/2013US8541292 Group III nitride semiconductor epitaxial substrate and method for manufacturing the same
09/24/2013US8541068 Process for producing an amorphous carbon film
09/24/2013US8541055 Reflective coatings for glass articles, methods of deposition, and articles made thereby
09/24/2013US8541054 Vapor depositing metallorganic layer of iron or molybdenum phthalocyanine on unmasked substrate portion; removing deposition mask of silicon dioxide or alumina; oxidation to form growth catalyst; exposing to carbon precursor of methane, ethane, propane, ethylene, propylene or carbon dioxide; pyrolysis
09/24/2013US8540844 Plasma confinement structures in plasma processing systems
09/24/2013US8540843 Plasma chamber top piece assembly
09/24/2013US8540819 Ceramic heater
09/24/2013US8540818 Polycrystalline silicon reactor
09/24/2013US8539908 Film forming apparatus, film forming method and storage medium
09/19/2013WO2013138733A1 Nanoporous to solid tailoring of materials via polymer cvd into nanostructured scaffolds
09/19/2013WO2013138216A1 Apparatus and process for atomic layer deposition with horizontal laser
09/19/2013WO2013138069A1 Methods for depositing a tin-containing layer on a substrate
09/19/2013WO2013138049A1 Plasma reactor with conductive member in reaction chamber for shielding substrate from undesirable irradiation
09/19/2013WO2013137602A1 Food container having si-dlc layer and manufacturing method thereof
09/19/2013WO2013137116A1 Organic electronic device, organic electronic device manufacturing method and plasma processing device
09/19/2013WO2013137115A1 Film forming process and film forming apparatus
09/19/2013WO2013136656A1 Film forming device
09/19/2013WO2013136576A1 Film forming device
09/19/2013WO2013136384A1 Fastening member and vacuum device
09/19/2013WO2013136052A2 Chemical vapor deposition process for depositing zinc oxide coatings, method for forming a conductive glass article and the coated glass articles produced thereby
09/19/2013WO2013134796A1 Coated body and method for coating a body
09/19/2013WO2013110491A3 Component for a household appliance
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