Patents for C30B 25 - Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth (13,302)
10/1988
10/25/1988US4780174 Insertion of padwafer into recess to allow uniform heating
10/20/1988EP0276257A4 Method of epitaxially growing compound semiconductor materials.
10/18/1988US4778580 Lattice disorder formation by cathode sputtering in inert gas plasma
10/18/1988US4778202 Tubular component made out of quartz glass with a flange
10/12/1988EP0286310A1 Fluidized bed diamond particle growth
10/12/1988EP0286306A1 Method and apparatus for vapor deposition of diamond
10/12/1988EP0286274A1 Reagent source for molecular beam epitaxy
10/12/1988EP0286158A1 Gas system for precision injection of low vapour pressure materials into low pressure or vacuum systems
10/12/1988EP0285840A2 Epitaxy installation
10/12/1988EP0285834A1 Allyltellurides and their use in the MOCVD growth of group II-VI epitaxial films
10/11/1988US4777090 Abrasion resistant protective coating of carbon and-or silicon dioxide
10/11/1988US4777022 Envelope supporting heater core and semiconductor; buffer for uniform heat distribution
10/06/1988WO1988007599A1 Composite diamond particles
10/06/1988WO1988007096A3 Epitaxial installation
10/06/1988DE3709657A1 MOVPE process
10/05/1988EP0285358A2 Process for producing compound semiconductor and semiconductor device using compound semiconductor obtained by same
10/04/1988CA1242623A1 Vapor phase epitaxial growth method by organometallic chemical vapor deposition
09/1988
09/28/1988EP0284516A1 Method of growing group III-V compound semiconductor epitaxial layer
09/28/1988EP0284441A2 II-VI Group compound crystal article and process for producing the same
09/28/1988EP0284437A2 III - V Group compound crystal article and process for producing the same
09/28/1988EP0284435A2 Process for selective formation of II-VI group compound film
09/28/1988EP0284433A2 Crystal articles and method for forming the same
09/28/1988EP0284190A2 Enhanced CVD method for deposition of carbon
09/28/1988EP0283874A1 Device for the production of a gas mixture by means of the saturation process
09/27/1988US4774195 Process for the manufacture of semiconductor layers on semiconductor bodies or for the diffusion of impurities from compounds into semiconductor bodies utilizing an additional generation of activated hydrogen
09/27/1988US4773355 Growth of epitaxial films by chemical vapor deposition
09/22/1988WO1988007096A2 Epitaxial installation
09/22/1988DE3708171A1 Gems and method of producing them
09/21/1988EP0283007A2 Chemical vapour deposition apparatus having a perforated head
09/20/1988US4772356 Gas treatment apparatus and method
09/20/1988US4772296 Method of purifying and depositing group IIIa and group Va compounds to produce epitaxial films
09/14/1988EP0282054A1 Thin film single crystal diamond substrate
09/13/1988US4771446 Method of measuring the deviation
09/07/1988CN88101061A Microwave enhanced cvd method for depositing carbon
08/1988
08/31/1988EP0280630A1 Process for the preparation of silicon carbide whiskers
08/30/1988US4767666 Wafer base for silicon carbide semiconductor device
08/30/1988US4767608 Gas discharges, hydrogen, hydrocarbons, inert gases, decomposition, carbon sources, adiabatic expansion
08/30/1988US4767494 Reacting organometallic compound and hydride over heated substrate to decompose
08/09/1988US4762576 Reusable ampules, mercury, cadmium, tellurium
08/03/1988EP0276959A2 Process for producing crystal article
08/03/1988EP0276257A1 Method of epitaxially growing compound semiconductor materials
08/02/1988US4761269 Apparatus for depositing material on a substrate
07/1988
07/27/1988EP0276069A2 Vapor phase epitaxial growth of iron-doped, indium-based, compound group III-V semiconductors
07/27/1988EP0191023B1 Tubular quartz-glass element with a flange
07/26/1988US4760036 Epitaxial growing laterally monocrystalline silicon over oxide layer, etching silicon, selectively oxidizing silicon substrate, regrowing silicon laterally
07/21/1988DE3743132A1 Verfahren zur herstellung von halbleitermaterial der gruppen ii und vi des periodischen systems durch chemische dampfablagerung metallorganischer verbindungen Process for the preparation of semiconductor material of the groups II and VI of the periodic table by chemical vapor deposition of organometallic compounds
07/19/1988US4758399 Substrate for manufacturing single crystal thin films
07/12/1988US4756895 Heating porous silicon carbide precursor in the presence of a crystal growth control additive
07/12/1988US4756796 Method of producing wafer
07/12/1988US4756792 Method for vapor-phase epitaxial growth of a single crystalline-, gallium arsenide thin film
07/12/1988US4756791 Chemical vapor deposition process for producing metal carbide or nitride whiskers
07/12/1988US4756272 Multiple gas injection apparatus for LPCVD equipment
07/06/1988EP0273470A2 Method for decontamination of a chamber used in vacuum processes for deposition, etching and/or growth of high purity films, particularly applicable to semiconductor technology
06/1988
06/30/1988WO1988004830A1 Semi-insulating group iii-v based compositions
06/29/1988EP0272773A2 Process for production silicon carbide whiskers
06/29/1988EP0272418A2 Apparatus and process to condensate diamond
06/28/1988CA1238557A1 Process for the production of a compound crystal
06/22/1988EP0272140A2 TEOS based plasma enhanced chemical vapor deposition process for deposition of silicon dioxide films.
06/16/1988WO1988004333A1 Production of silicon carbide
06/15/1988EP0270991A2 Apparatus for forming thin film
06/14/1988US4751555 Indium phosphide and indium gallium phosphide with controlled gallium concentration
06/01/1988EP0269439A2 A heteroepitaxial growth method
06/01/1988DE3739450A1 Verfahren zum ausbilden einer dotierten verbindungshalbleitereinkristallschicht A method of forming a doped compound semiconductor single crystal layer
05/1988
05/31/1988US4748135 Method of manufacturing a semiconductor device by vapor phase deposition using multiple inlet flow control
05/25/1988EP0138963B1 Diethylberyllium dopant source for mocvd grown epitaxial semiconductor layers
05/18/1988EP0267679A1 Coated article and method of manufacturing the article
05/11/1988CN87107161A Composition film forming device
05/10/1988US4743310 Mercury-cadmium-tellurium layer, infrared detectors
05/10/1988CA1236554A1 Growth of semiconductors
05/04/1988EP0266178A2 Method and apparatus for forming a thin film
04/1988
04/26/1988US4740263 Vapor deposition, electron bombardment
04/21/1988WO1988002792A1 Process for depositing layers of diamond
04/13/1988EP0263141A1 Method for depositing materials containing tellurium.
04/12/1988US4736705 Gas injection via slotted hollow rods surrounded by stacked channeled plates
04/05/1988USH459 Synthesis of cadmium sulfide using the spontaneous reaction of dialkylcadmium and hydrogen sulfide
04/05/1988US4735396 Replica pattern of monocrystalline cleavage plane; solar cells
04/05/1988US4734999 Cylinder for metal organic chemical vapor deposition
03/1988
03/29/1988US4734387 Growth of semiconductors on a shaped semiconductor substrate
03/23/1988EP0260534A1 Metallorganic compounds
03/22/1988US4732110 Inverted positive vertical flow chemical vapor deposition reactor chamber
03/16/1988EP0259777A2 Method for growing single crystal thin films of element semiconductor
03/16/1988EP0259759A2 Method for low temperature, low pressure chemical vapor deposition of epitaxial silicon layers
03/15/1988US4731255 Gas-phase growth process and an apparatus for the same
03/09/1988EP0258752A2 Article having surface layer of uniformly oriented, crystalline, organic microstructures
03/08/1988US4729968 Vapor deposition decomposition of phosphine
03/02/1988EP0258052A2 Chemical vapor deposition reactor and method of chemical vapor deposition
03/02/1988EP0049286B1 Methods of producing sheets of crystalline material and devices amde therefrom
03/01/1988US4728389 Particulate-free epitaxial process
02/1988
02/25/1988WO1988001204A1 Laser assisted fiber growth
02/23/1988US4727047 Separable from a reusable substrate
02/11/1988DE3626660A1 Process for producing pure semiconductor-material layers on semiconductor wafers by deposition from the gas phase
02/03/1988EP0111510B1 Low temperature process for depositing epitaxial layers
02/02/1988US4722911 Vapor phase epitaxy using complex premixing system
01/1988
01/28/1988WO1988000625A1 Method of epitaxially growing compound semiconductor materials
01/27/1988EP0254560A1 Gaseous phase synthesized diamond and method for synthesizing same
01/27/1988EP0254312A1 Method and apparatus for synthesizing diamond
01/27/1988CN86104675A Apparatus and method for multiple and continuous growing of chloride and hydrogenate systems with sources
01/21/1988EP0114876A4 Ultra-pure epitaxial silicon and process for its manufacture.
01/20/1988EP0253611A2 Method of epitaxially growing gallium arsenide on silicon
01/13/1988EP0252757A2 Photoelectric conversion device