| Patents for C09K 13 - Etching, surface-brightening or pickling compositions (3,392) |
|---|
| 02/21/2008 | US20080041824 Microetching composition and method of using the same |
| 02/21/2008 | US20080041823 Wet etching solution |
| 02/21/2008 | US20080041813 Methods and compositions for wet etching |
| 02/19/2008 | US7332436 Process of removing residue from a precision surface using liquid or supercritical carbon dioxide composition |
| 02/19/2008 | US7332104 Slurry for CMP, polishing method and method of manufacturing semiconductor device |
| 02/14/2008 | US20080038994 Method to passivate conductive surfaces during semiconductor processing |
| 02/14/2008 | US20080035882 Composition for polishing a substrate |
| 02/13/2008 | EP1885819A2 Pretreatment compositions |
| 02/13/2008 | CN100368598C Copper or copper alloy surface tiny-etching treatment fluid for smoothing |
| 02/07/2008 | US20080032606 Method for controlling the dishing problem associated with chemical-mechanical planarization (cmp) during manufacture of copper multilayer interconnection structures in ultra large-scale integrated circuits (ulsi) |
| 02/07/2008 | US20080032214 Photoresist trimming process |
| 01/31/2008 | WO2008012984A1 Process for metallization of plastic surfaces |
| 01/31/2008 | US20080023667 Fluoride tile etchants having improved safety |
| 01/24/2008 | US20080020577 Gallium and chromium ions for oxide rate enhancement |
| 01/23/2008 | EP1320875A4 Gas compositions for cleaning the interiors of reactors as well as for etching films of silicon-containing compounds |
| 01/23/2008 | CN101110376A Method for forming soldering projection and its etchant |
| 01/17/2008 | WO2007047454A3 Process and composition for electrochemical mechanical polishing |
| 01/17/2008 | WO2007040752A3 Process and system for etching doped silicon using sf6-based chemistry |
| 01/17/2008 | US20080011982 A Method And Composition For Selectively Stripping Nickel From A Substrate |
| 01/17/2008 | US20080011981 Etchant and replenishment solution therefor, and etching method and method for producing wiring board using the same |
| 01/17/2008 | US20080011980 Polishing inhibiting layer forming additive, slurry and cmp method |
| 01/17/2008 | US20080011714 Photoresist stripping solution and a method of stripping photoresists using the same |
| 01/15/2008 | US7319174 Dry-etching gas for semiconductor process and preparation method thereof |
| 01/09/2008 | CN101103089A Polishing slurries and methods for chemical mechanical polishing |
| 01/08/2008 | US7316977 Chemical-mechanical planarization composition having ketooxime compounds and associated method for use |
| 01/08/2008 | US7316603 Compositions and methods for tantalum CMP |
| 01/08/2008 | CA2364745C Etching method for znse polycrystalline substrate |
| 01/03/2008 | US20080003925 Cmp Polishing Slurry and Method of Polishing Substrate |
| 01/03/2008 | US20080003829 Chemical mechanical polishing slurry |
| 01/02/2008 | CN101098989A Copper etchant and method of etching |
| 01/02/2008 | CN101096596A Silicon chip etching solution |
| 01/01/2008 | US7314823 Chemical mechanical polishing composition and process |
| 12/27/2007 | US20070298618 Forming a gate stack on a semiconductor substrate, forming a conformal silicon oxide layer on the semiconductor substrate using a low temperature cyclic method involving exposing the semiconductor substrate to a silicon containing precursor to form a seed layer ; forming a spacer layer; memory cells |
| 12/27/2007 | US20070298611 Selective barrier slurry for chemical mechanical polishing |
| 12/27/2007 | US20070295934 Polishing slurry and polishing method |
| 12/26/2007 | EP1868953A2 Composition and method for polishing a sapphire surface |
| 12/26/2007 | EP1868769A2 Slurry composition and method for polishing organic polymer-based ophthalmic substrates |
| 12/26/2007 | CN101092504A Solvent free resin applied to technique of vacuum pressure for dipping electrical motor in high voltage |
| 12/25/2007 | US7311857 Etching composition, method of preparing the same, method of etching an oxide film, and method of manufacturing a semiconductor device |
| 12/25/2007 | US7311856 Chemical-mechanical polishing of a polishing pad,and/or abrasive; surfactant with an azole group of 1,2,3-triazole, 1,2,4-triazole, pyrazole, imidazole, indazole, tetrazole, benzimidazole, and/or benzotriazole having a polymer chain attached; not polyvinylimidazole; and liquid carrier |
| 12/25/2007 | US7311855 Cerium oxide, acetylene compound, and water; flattening dielectrics; semiconductors |
| 12/21/2007 | WO2007111679A3 Method of selectively depositing a thin film material at a semiconductor interface |
| 12/20/2007 | US20070290166 Method and composition for polishing a substrate |
| 12/20/2007 | US20070290165 Comprises an abrasive component, a corrosion inhibitor, a surfactant, a diacid compound, a metal residue inhibitor, for example, 1,2,3,4-butanetetracarboxylic acid, and water; eliminates problems of metal dishing and metal residue while maintaining desired polishing rate |
| 12/19/2007 | CN101089120A Preparation of water-proop immersion article for porous mineral building material |
| 12/19/2007 | CN100355858C Slurry for chemical-mechanical polishing copper damascene structures |
| 12/19/2007 | CN100355491C Waterpower liquid |
| 12/13/2007 | WO2007075875A3 Etchant formulations and uses thereof |
| 12/13/2007 | US20070287362 Polishing composition and method of polishing with the same |
| 12/12/2007 | EP1412453A4 Process for removing contaminant from a surface and composition useful therefor |
| 12/12/2007 | CN100355034C Wafer bonding surface processing agent and wafer bonding method |
| 12/12/2007 | CN100355016C Process for producing a movable structure and etchant for silicon oxide film |
| 12/11/2007 | US7307778 Methylbenzyl alcohol or N-methylpyrrolidone, a low molecular weight aliphatic alcohol, isoproyl alcohol, or lactone, and water; removing the strippable layers |
| 12/11/2007 | US7306747 Use of fluorinated additives in the etching or polishing of integrated circuits |
| 12/06/2007 | WO2007046790A3 Chemical for data destruction |
| 12/06/2007 | US20070278447 Slurry for chemical-mechanical planarization of sapphire and method for manufacturing the same |
| 12/06/2007 | US20070278185 Etching composition and etching process |
| 12/05/2007 | EP1862525A2 Etching composition and etching process |
| 11/27/2007 | US7300603 Aqueous solution mixture of oxidizer and abrasive; using polymaleic acid; acidity pH |
| 11/27/2007 | US7300602 Selective barrier metal polishing solution |
| 11/27/2007 | US7300601 Passivative chemical mechanical polishing composition for copper film planarization |
| 11/22/2007 | WO2005076871A3 Lapping composition and method using same |
| 11/21/2007 | CN100350008C 抛光组合物 The polishing composition |
| 11/20/2007 | US7297757 A mixture for activating the surface of a first resin to enhance a close contact of the surface with a surface of a metal or a second resin containing a trivalent or tetravalent cerium compound; increased adhesive strength between, e.g., a polyimide based resin film with metal wires or another resin |
| 11/15/2007 | WO2007078355A3 Microetching composition and method of using the same |
| 11/15/2007 | US20070264829 Slurry and method for chemical mechanical polishing |
| 11/15/2007 | US20070264748 Aligned polymers for an organic tft |
| 11/07/2007 | EP1851286A2 Novel polishing slurries and abrasive-free solutions having a multifunctional activator |
| 11/07/2007 | CN100347344C Etching solution composition for metal foil using silver as main composition |
| 11/01/2007 | WO2007055669A3 Recyclable etching solution |
| 11/01/2007 | US20070254485 Abrasive composition for electrochemical mechanical polishing |
| 10/30/2007 | US7288212 Comprises acrylic acid-maleic acid copolymer and sodium hydroxide; for chemical mechanical polishing of semiconductors |
| 10/24/2007 | CN101058711A Grinding fluid for metal and grinding method |
| 10/23/2007 | US7285229 Etching aqueous solution containing hydrochloric acid, nitric acid and cupric compound; process control |
| 10/18/2007 | WO2007117880A1 Composition for etching a metal hard mask material in semiconductor processing |
| 10/18/2007 | US20070243710 Adjuvant for CMP slurry |
| 10/17/2007 | CN100343362C Polishing fluid for metal and polishing Method |
| 10/17/2007 | CN100343361C Aqueous cleaning compsn. contg. copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
| 10/17/2007 | CN100343189C Etching pastes for inorganic surfaces |
| 10/11/2007 | US20070235685 Etching reagent, and method for manufacturing electronic device substrate and electronic device |
| 10/11/2007 | US20070235684 Composition for etching a metal hard mask material in semiconductor processing |
| 10/10/2007 | CN101050348A Etchant composition, composition for polishing, method for producing polishing composition and polishing method |
| 10/04/2007 | WO2007111694A2 Composition and method for recycling semiconductor wafers having low-k dielectric materials thereon |
| 10/04/2007 | US20070228011 Novel chemical composition to reduce defects |
| 10/03/2007 | CN100340632C Method for roughening copper surfaces for bonding to substrates |
| 10/02/2007 | US7276181 Method for preparing decorative glass using glass etching composition |
| 10/02/2007 | US7276180 Chemical mechanical polishing composition and process |
| 09/27/2007 | US20070224829 Use Of Hypofluorites, Fluoroperoxides, And/Or Fluorotrioxides As Oxidizing Agent In Fluorocarbon Etch Plasmas |
| 09/27/2007 | US20070224792 Manufacturing method of semiconductor device and etching solution |
| 09/26/2007 | EP1836725A1 Method for selective etching |
| 09/26/2007 | EP1687831B1 Functional paste |
| 09/26/2007 | CN101041555A Ornamental glass having etching pattern and multicolor pattern and and method for manufacturing same |
| 09/25/2007 | US7273566 Etchant composed of a carrier gas; CH2F2; CF4; and C4F6 and/or C5F8; good selectivity to both nitrides and field oxides; integrated circuits produced using these etchants are less likely to be defective due to photoresist mask misalignment |
| 09/20/2007 | US20070218700 Etching solution comprising hydrofluoric acid |
| 09/20/2007 | US20070218692 Copper-based metal polishing compositions and polishing processes |
| 09/20/2007 | US20070215835 Surface treating fluid for fine processing of multi-component glass substrate |
| 09/19/2007 | CN101037511A Method for preparing micro-hole array polyolefine film by electron beam radiation |
| 09/13/2007 | WO2007103578A1 Method of polishing a tungsten carbide surface |
| 09/13/2007 | US20070210278 Compositions for chemical mechanical polishing silicon dioxide and silicon nitride |
| 09/12/2007 | EP1833085A1 Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same |