Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
09/2014
09/30/2014US8846530 Method for forming semiconductor region and method for manufacturing power storage device
09/30/2014US8846525 Hardmask materials
09/30/2014US8846518 Multilayer construction
09/30/2014US8846501 Method for equipping an epitaxy reactor
09/30/2014US8846451 Methods for depositing metal in high aspect ratio features
09/30/2014US8846437 High efficiency thin film transistor device with gallium arsenide layer
09/30/2014US8846187 Transparent gas barrier film and method for producing transparent gas barrier film
09/30/2014US8846163 Method for removing oxides
09/30/2014US8846148 Composition for chemical vapor deposition film-formation and method for production of low dielectric constant film
09/30/2014US8846147 Method for manufacturing a complexly shaped composite material part
09/30/2014US8846146 Smoothing agents to enhance nucleation density in thin film chemical vapor deposition
09/30/2014US8845857 Substrate processing apparatus
09/30/2014US8845855 Electrode for plasma processes and method for manufacture and use thereof
09/30/2014US8845854 Laser, plasma etch, and backside grind process for wafer dicing
09/30/2014US8845853 Substrate processing apparatus and substrate processing method
09/30/2014US8845816 Method extending the service interval of a gas distribution plate
09/30/2014US8845810 Substrate damage prevention system and method
09/30/2014US8845809 Scalable, high-throughput, multi-chamber epitaxial reactor for silicon deposition
09/30/2014US8845808 Vapor deposition device, vapor deposition method, and method of manufacturing organic electroluminescent display device
09/30/2014US8845807 Linear evaporation source and deposition apparatus having the same
09/30/2014US8845806 Shower plate having different aperture dimensions and/or distributions
09/25/2014WO2014153469A1 Coatings for cutting tools
09/25/2014WO2014153440A1 Coatings for cutting tools
09/25/2014WO2014153324A1 COATED BODY WHEREIN THE COATING SCHEME INCLUDES A COATING OF LAYER OF TiAL2O3 AND METHOD OF MAKING THE SAME
09/25/2014WO2014152116A1 Topography minimization of neutral layer overcoats in directed self-assembly applications
09/25/2014WO2014151942A1 Compositions of matter comprising nanocatalyst structures, systems comprising nanocatalyst structures, and related methods
09/25/2014WO2014151895A2 Method and apparatus for generating highly repetitive pulsed plasmas
09/25/2014WO2014150242A1 Deposition apparatus
09/25/2014WO2014150213A1 Induction heating apparatus
09/25/2014WO2014150092A1 Metamaterial and method for forming a metamaterial using atomic layer deposition
09/25/2014WO2014149957A1 Susceptors for enhanced process uniformity and reduced substrate slippage
09/25/2014WO2014149263A1 Adhesion improvement between cvd dielectric film and cu substrate
09/25/2014WO2014149194A1 Method of growing aluminum oxide onto substrates by use of an aluminum source in an oxygen environment to create transparent, scratch resistant windows
09/25/2014WO2014148909A1 Use of ice-phobic coatings
09/25/2014WO2014148893A1 Substrate processing apparatus
09/25/2014WO2014148551A1 Semiconductor device manufacturing method, substrate processing device and recording medium
09/25/2014WO2014148490A1 Substrate processing apparatus, and method for manufacturing semiconductor device
09/25/2014WO2014147805A1 Dlc coating film and coated valve lifter
09/25/2014WO2014147661A1 Roll of gas-barrier film, and process for producing gas-barrier film
09/25/2014WO2014147290A1 An apparatus for processing two or more substrates in a batch process
09/25/2014WO2014146948A1 Surface-tensioned sapphire plate
09/25/2014WO2014146947A1 Break resistant and shock resistant sapphire plate
09/25/2014US20140287249 Method for coating, using a chemical vapour deposition technique, a part with a coating for protecting against oxidation, and coating and part
09/25/2014US20140287248 Fluorinated coatings with lubricious additive
09/25/2014US20140287229 Coatings for cutting tools
09/25/2014US20140287228 COATED BODY WHEREIN THE COATING SCHEME INCLUDES A COATING LAYER OF TiAl2O3 AND METHOD OF MAKING THE SAME
09/25/2014US20140287199 Coatings for cutting tools
09/25/2014US20140287164 Compositions and processes for depositing carbon-doped silicon-containing films
09/25/2014US20140287162 Microwave plasma apparatus and method for materials processing
09/25/2014US20140287161 Methods for coating tubular devices used in oil and gas drilling, completions and production operations
09/25/2014US20140287155 Pretreatment method, graphene forming method and graphene fabrication apparatus
09/25/2014US20140287150 Condensation on surfaces
09/25/2014US20140287142 Cvd reactor and substrate holder for a cvd reactor
09/25/2014US20140287141 Process for Preparing Trialkyl Compounds of Metals of Group IIIA
09/25/2014US20140286598 Sliding member and manufacturing method thereof
09/25/2014US20140284404 Chemical vapour deposition injector
09/25/2014US20140283747 Plasma processing apparatus and shower plate
09/25/2014US20140283746 Liner assembly and substrate processing apparatus having the same
09/25/2014US20140283745 Ion implantation apparatus and method of cleaning ion implantation apparatus
09/25/2014US20140283743 Processing device and shield
09/25/2014US20140283736 Vapor phase growth apparatus and vapor phase growth method
09/25/2014DE112012003499T5 Depositionssystem mit Zugangstoren sowie Verfahren dafür Deposition system with access gates and method therefor
09/25/2014DE102013204799A1 Si/C-Komposite als Anodenmaterialien für Lithium-Ionen-Batterien Si / C composites as anode materials for lithium-ion batteries
09/24/2014EP2780294A1 Barrier layer to sioc alkali metals
09/23/2014USRE45154 Tool for machining
09/23/2014US8841221 MOCVD reactor having cylindrical gas inlet element
09/23/2014US8840990 Porous organosilicate layers, and vapor deposition systems and methods for preparing same
09/23/2014US8840958 Combined injection module for sequentially injecting source precursor and reactant precursor
09/23/2014US8840953 Method of adjusting nozzle clearance of liquid application apparatus, and liquid application apparatus
09/23/2014US8840753 Plasma etching unit
09/23/2014US8840728 Imprint system for performing a treatment on a template
09/23/2014US8840727 Film deposition apparatus, substrate processor, film deposition method, and computer-readable storage medium
09/23/2014US8840726 Apparatus for thin-film deposition
09/23/2014US8840725 Chamber with uniform flow and plasma distribution
09/23/2014US8840724 Continuous growth of single-wall carbon nanotubes using chemical vapor deposition
09/23/2014US8840723 Manufacturing apparatus of polycrystalline silicon
09/23/2014US8840720 Method for manufacturing a polycrystalline silicon thin film by joule-heating induced crystallization
09/23/2014US8839740 Simple chemical vapor deposition systems for depositing multiple-metal aluminide coatings
09/23/2014CA2778082C Electrode and method for supplying current to a reactor
09/18/2014WO2014144926A1 Coating method
09/18/2014WO2014143910A1 Manufacturing apparatus for depositing a material and a gasket for use therein
09/18/2014WO2014143903A1 Manufacturing apparatus for depositing a material and a gasket for use therein
09/18/2014WO2014143301A1 Multi-airfoil split and rejion method to produce enhanced durability coating
09/18/2014WO2014143257A1 Advanced bond coat
09/18/2014WO2014142031A1 Substrate processing device, method for controlling substrate processing device, cleaning method, method for manufacturing semiconductor device, and recording medium
09/18/2014WO2014142023A1 Plasma cvd device and plasma cvd method
09/18/2014WO2014141601A1 Film formation method, method for manufacturing semiconductor light-emitting element, semiconductor light-emitting element, and lighting apparatus
09/18/2014WO2014140668A1 Bis(alkylimido)-bis(alkylamido)tungsten molecules for deposition of tungsten-containing films
09/18/2014WO2014139488A1 Rotary table for the deposition of thin surface films on substrates
09/18/2014US20140274825 Pecvd lubricity vessel coating, coating process and apparatus providing different power levels in two phases
09/18/2014US20140273518 Methods for forming layers on semiconductor substrates
09/18/2014US20140273507 Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
09/18/2014US20140273505 Semiconductor apparatus with transportable edge ring for substrate transport
09/18/2014US20140273416 Apparatus and methods for photo-excitation processes
09/18/2014US20140273410 Inject insert liner assemblies for chemical vapor deposition systems and methods of using same
09/18/2014US20140273409 Gas distribution plate for chemical vapor deposition systems and methods of using same
09/18/2014US20140272684 Extreme ultraviolet lithography mask blank manufacturing system and method of operation therefor
09/18/2014US20140272432 Methods for applying a coating to a substrate in rolled form
09/18/2014US20140272350 Gas barrier film including graphene layer, flexible substrate including the same, and manufacturing method thereof
09/18/2014US20140272346 Method of growing aluminum oxide onto substrates by use of an aluminum source in an oxygen environment to create transparent, scratch resistant windows
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