Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
08/2014
08/19/2014US8808455 Substrate processing apparatus and method of manufacturing semiconductor device
08/19/2014US8808454 Gas injection unit for chemical vapor desposition apparatus
08/19/2014US8808453 System for abating the simultaneous flow of silane and arsine
08/19/2014US8807914 Seal device and method for operating the same and substrate processing apparatus comprising a vacuum chamber
08/19/2014US8807078 Plasma microwave resonant cavity
08/19/2014US8807075 Shutter disk having a tuned coefficient of thermal expansion
08/14/2014WO2014124413A1 Multi-step deposition of ferroelectric dielectric material
08/14/2014WO2014124056A1 Ald processes for low leakage current and low equivalent oxide thickness bitao films
08/14/2014WO2014123535A1 Methods for metallizing an aluminum paste
08/14/2014WO2014123415A1 Method and apparatus for depositing atomic layers on a substrate
08/14/2014WO2014122484A1 Injector and method
08/14/2014US20140227512 Deposition of silicon oxide by atmospheric pressure chemical vapor deposition
08/14/2014US20140227464 Multiple anode plasma for cvd in a hollow article
08/14/2014US20140227458 Plasma evaluation method, plasma processing method and plasma processing apparatus
08/14/2014US20140227444 Synthesis And Characterization Of First Row Transition Metal Complexes Containing a-Imino Alkoxides As Precursors For Deposition Of Metal Films
08/14/2014US20140227442 Thin film deposition device including deposition-preventing unit and method of removing deposits thereof
08/14/2014US20140224767 Automated algorithm for tuning of feedforward control parameters in plasma processing system
08/14/2014US20140224178 Alkyl push flow for vertical flow rotating disk reactors
08/14/2014US20140224175 Gas distribution manifold system for chemical vapor deposition reactors and method of use
08/14/2014US20140224174 Liner assemblies for substrate processing systems
08/14/2014DE102013101270A1 Anordnung und Verfahren zur Regelung einer Querverteilung der Beschichtungsrate beim Magnetronsputtern Arrangement and method for controlling a transverse distribution of the deposition rate in magnetron sputtering
08/14/2014DE102013101246A1 Reibungsreduziertes Gleitsystem Reduced friction sliding
08/13/2014EP2765218A1 Method and apparatus for depositing atomic layers on a substrate
08/13/2014EP2765217A1 Remote plasma generation apparatus
08/13/2014EP2764134A1 Method of and apparatus for multiple channel flow ratio controller system
08/13/2014EP2764133A1 A method for producing a coating by atmospheric pressure plasma technology
08/13/2014EP2764132A1 Methods for coating tubular devices used in oil and gas drilling, completions and production operations
08/13/2014EP2764131A1 Vapor transport deposition method and system for material co-deposition
08/13/2014CN203774259U 气体泄漏检测装置以及化学试剂供给装置 Gas leak detection means and supply means Chemicals
08/13/2014CN203768486U 一种分子束外延大规模生产设备中带有切边的衬底生长托板 A molecular beam epitaxy substrate, large-scale production facilities in the growth of the pallet with trimming
08/13/2014CN203768485U 一种分子束外延大规模生产设备中的爪型衬底生长托板 A molecular beam epitaxy apparatus in large-scale production of the growth of the claw-type substrate pallet
08/13/2014CN203768457U 一种提升外延片质量的石墨盘 A way to improve the quality of the graphite plate wafer
08/13/2014CN203768456U 一种板式pecvd装置用挂钩 A plate pecvd device hooks
08/13/2014CN203768455U 旋转式全方位偏电层类金刚石膜涂层设备 Rotary comprehensive bias layer DLC film coating equipment
08/13/2014CN203768454U 模具内孔沉积金刚石薄膜的夹具 Mold fixture hole diamond film deposition
08/13/2014CN103988292A 电力导入装置及使用该电力导入装置的真空处理设备 Apparatus and the power introduced into the device using the electric power introduced into the vacuum processing apparatus
08/13/2014CN103987877A 具有为原位方法配置的反应室的淀积系统以及相关方法 The method has the configuration for the in-situ reaction chamber deposition system and related methods
08/13/2014CN103987876A 等离子体处理系统中的惰性主导脉冲 The plasma processing system of the leading pulse in an inert
08/13/2014CN103987875A 切削刀片及其制造方法 And a method of manufacturing the cutting insert
08/13/2014CN103987874A 以硬质材料覆层的，由金属、硬质金属、金属陶瓷或陶瓷制成的体以及制造这种体的方法 In the hard material coating layer, made of a metal, hard metal, cermet or ceramic body and method of manufacturing such a body
08/13/2014CN103987766A 涂覆的聚合物膜 The coated polymer film
08/13/2014CN103981512A 一种可控反应物均匀分布的双通道喷口结构 A dual-channel vents structure controllable uniform distribution of reactants
08/13/2014CN103981511A 一种垂直布局制备金刚石膜的多阵列热丝装置 The vertical layout of the preparation of diamond film multi-array hot-wire device
08/13/2014CN103981510A 一种双开门立式制备金刚石膜的设备 A two door vertical diamond film preparation equipment
08/13/2014CN103981509A 一种垂直布局制备金刚石膜的单阵列热丝装置 The vertical layout of Diamond Films single array hot-wire device
08/13/2014CN103981508A 一种氮氧化硅渐变抗反射薄膜及其制备工艺 An antireflective film silicon oxynitride gradient and preparation process
08/13/2014CN103981507A 一种石墨烯制备方法 One kind of graphene preparation
08/13/2014CN103981506A 一种碳-锡复合导电膜的制备方法 A carbon - prepared tin composite conductive film
08/13/2014CN103014625B 制备四方相室温多铁性材料BiFeO3的方法 Preparation of tetragonal phase at room temperature multiferroic material BiFeO3 methods
08/13/2014CN102803556B 用于在真空室内固定反应器的托架 Bracket for fixing the vacuum chamber of the reactor
08/13/2014CN102251229B 成膜装置和成膜方法 Film forming apparatus and film forming method
08/13/2014CN102230167B 化学气相沉积设备 Chemical vapor deposition apparatus
08/13/2014CN101573480B 氮化物半导体自立基板及其制造方法 The nitride semiconductor self-supporting substrate and a manufacturing method
08/12/2014US8802603 Medical components having coated surfaces exhibiting low friction and low reactivity
08/12/2014US8802488 Substrate depositing system and depositing method using the same
08/12/2014US8802194 Tellurium precursors for film deposition
08/12/2014US8802193 Vapor deposition of biomolecules
08/12/2014US8801950 Reduction of a process volume of a processing chamber using a nested dynamic inert volume
08/12/2014US8801896 Method and apparatus for stable plasma processing
08/12/2014US8801895 Semiconductor manufacturing equipment and manufacturing method of the same
08/12/2014US8801893 Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor
08/12/2014US8801892 Uniform etch system
08/12/2014US8801858 Non-wear shutter apparatus for a vapor deposition apparatus
08/12/2014US8801857 Self-centering susceptor ring assembly
08/12/2014US8801856 Method and system for high-throughput deposition of patterned organic thin films
08/12/2014US8801817 Surface-coated cutting tool and manufacturing method thereof
08/12/2014US8800589 Material gas concentration control system
08/12/2014US8800485 Large area, atmospheric pressure plasma for downstream processing
08/12/2014US8800484 Plasma processing apparatus
08/12/2014US8800483 Methods and systems for plasma deposition and treatment
08/07/2014WO2014118751A1 Manganese-containing compounds, their synthesis, and use in manganese-containing film deposition
08/07/2014WO2014118750A1 Manganese-containing compounds, their synthesis, and use in manganese-containing film deposition
08/07/2014WO2014118748A1 Cobalt-containing compounds, their synthesis, and use in cobalt-containing film deposition
08/07/2014WO2014118747A1 Cobalt-containing compounds, their synthesis, and use in cobalt-containing film deposition
08/07/2014WO2014118062A1 Common deposition platform, processing station and method of operation thereof
08/07/2014WO2013126935A3 Method for producing a hard material layer on a substrate, hard material layer and cutting tool
08/07/2014US20140222061 Medical devices including metallic films and methods for making same
08/07/2014US20140220262 Methods for plasma processing
08/07/2014US20140220261 Microwave plasma reactors
08/07/2014US20140220260 Substrate processing apparatus and method of depositing a film
08/07/2014US20140220247 Method and system for treatment of deposition reactor
08/07/2014US20140220244 Ald reactor for coating porous substrates
08/07/2014US20140219905 Vapor deposition reactor and method for forming thin film
08/07/2014US20140219903 Film deposition material, sealing film using the same and use thereof
08/07/2014US20140216347 Chemical vapor deposition reactor
08/07/2014US20140216344 Rf choke for gas delivery to an rf driven electrode in a plasma processing apparatus
08/07/2014US20140216339 Raw material vaporizing and supplying apparatus
08/06/2014EP2763162A1 Preventing metal contamination of a component in semi-conductors
08/06/2014EP2762615A2 Substrate, substrate with thin film, semiconductor device, and method of manufacturing semiconductor device
08/06/2014EP2762609A1 Common deposition platform, processing station and method of operation thereof
08/06/2014EP2762446A1 Copper foil for graphene production and production method therefor, and graphene production method
08/06/2014EP2761642A2 Inorganic materials, methods and apparatus for making same, and uses thereof
08/06/2014EP2761054A1 Deposition of silicon oxide by atmospheric pressure chemical vapor deposition
08/06/2014EP2761053A1 Loading device for densification via chemical infiltration in steam phase in directed flow of three-dimensional porous substrates
08/06/2014EP2760791A1 Reactor and method for production of silicon by chemical vapor deposition
08/06/2014CN203754804U 一种化学气相沉积金刚石设备中使用的热丝张紧机构 Hot wire tensioning mechanism of a chemical vapor deposition equipment used in diamond
08/06/2014CN203754803U 一种图案化装置及系统 A pattern of the apparatus and system
08/06/2014CN103975413A 用于等离子体施加器的气体喷射器设备 Device for the plasma gas injector applicator
08/06/2014CN103975093A 催化剂cvd法及其装置 Catalyst cvd method and device
08/06/2014CN103975091A 冶金结合的不锈钢 Metallurgical bonding of stainless steel
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