Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
06/2014
06/12/2014US20140158048 Method and apparatus for cleaning a cvd chamber
06/12/2014US20140158044 Mask assembly for thin film vapor deposition and manufacturing method thereof
06/12/2014DE112012003571T5 Schneidwerkzeug Cutting tool
06/12/2014DE102012112064A1 Dämpfer, Kühlkreislauf und Apparatur für eine schwingungsempfindliche Substratbehandlungsapparatur Damper, cooling system and apparatus for vibration-sensitive substrate processing apparatus
06/12/2014DE102012111896A1 Chemical vapor deposition reactor has cleaning element that is arranged in annular duct of gas outlet, and movable within annular duct by rotary actuator to mechanically clean interior or exterior wall of annular duct
06/12/2014DE102012111869A1 Device, useful for contactless reception of disc-shaped bodies of wheel carrier, comprises cavity provided with opening, and wall surrounding cavity and including set of flow openings for guiding suction unfolding gas from cavity
06/11/2014EP2741317A1 Epitaxial wafer manufacturing device and manufacturing method
06/11/2014EP2741316A1 Epitaxial wafer manufacturing device and manufacturing method
06/11/2014EP2740817A1 Microcrystalline silicon thin film PECVD using hydrogen and silanes mixtures
06/11/2014EP2740816A1 Organic ruthenium compound for chemical vapor deposition raw material and production method for said organic ruthenium compound
06/11/2014EP2740593A1 Laminate, gas barrier film, production method for laminate, and laminate production device
06/11/2014EP2739767A1 Coating increasing the friction coefficient and production thereof by means of atmospheric pressure plasma coating
06/11/2014EP2739766A1 Device and method for producing thin films
06/11/2014EP2739765A2 Systems and methods for processing vapor
06/11/2014CN203639554U 一种常压化学气相淀积设备的履带轨迹自动调整装置 A crawler track atmospheric pressure chemical vapor deposition apparatus of the automatic adjusting device
06/11/2014CN203639553U 具有流量阀门的负载锁定腔室及用于形成器件的装置 Having a load lock chamber flow valve and means for forming the device
06/11/2014CN203639552U 一种微波受激等离子体增强化学气相沉积装置 A microwave excited plasma enhanced chemical vapor deposition apparatus
06/11/2014CN203639551U 一种薄膜生产设备 A film production equipment
06/11/2014CN203639550U 一种新型激光光致化学气相反应装置 A new laser-induced chemical vapor reaction device
06/11/2014CN203639549U 基片支撑装置和膜层沉积设备 Substrate support means and the film deposition apparatus
06/11/2014CN203639548U 平板式pecvd设备及其气路装置 Flatbed pecvd equipment and pneumatic equipment
06/11/2014CN203639547U 一种筒板式液体气化装置 One kind of plate cylinder liquid gasification plant
06/11/2014CN203639538U 具有阳极壳体的磁控管溅射刻蚀设备 Magnetron sputter etching apparatus having an anode casing
06/11/2014CN203637157U 石英管缠管机 Quartz tube wrapped around the pipe machine
06/11/2014CN1984523B Plasma processing apparatus and method
06/11/2014CN103858220A Substrate transfer system and substrate transfer method
06/11/2014CN103858212A Vaporizer
06/11/2014CN103857825A Floating substrate monitoring and control device, and method for the same
06/11/2014CN103857824A Film forming device and manufacturing method for glass with film
06/11/2014CN103855082A Wet activation of ruthenium containing liner/barrier
06/11/2014CN103849872A Method and device for preparing coating by using nanosecond pulse laser cladding
06/11/2014CN103849857A Thin film deposition source, deposition apparatus and deposition method using the same
06/11/2014CN103849856A Method for coating shells by adopting parylene vacuum coating technology
06/11/2014CN103849855A Chemical vapor deposition equipment and carrying mechanism for chemical vapor deposition equipment
06/11/2014CN103849854A Method of fabricating zinc oxide thin film
06/11/2014CN103849853A Method for relieving stress between silicon substrate and gallium nitride film during MOCVD (Metal Organic Chemical Vapor Deposition) process
06/11/2014CN103849852A Method for reducing particles in furnace tube of chemical vapor deposition technology
06/11/2014CN103849836A Plasma equipment and reaction chamber thereof
06/11/2014CN103849833A Substrate and mask attachment clamp device
06/11/2014CN103849832A Preparation method of pixelated scintillating material film
06/11/2014CN102747337B Method for preparing amorphous carbon film with large area and high quality
06/11/2014CN102656294B CVD reactor having a substrate holder resting on a gas cushion comprising a plurality of zones
06/11/2014CN102618845B Reactor with baffle plate device
06/11/2014CN102581274B Method for coating micro/nano-metal powder by chemical vapor deposition
06/11/2014CN102459688B Protective coating, a coated member having a protective coating as well as method for producing a protective coating
06/11/2014CN102414796B Method for fabricating wafer products and method for fabricating gallium nitride semiconductor photonic elements
06/10/2014US8748780 Substrate processing apparatus, substrate processing method, and computer-readable storage medium
06/10/2014US8748016 Coated bodies made of metal, hard metal, cermet, or ceramic, and method(s) for coating of such bodies
06/10/2014US8747963 Apparatus and method for diamond film growth
06/10/2014US8747959 Planar patterned transparent contact, devices with planar patterned transparent contacts, and/or methods of making the same
06/10/2014US8747948 Deposition apparatus
06/10/2014US8747947 Graphene defect alteration
06/10/2014US8747609 Plasma processing apparatus and shower head
06/10/2014US8747608 Plasma processing apparatus
06/10/2014US8747560 System and method for pedestal adjustment
06/10/2014US8747559 Substrate support having dynamic temperature control
06/10/2014US8747558 Manufacturing apparatus
06/10/2014US8747557 Devices for positioning carbon nanoparticles, and systems for controlling placement of nanoparticles
06/10/2014US8747556 Apparatuses and methods for atomic layer deposition
06/10/2014US8747555 Thin film production apparatus and inner block for thin film production apparatus
06/10/2014US8746284 Apparatus and method for multiple symmetrical divisional gas distribution
06/10/2014US8746174 Discharge surface treatment apparatus and discharge surface treatment method
06/10/2014US8746173 Plasma deposition device
06/10/2014US8746172 Apparatus and method for the plasma treatment of hollow bodies
06/10/2014US8746170 Substrate process apparatus, substrate process method, and computer readable storage medium
06/10/2014US8746169 Mask frame assembly for thin film deposition
06/05/2014WO2014085497A1 Process chamber gas flow apparatus, systems, and methods
06/05/2014WO2014085346A1 Hollow body with inside coating
06/05/2014WO2014084700A1 Roll
06/05/2014WO2014084698A1 Film formation apparatus
06/05/2014WO2014084557A1 Silicon precursor compounds, and method for depositing thin film containing silicon using same
06/05/2014WO2014083400A1 Deposition systems having interchangeable gas injectors and related methods
06/05/2014WO2014083241A1 Method for fabricating a passivation film on a crystalline silicon surface
06/05/2014WO2014083240A1 A method for fabricating a structure comprising a passivation layer on a surface of a substrate
06/05/2014WO2014083218A1 Method for producing a dielectric and/or barrier layer or multilayer on a substrate, and device for implementing said method
06/05/2014US20140154564 Anode active material for lithium secondary battery, preparation method thereof, and lithium secondary battery comprising the same
06/05/2014US20140154423 Apparatus and method for deposition
06/05/2014US20140154417 Method and apparatus capable of synthesizing high-density wires in pores and on surface of porous material
06/05/2014US20140154415 Method for manufacturing silicon-containing film
06/05/2014US20140154414 Atomic layer deposition apparatus and method
06/05/2014US20140154403 Thin film deposition source, deposition apparatus and deposition method using the same
06/05/2014US20140153613 Measuring shunt comprising protective frame
06/05/2014DE102012111636A1 Device for thermal treatment of substrates in treatment chamber, comprises transport device for transporting substrates, gas conducting device, and radiation device comprising electrode pair comprising anode, cathode and discharge chamber
06/05/2014DE102012022113A1 Piezoelektrische Kraftmessvorrichtung mit integrierten Verschleissschutz- und Gleiteigenschaften Piezoelectric force-measuring device with built-wear and sliding properties
06/05/2014DE10005121B4 Lampenreflektor mit einer Sperrschicht aus einem Plasmapolymer Lamp reflector having a barrier layer of a plasma polymer
06/04/2014EP2738288A1 Plasma cvd device
06/04/2014EP2738287A1 Methof of fabricating zinc oxide thin film
06/04/2014EP2738286A1 Product having traceability displayed thereon and method for displaying traceability of product
06/04/2014EP2737996A1 Laminated body, gas barrier film, and method for producing laminated body and gas barrier film
06/04/2014EP2737515A1 Tool and process for treating an object by plasma generators
06/04/2014EP2737106A1 Methods for reducing nitrogen oxides emissions
06/04/2014EP2737105A1 Apcvd of doped titanium oxide and the coated article made thereby
06/04/2014EP2737104A1 Quick closure for reactors and converter
06/04/2014CN203625466U 一种用于化学气相沉积的高温加热沉积台 A method for chemical vapor deposition of high temperature heating deposition station
06/04/2014CN203625465U 管式pecvd及其隔离保护装置 Tubular pecvd and isolation protection device
06/04/2014CN203625464U 连续式镀膜机动力引入装置 The introduction of continuous coating machine power unit
06/04/2014CN203625463U 一种真空沉积系统及其旋转馈入装置 A vacuum deposition system and rotary feedthroughs
06/04/2014CN103840032A Preparation technology of silicon solar monocrystalline cell double-layer anti-reflection coating
06/04/2014CN103834935A Device and method for processing strip-type substrates
06/04/2014CN103834934A Control system for plasma enhanced chemical vapor deposition
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