Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
07/2014
07/08/2014US8771417 Exhaust unit, exhaust method using the exhaust unit, and substrate processing apparatus including the exhaust unit
07/08/2014US8770827 Method for coating micromechanical parts with high tribological performances for application in mechanical systems
07/08/2014US8770214 Gas mixture supplying method and apparatus
07/08/2014US8770143 Multi-region processing system
07/08/2014US8770142 Electrode for generating plasma and plasma generator
07/08/2014US8770141 Substrate coating device with control section that synchronizes substrate moving velocity and delivery pump
07/08/2014CA2441680C Titanium article having improved corrosion resistance
07/03/2014WO2014105819A1 Plasma enhanced chemical vapor deposition (pecvd) source
07/03/2014WO2014105239A1 Hardface coating systems and methods for metal alloys and other materials for wear and corrosion resistant applications
07/03/2014WO2014105085A1 Multi-crystal diamond body
07/03/2014WO2014104569A1 Diamond coated cutting tools having excellent surface roughness, and method for diamond coating cutting tools
07/03/2014WO2014104551A1 Deposition apparatus using vertical-type plate heater
07/03/2014WO2014104459A1 Low friction material for car engine and method for manufacturing same by using laser patterning
07/03/2014WO2014103940A1 Cylinder and piston ring assembly
07/03/2014WO2014103756A1 Gas-barrier film
07/03/2014WO2014103728A1 Film-forming device
07/03/2014WO2014103727A1 SiC-FILM FORMATION DEVICE AND METHOD FOR PRODUCING SiC FILM
07/03/2014WO2014103677A1 Thin film deposition device
07/03/2014WO2014103588A1 Aluminum compound, thin film-forming raw material, and method for producing thin film
07/03/2014WO2014103533A1 Surface coated member, and manufacturing method for same
07/03/2014WO2014103507A1 Surface coated member, and manufacturing method for same
07/03/2014WO2014103318A1 Method for forming protective film using plasma cvd method
07/03/2014WO2014103228A1 In-line plasma cvd device
07/03/2014WO2014102188A1 Method and device for the formation of a continuous layer on the inner and outer surfaces of a hollow part and part thus produced
07/03/2014WO2014101188A1 Metallization and surface coating solution on glass filler high performance amorphous polymer compositions
07/03/2014WO2014064179A3 Device for the treatment of substrates, comprising a replaceable cover plate, and method for replacing such a cover plate
07/03/2014WO2014059012A4 Process for the internal coating of hollow bodies
07/03/2014WO2013182880A3 Deposition systems having deposition chambers configured for in-situ metrology with radiation deflection and related methods
07/03/2014US20140187025 Method of forming silicon film and film forming apparatus
07/03/2014US20140186583 Coating increasing the friction coefficient and production thereof by means of atmospheric pressure plasma coating
07/03/2014US20140186544 Metal processing using high density plasma
07/03/2014US20140186527 Device and method for processing strip-type substrates
07/03/2014DE112009004405B4 Filmausbildevorrichtung und Filmausbildeverfahren Film forming apparatus and film forming method
07/02/2014EP2748843A1 Susceptor
07/02/2014EP2748352A1 Method of modifying surfaces
07/02/2014EP2748350A1 Protection of edge exclusion mask shielding
07/02/2014EP2748349A1 Corner cut mask
07/02/2014EP2747918A1 Ionic liquid release coat for use in metal flake manufacture
07/02/2014CN203683663U 一种等离子体增强化学气相沉积匀流板 A plasma enhanced chemical vapor deposition uniform flow plate
07/02/2014CN203683662U 一种新型结构的石墨舟承载销钉 A new structure of the graphite boat carrying pin
07/02/2014CN203683661U 一种用于高温扩散炉的石墨舟卡点装卸装置 Graphite boat handling device for a card spot high-temperature diffusion furnace
07/02/2014CN203683660U 板式pecvd镀膜载板 Pecvd coated plate carrier board
07/02/2014CN203683659U 用于多反应腔化学气相沉积设备的多腔双密封圈系统 For chemical vapor deposition equipment and multiple reaction chambers multi-cavity double seal system
07/02/2014CN103904026A 微电子芯片用低介电常数薄膜层的制造工艺 Microelectronic chip layer with low dielectric constant film fabrication process
07/02/2014CN103903961A 在石墨烯材料上淀积高k栅介质的方法及应用 Graphene material is deposited on the high-k gate dielectrics and its application
07/02/2014CN103898506A 基于m面GaN上的极性AlN纳米线材料及其制作方法 Based polar m-plane GaN on AlN nano wire material and manufacturing method thereof
07/02/2014CN103898480A 一种在电子装置上连续进行真空镀防水膜的装置及方法 An electronic apparatus on a continuous vacuum deposition apparatus and method for waterproofing membrane
07/02/2014CN103898479A 一种卷对卷高效制备硫化镉薄膜的装置和方法 A roll-to-roll device and method for efficient preparation of CdS thin films
07/02/2014CN103898478A 一种化学气相沉积设备及其托盘 A chemical vapor deposition apparatus and a tray
07/02/2014CN103898477A 一种衬底支承座 A substrate bearing seat
07/02/2014CN103898476A 薄膜沉积装置及薄膜沉积方法 Thin film deposition apparatus and film deposition method
07/02/2014CN103898475A 一种多腔室石墨沉积装置及化学气相沉积炉 A multi-chamber deposition apparatus graphite furnace and chemical vapor deposition
07/02/2014CN103898474A 钨-锑-碲相变材料沉积方法及相变存储单元制备方法 Tungsten - antimony - tellurium phase change material deposition process and phase change memory cell preparation
07/02/2014CN103898473A 工艺反应腔及工艺设备 Process reaction chamber and process equipment
07/02/2014CN103898472A 硅膜的成膜方法以及成膜装置 A silicon film forming method and a film deposition apparatus of
07/02/2014CN103894636A 硬质包覆层发挥优异的耐崩刀性的表面包覆切削工具 The hard coating layer exhibits excellent chipping resistance of the surface-coated cutting tool
07/02/2014CN102888593B 一种在石墨球体表面包覆热解碳的设备及气相沉碳方法 A pyrolytic carbon equipment and vapor-coated carbon graphite sphere surface method
07/02/2014CN102817014B 化学气相淀积装置中硅基气体的控制方法 Chemical vapor deposition apparatus a gas control method of the silicon
07/02/2014CN102817008B Ag、Ti共掺杂DLC薄膜的制备方法 Ag, Ti co-doped DLC films prepared
07/02/2014CN102810359B 化学气相沉积法制备同轴碳化硅/二氧化硅纳米电缆的方法 Preparation of coaxial chemical vapor deposition of silicon carbide / silicon dioxide nano-cable method
07/02/2014CN102597311B 气体供给系统 Gas supply system
07/02/2014CN102482774B 用于沉积层的cvd反应器和方法 Cvd reactor and process for the deposition of layers
07/01/2014US8765360 Optical films and methods of making the same
07/01/2014US8765233 Method for forming low-carbon CVD film for filling trenches
07/01/2014US8765223 Binary and ternary metal chalcogenide materials and method of making and using same
07/01/2014US8765222 Method of manufacturing a p-AlGaN layer
07/01/2014US8765221 Film forming method and film forming apparatus
07/01/2014US8765220 Methods of making and deposition methods using hafnium- or zirconium-containing compounds
07/01/2014US8765212 Methods for continuously moving a fluid dispenser while dispensing amounts of a fluid material
07/01/2014US8764903 Growth reactor for gallium-nitride crystals using ammonia and hydrogen chloride
07/01/2014US8764902 Film-forming apparatus
07/01/2014US8763928 Liquid material vaporizer
07/01/2014DE202014002365U1 Waferträger mit Einrichtungen zum Verbessern der Erwärmungsgleichmässigkeit in Systemen zur chemischen Gasphasenabscheidung The wafer carrier with means for improving the Erwärmungsgleichmässigkeit in systems for chemical vapor deposition
06/2014
06/26/2014WO2014100453A1 Dual-detection residual gas analyzer
06/26/2014WO2014100413A1 Apparatus and methods for symmetrical gas distribution with high purge efficiency
06/26/2014WO2014100401A1 Methods and systems for stabilizing filaments in a chemical vapor deposition reactor
06/26/2014WO2014100101A1 Chemical vapor deposition of fluorocarbon polymers
06/26/2014WO2014100034A1 Solid phase gas source delivery system
06/26/2014WO2014099790A1 Nanostructured whisker article
06/26/2014WO2014099733A1 Display device incorporating multiple dielectric layers
06/26/2014WO2014098261A1 Seed crystal substrate, composite substrate and function element
06/26/2014WO2014098251A1 g-C3N4 FILM PRODUCTION METHOD, AND USE OF SAID FILM
06/26/2014WO2014097621A1 Pair of electrodes for dbd plasma process
06/26/2014WO2014097545A1 Substrate transport roller
06/26/2014WO2014097544A1 Substrate transport device
06/26/2014WO2014097280A1 Methods of low temperature deposition of ceramic thin films
06/26/2014WO2014096792A1 Deposition of electrically conductive polymers
06/26/2014WO2014096351A1 Coated cutting tool and method for manufacturing the same
06/26/2014WO2014096348A1 Coated cutting tool and method for manufacturing the same
06/26/2014WO2014095668A1 Method for applying a temporary bonding layer
06/26/2014WO2014094328A1 Coating method and apparatus
06/26/2014WO2014094263A1 Method for utilizing atomic layer deposition to prepare thin film
06/26/2014WO2013179111A3 Surface treatment method and coating agent
06/26/2014WO2012142439A8 Method and apparatus for ion-assisted atomic layer deposition
06/26/2014US20140179114 Radical source design for remote plasma atomic layer deposition
06/26/2014US20140179028 Plasma doping apparatus and plasma doping method
06/26/2014US20140178637 Low friction coatings with improved abrasion and wear properties and methods of making
06/26/2014US20140178605 Deposition apparatus
06/26/2014US20140178568 Devices and methods for passivating a flexible substrate in a coating process
06/26/2014US20140175055 Adjustable coil for inductively coupled plasma
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